Takip et
Thomas Höche
Thomas Höche
Fraunhofer Institute for Microstructure of Materials and Systems IMWS
imws.fraunhofer.de üzerinde doğrulanmış e-posta adresine sahip - Ana Sayfa
Başlık
Alıntı yapanlar
Alıntı yapanlar
Yıl
Updated definition of glass-ceramics
J Deubener, M Allix, MJ Davis, A Duran, T Höche, T Honma, T Komatsu, ...
Journal of Non-Crystalline Solids 501, 3-10, 2018
3672018
Sr[Li2Al2O2N2]:Eu2+—A high performance red phosphor to brighten the future
GJ Hoerder, M Seibald, D Baumann, T Schröder, S Peschke, PC Schmid, ...
Nature communications 10 (1), 1824, 2019
3072019
Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: Experiment and theory
B Ziberi, F Frost, T Höche, B Rauschenbach
Physical Review B—Condensed Matter and Materials Physics 72 (23), 235310, 2005
2712005
Experimental evidence of self-limited growth of nanocrystals in glass
S Bhattacharyya, C Bocker, T Heil, JR Jinschek, T Höche, C Rüssel, ...
Nano letters 9 (6), 2493-2496, 2009
1632009
Microstructure-property relationship in high-strength MgO–Al2O3–SiO2–TiO2 glass-ceramics
P Wange, T Höche, C Rüssel, JD Schnapp
Journal of non-crystalline solids 298 (2-3), 137-145, 2002
1512002
The shape and ordering of self-organized nanostructures by ion sputtering
F Frost, B Ziberi, T Höche, B Rauschenbach
Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2004
1312004
Direct Evidence of Al-Rich Layers around Nanosized ZrTiO4 in Glass: Putting the Role of Nucleation Agents in Perspective
S Bhattacharyya, T Höche, JR Jinschek, I Avramov, R Wurth, M Müller, ...
Crystal growth & design 10 (1), 379-385, 2010
1302010
Transparent semiconducting ZnO: Al thin films prepared by spray pyrolysis
WT Seeber, MO Abou-Helal, S Barth, D Beil, T Höche, HH Afify, ...
Materials Science in Semiconductor Processing 2 (1), 45-55, 1999
1181999
Size distribution of BaF2 nanocrystallites in transparent glass ceramics
C Bocker, S Bhattacharyya, T Höche, C Rüssel
Acta materialia 57 (20), 5956-5963, 2009
1072009
Highly ordered self-organized dot patterns on Si surfaces by low-energy ion-beam erosion
B Ziberi, F Frost, B Rauschenbach, T Höche
Applied Physics Letters 87 (3), 2005
962005
High‐Resolution Transmission Electron Microscopy Studies of a Near Σ11 Grain Boundary in α‐Alumina
T Höche, PR Kenway, HJ Kleebe, M Rühle, PA Morris
Journal of the American Ceramic Society 77 (2), 339-348, 1994
891994
Ring‐Opening Metathesis Polymerization Based Pore‐Size‐Selective Functionalization of Glycidyl Methacrylate Based Monolithic Media: Access to Size‐Stable Nanoparticles for …
R Bandari, T Höche, A Prager, K Dirnberger, MR Buchmeiser
Chemistry–A European Journal 16 (15), 4650-4658, 2010
872010
Design of oxy-fluoride glass-ceramics containing NaLaF4 nano-crystals
A de Pablos-Martín, GC Mather, F Muñoz, S Bhattacharyya, T Höche, ...
Journal of non-crystalline solids 356 (52-54), 3071-3079, 2010
832010
Crystallization Kinetics of LaF3 Nanocrystals in an Oxyfluoride Glass
A de Pablos‐Martín, N Hémono, GC Mather, S Bhattacharyya, T Höche, ...
Journal of the American Ceramic Society 94 (8), 2420-2428, 2011
792011
Phenomenology of iron-assisted ion beam pattern formation on Si (001)
S Macko, F Frost, M Engler, D Hirsch, T Höche, J Grenzer, T Michely
New Journal of Physics 13 (7), 073017, 2011
782011
Etching of CuInSe2 thin films—comparison of femtosecond and picosecond laser ablation
D Ruthe, K Zimmer, T Höche
Applied surface science 247 (1-4), 447-452, 2005
782005
The crystal structure of Sr2TiSi2O8
T Höche, W Neumann, S Esmaeilzadeh, R Uecker, M Lentzen, C Rüssel
Journal of Solid State Chemistry 166 (1), 15-23, 2002
762002
Phase formation during crystallization of a Li2O-Al2O3-SiO2 glass with ZrO2 as nucleating agent–An X-ray diffraction and (S) TEM-study
E Kleebusch, C Patzig, T Höche, C Rüssel
Ceramics International 43 (13), 9769-9777, 2017
752017
Static-charging mitigation and contamination avoidance by selective carbon coating of TEM samples
T Höche, JW Gerlach, T Petsch
Ultramicroscopy 106 (11-12), 981-985, 2006
742006
Temporal Evolution of Crystallization in MgO–Al2O3–SiO2–ZrO2 Glass Ceramics
C Patzig, T Höche, M Dittmer, C Rüssel
Crystal growth & design 12 (4), 2059-2067, 2012
722012
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