Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition BJ Choi, DS Jeong, SK Kim, C Rohde, S Choi, JH Oh, HJ Kim, CS Hwang, ...
Journal of applied physics 98 (3), 2005
1499 2005 High dielectric constant TiO2 thin films on a Ru electrode grown at 250 C by atomic-layer deposition SK Kim, WD Kim, KM Kim, CS Hwang, J Jeong
Applied Physics Letters 85 (18), 4112-4114, 2004
416 2004 Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors SK Kim, GJ Choi, SY Lee, M Seo, SW Lee, JH Han, HS Ahn, S Han, ...
Advanced Materials 20 (8), 1429-1435, 2008
360 2008 First-principles study of point defects in rutile E Cho, S Han, HS Ahn, KR Lee, SK Kim, CS Hwang
Physical Review B—Condensed Matter and Materials Physics 73 (19), 193202, 2006
277 2006 Capacitors with an equivalent oxide thickness of< 0.5 nm for nanoscale electronic semiconductor memory SK Kim, SW Lee, JH Han, B Lee, S Han, CS Hwang
Advanced Functional Materials 20 (18), 2989-3003, 2010
264 2010 Atomic Layer Deposition for Semiconductors CS Hwang
Atomic Layer Deposition for Semiconductors, E1-E1, 2014
224 2014 Low temperature (< 100 C) deposition of aluminum oxide thin films by ALD with O3 as oxidant SK Kim, SW Lee, CS Hwang, YS Min, JY Won, J Jeong
Journal of The Electrochemical Society 153 (5), F69, 2006
213 2006 Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant SK Kim, CS Hwang, SHK Park, SJ Yun
Thin Solid Films 478 (1-2), 103-108, 2005
209 2005 Wafer-scale growth of MoS 2 thin films by atomic layer deposition JJ Pyeon, SH Kim, DS Jeong, SH Baek, CY Kang, JS Kim, SK Kim
Nanoscale 8 (20), 10792-10798, 2016
177 2016 Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ...
Chemistry of Materials 23 (8), 2227-2236, 2011
165 2011 Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions R Soni, A Petraru, P Meuffels, O Vavra, M Ziegler, SK Kim, DS Jeong, ...
Nature Communications 5 (1), 5414, 2014
149 2014 Future of dynamic random-access memory as main memory SK Kim, M Popovici
MRS Bulletin 43 (5), 334-339, 2018
141 2018 Atomic layer deposition of Ru thin films using 2, 4-(dimethylpentadienyl)(ethylcyclopentadienyl) Ru by a liquid injection system SK Kim, SY Lee, SW Lee, GW Hwang, CS Hwang, JW Lee, J Jeong
Journal of The Electrochemical Society 154 (2), D95, 2007
121 2007 Titanium dioxide thin films for next-generation memory devices SK Kim, KM Kim, DS Jeong, W Jeon, KJ Yoon, CS Hwang
Journal of Materials Research 28 (3), 313, 2013
120 2013 Plasma-enhanced atomic layer deposition of TiO2 and Al-doped TiO2 films using N2O and O2 reactants GJ Choi, SK Kim, SJ Won, HJ Kim, CS Hwang
Journal of the Electrochemical Society 156 (9), G138, 2009
109 2009 Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films SH Kim, IH Baek, DH Kim, JJ Pyeon, TM Chung, SH Baek, JS Kim, ...
Journal of Materials Chemistry C 5 (12), 3139-3145, 2017
105 2017 Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2 O JH Han, YJ Chung, BK Park, SK Kim, HS Kim, CG Kim, TM Chung
Chemistry of Materials 26 (21), 6088-6091, 2014
98 2014 Investigation on the growth initiation of Ru thin films by atomic layer deposition SK Kim, JH Han, GH Kim, CS Hwang
Chemistry of materials 22 (9), 2850-2856, 2010
98 2010 Interfacial control of oxygen vacancy doping and electrical conduction in thin film oxide heterostructures BW Veal, SK Kim, P Zapol, H Iddir, PM Baldo, JA Eastman
Nature communications 7 (1), 11892, 2016
95 2016 Growth Behavior of Al-Doped TiO2 Thin Films by Atomic Layer Deposition SK Kim, GJ Choi, JH Kim, CS Hwang
Chemistry of Materials 20 (11), 3723-3727, 2008
94 2008 
Seung Hyub BaekKorea Institute of Science and Technology (KIST)Email được xác minh tại kist.re.kr