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Przemyslaw Wachulak
Przemyslaw Wachulak
在 wat.edu.pl 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
High numerical aperture tabletop soft x-ray diffraction microscopy with 70-nm resolution
RL Sandberg, C Song, PW Wachulak, DA Raymondson, A Paul, ...
Proceedings of the National Academy of Sciences 105 (1), 24-27, 2008
1742008
Talbot lithography: self-imaging of complex structures
A Isoyan, F Jiang, YC Cheng, F Cerrina, P Wachulak, L Urbanski, J Rocca, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
1332009
Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution
CA Brewer, F Brizuela, P Wachulak, DH Martz, W Chao, EH Anderson, ...
Optics letters 33 (5), 518-520, 2008
1172008
Roadmap on holography
JT Sheridan, RK Kostuk, AF Gil, Y Wang, W Lu, H Zhong, Y Tomita, ...
Journal of Optics 22 (12), 123002, 2020
1022020
“Water window” compact, table-top laser plasma soft X-ray sources based on a gas puff target
PW Wachulak, A Bartnik, H Fiedorowicz, P Rudawski, R Jarocki, ...
Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2010
892010
Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target
R Rakowski, A Bartnik, H Fiedorowicz, F De Gaufridy De Dortan, ...
Applied Physics B 101, 773-789, 2010
772010
Soft x-ray laser holography with wavelength resolution
PW Wachulak, MC Marconi, RA Bartels, CS Menoni, JJ Rocca
JOSA B 25 (11), 1811-1814, 2008
772008
Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination
F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ...
Optics letters 34 (3), 271-273, 2009
732009
Laser-plasma EUV source dedicated for surface processing of polymers
A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, M Szczurek, ...
Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2011
692011
High-repetition-rate, intracavity-pumped KTP OPO at 1572 nm
W Żendzian, JK Jabczyński, P Wachulak, J Kwiatkowski
Applied Physics B 80, 329-332, 2005
622005
Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography
PW Wachulak, MG Capeluto, MC Marconi, CS Menoni, JJ Rocca
Optics Express 15 (6), 3465-3469, 2007
602007
Sub-70 nm resolution tabletop microscopy at 13.8 nm using a compact laser–plasma EUV source
PW Wachulak, A Bartnik, H Fiedorowicz
Optics Letters 35 (14), 2337-2339, 2010
592010
Desktop water window microscope using a double-stream gas puff target source
PW Wachulak, A Torrisi, A Bartnik, D Adjei, J Kostecki, L Wegrzynski, ...
Applied Physics B 118, 573-578, 2015
572015
A 50nm spatial resolution EUV imaging–resolution dependence on object thickness and illumination bandwidth
PW Wachulak, A Bartnik, H Fiedorowicz, J Kostecki
Optics express 19 (10), 9541-9550, 2011
572011
Simultaneous treatment of polymer surface by EUV radiation and ionized nitrogen
A Bartnik, W Lisowski, J Sobczak, P Wachulak, B Budner, B Korczyc, ...
Applied Physics A 109, 39-43, 2012
552012
Extreme ultraviolet lithography with table top lasers
MC Marconi, PW Wachulak
Progress in Quantum electronics 34 (4), 173-190, 2010
502010
Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target
PW Wachulak, A Bartnik, M Skorupka, J Kostecki, R Jarocki, M Szczurek, ...
Applied Physics B 111, 239-247, 2013
492013
A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength
PW Wachulak, A Bartnik, H Fiedorowicz, T Feigl, R Jarocki, J Kostecki, ...
Applied Physics B 100, 461-469, 2010
452010
A Compact “water window” microscope with 60 nm spatial resolution for applications in biology and nanotechnology
P Wachulak, A Torrisi, MF Nawaz, A Bartnik, D Adjei, Š Vondrová, ...
Microscopy and Microanalysis 21 (5), 1214-1223, 2015
442015
Compact system for near edge X-ray fine structure (NEXAFS) spectroscopy using a laser-plasma light source
P Wachulak, M Duda, A Bartnik, A Sarzyński, Ł Węgrzyński, M Nowak, ...
Optics Express 26 (7), 8260-8274, 2018
432018
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