| Efficient planar perovskite solar cells using passivated tin oxide as an electron transport layer Y Lee, S Lee, G Seo, S Paek, KT Cho, AJ Huckaba, M Calizzi, D Choi, ... Advanced Science 5 (6), 1800130, 2018 | 164 | 2018 |
| Enhanced charge collection with passivation of the tin oxide layer in planar perovskite solar cells Y Lee, S Paek, KT Cho, E Oveisi, P Gao, S Lee, JS Park, Y Zhang, ... Journal of Materials Chemistry A 5 (25), 12729-12734, 2017 | 124 | 2017 |
| Review of organic/inorganic thin film encapsulation by atomic layer deposition for a flexible OLED display S Lee, JH Han, SH Lee, GH Baek, JS Park Jom 71 (1), 197-211, 2019 | 105 | 2019 |
| Atomic layer deposited p-type copper oxide thin films and the associated thin film transistor properties W Maeng, SH Lee, JD Kwon, J Park, JS Park Ceramics International 42 (4), 5517-5522, 2016 | 74 | 2016 |
| Performance modulation of transparent ALD indium oxide films on flexible substrates: transition between metal-like conductor and high performance semiconductor states J Sheng, D Choi, SH Lee, J Park, JS Park Journal of Materials Chemistry C 4 (32), 7571-7576, 2016 | 47 | 2016 |
| Enhancing the thermoelectric properties of super-lattice Al2O3/ZnO atomic film via interface confinement JH Lee, TH Park, SH Lee, NW Park, WY Lee, JH Lim, SK Lee, JS Park Ceramics International 42 (13), 14411-14415, 2016 | 38 | 2016 |
| Studies of thermoelectric transport properties of atomic layer deposited gallium-doped ZnO SH Lee, JH Lee, SJ Choi, JS Park Ceramics International 43 (10), 7784-7788, 2017 | 33 | 2017 |
| Molecular layer deposition of indicone and organic-inorganic hybrid thin films as flexible transparent conductor S Lee, GH Baek, JH Lee, TTN Van, AS Ansari, B Shong, JS Park Applied Surface Science 525, 146383, 2020 | 27 | 2020 |
| Facile fabrication of p-type Al2O3/carbon nanocomposite films using molecular layer deposition S Lee, GH Baek, JH Lee, DW Choi, B Shong, JS Park Applied Surface Science 458, 864-871, 2018 | 25 | 2018 |
| Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H2O as a Reactant HM Kim, JH Lee, SH Lee, R Harada, T Shigetomi, S Lee, T Tsugawa, ... Chemistry of Materials, 2021 | 24 | 2021 |
| Atmospheric pressure spatial ALD of Al2O3 thin films for flexible PEALD IGZO TFT application KS Yoo, DG Kim, S Lee, WB Lee, JS Park Ceramics International 48 (13), 18803-18810, 2022 | 21 | 2022 |
| An organic–inorganic hybrid semiconductor for flexible thin film transistors using molecular layer deposition SH Lee, HJ Jeong, KL Han, GH Baek, JS Park Journal of Materials Chemistry C 9 (12), 4322-4329, 2021 | 19 | 2021 |
| A study on the thermoelectric properties of ALD-grown aluminum-doped tin oxide with respect to nanostructure modulations SH Lee, JM Choi, JH Lim, J Park, JS Park Ceramics International 44 (2), 1978-1983, 2018 | 19 | 2018 |
| Thermal Annealing of Molecular Layer-Deposited Indicone Toward Area-Selective Atomic Layer Deposition S Lee, M Kim, GH Baek, H Kim, TTN Van, D Gwak, K Heo, B Shong, ... ACS Applied Materials & Interfaces 12 (38), 43212-43221, 2020 | 18 | 2020 |
| Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition SH Lee, JD Kwon, JH Ahn, JS Park Ceramics International 43 (8), 6580-6584, 2017 | 18 | 2017 |
| Air-stable alucone thin films deposited by molecular layer deposition using a 4-mercaptophenol organic reactant GH Baek, S Lee, JH Lee, JS Park Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 38 (2 …, 2020 | 16 | 2020 |
| Atomic-Layer-Deposited SiOx/SnOx Nanolaminate Structure for Moisture and Hydrogen Gas Diffusion Barriers JH Han, SH Lee, SG Jeong, DY Kim, HL Yang, S Lee, SY Yoo, I Park, ... ACS Applied Materials & Interfaces 13 (33), 39584-39594, 2021 | 15 | 2021 |
| Atomic layer deposition of molybdenum oxide using (NtBu) 2 (NMe2) 2Mo, hydrogen peroxide (H2O2), and ozone (O3) for DRAM application S Lee, HL Yang, B Kim, J Lee, H Lim, JS Park Ceramics International, 2022 | 14 | 2022 |
| Atomic Layer Chemical Vapor Deposition of SiO2 Thin Films Using a Chlorine-free Silicon Precursor for 3D NAND Applications GH Baek, J Baek, H Kim, S Lee, Y Jin, HS Park, DS Kil, S Kim, Y Park, ... Ceramics International, 2021 | 14 | 2021 |
| Facile rearrangement of molecular layer deposited metalcone thin films by electron beam irradiation for area selective atomic layer deposition S Lee, GH Baek, H Kim, YH Kim, JS Park Dalton Transactions 50 (28), 9958-9967, 2021 | 10 | 2021 |
