| Focused beam spectroscopic ellipsometry method and system TR Piwonka-Corle, KF Scoffone, X Chen, LJ Lacomb Jr, JL Stehle, ... US Patent 5,608,526, 1997 | 531 | 1997 |
| Focused beam spectroscopic ellipsometry method and system TR Piwonka-Corle, X Chen, LJ Lacomb Jr, JL Stehle, D Zahorski US Patent 5,910,842, 1999 | 136 | 1999 |
| Spectroscopic ellipsometry apparatus including an optical fiber F Bernoux, JL Stehle US Patent 5,329,357, 1994 | 128 | 1994 |
| The low‐temperature infrared optical functions of SrTiO3 determined by reflectance spectroscopy and spectroscopic ellipsometry K Kamaras, KL Barth, F Keilmann, R Henn, M Reedyk, C Thomsen, ... Journal of applied physics 78 (2), 1235-1240, 1995 | 122 | 1995 |
| Focused beam spectroscopic ellipsometry method and system TR Piwonka-Corle, KF Scoffone, X Chen, LJ Lacomb Jr, JL Stehle, ... US Patent 6,734,967, 2004 | 105 | 2004 |
| Characterization of different porous silicon structures by spectroscopic ellipsometry M Fried, T Lohner, O Polgár, P Petrik, E Vazsonyi, I Barsony, JP Piel, ... Thin Solid Films 276 (1-2), 223-227, 1996 | 74 | 1996 |
| Ellipsométrie. Théorie F BERNOUX, JP PIEL, B CASTELLON, C DEFRANOUX, JH LECAT, ... Techniques de l'ingénieur. Mesures et contrôle, R6490. 1-R6490. 11, 2003 | 36 | 2003 |
| High-speed broadband FTIR system using MEMS N Pelin Ayerden, U Aygun, STS Holmstrom, S Olcer, B Can, JL Stehle, ... Applied optics 53 (31), 7267-7272, 2014 | 33 | 2014 |
| High spatial resolution infrared ellipsometer JL Stehle, P Boher, M Luttmann US Patent 6,819,423, 2004 | 29 | 2004 |
| MRS Fall meeting P Boher, JL Stehle, JL Stehle, E Fogarassy, A Grob, JJ Grob, D Muller Boston, November 27, 1996 | 28 | 1996 |
| Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range P Boher, JP Piel, C Defranoux, JLP Stehle, L Hennet Optical Microlithography IX 2726, 608-620, 1996 | 27 | 1996 |
| In situ spectroscopic ellipsometry: present status and future needs for thin film characterisation and process control P Boher, JL Stehle Materials Science and Engineering: B 37 (1-3), 116-120, 1996 | 26 | 1996 |
| Method and apparatus for ellipsometric metrology for a sample contained in a chamber or the like JL Stehle, P Boher US Patent 6,687,002, 2004 | 25 | 2004 |
| Spectroscopic ellipsometry for Si (1− x) Gex characterization: comparison with other experimental techniques P Boher, JP Piel, JL Stehle Journal of crystal growth 157 (1-4), 73-79, 1995 | 22 | 1995 |
| Round robin investigation of silicon oxide on silicon reference materials for ellipsometry J Vanhellemont, HE Maes, M Schaekers, A Armigliato, H Cerva, A Cullis, ... Applied surface science 63 (1-4), 45-51, 1993 | 22 | 1993 |
| Transmission measurements in rapid growth KDP and DKDP crystals A Dyan, G Duchateau, S Eslava, JL Stehle, D Damiani, H Piombini Journal of Modern Optics 56 (1), 27-31, 2009 | 21 | 2009 |
| Characterization of ultrathin gate dielectrics by grazing X-ray reflectance and VUV spectroscopic ellipsometry on the same instrument P Boher, P Evrard, JP Piel, JL Stehle Journal of non-crystalline solids 303 (1), 167-174, 2002 | 21 | 2002 |
| Single shot excimer laser annealing of amorphous silicon for AMLCD P Boher, JL Stehle, M Stehle, B Godard Applied surface science 96, 376-383, 1996 | 21 | 1996 |
| Variable-angle spectroscopic ellipsometry for deep UV characterization of dielectric coatings A Zuber, N Kaiser, JL Stehle Thin Solid Films 261 (1-2), 37-43, 1995 | 19 | 1995 |
| Electron pulse shape in laser-enhanced ionization spectrometry T Berthoud, J Lipinsky, P Camus, JL Stehle Analytical Chemistry 55 (6), 959-963, 1983 | 19 | 1983 |
