InAlN/AlN/GaN HEMTs With Regrown Ohmic Contacts andof 370 GHz Y Yue, Z Hu, J Guo, B Sensale-Rodriguez, G Li, R Wang, F Faria, T Fang, ... IEEE Electron Device Letters 33 (7), 988-990, 2012 | 439 | 2012 |
Presence and origin of interface charges at atomic-layer deposited Al2O3/III-nitride heterojunctions S Ganguly, J Verma, G Li, T Zimmermann, H Xing, D Jena Applied physics letters 99 (19), 2011 | 195 | 2011 |
MBE-Regrown Ohmics in InAlN HEMTs With a Regrowth Interface Resistance of 0.05 J Guo, G Li, F Faria, Y Cao, R Wang, J Verma, X Gao, S Guo, E Beam, ... IEEE Electron device letters 33 (4), 525-527, 2012 | 188 | 2012 |
210-GHz InAlN/GaN HEMTs with dielectric-free passivation R Wang, G Li, O Laboutin, Y Cao, W Johnson, G Snider, P Fay, D Jena, ... IEEE electron device letters 32 (7), 892-894, 2011 | 136 | 2011 |
Ultrascaled InAlN/GaN high electron mobility transistors with cutoff frequency of 400 GHz Y Yue, Z Hu, J Guo, B Sensale-Rodriguez, G Li, R Wang, F Faria, B Song, ... Japanese Journal of Applied Physics 52 (8S), 08JN14, 2013 | 130 | 2013 |
Polarization‐engineering in group III‐nitride heterostructures: New opportunities for device design D Jena, J Simon, A Wang, Y Cao, K Goodman, J Verma, S Ganguly, G Li, ... physica status solidi (a) 208 (7), 1511-1516, 2011 | 115 | 2011 |
220-GHz quaternary barrier InAlGaN/AlN/GaN HEMTs R Wang, G Li, J Verma, B Sensale-Rodriguez, T Fang, J Guo, Z Hu, ... IEEE Electron device letters 32 (9), 1215-1217, 2011 | 98 | 2011 |
Polarization-induced GaN-on-insulator E/D mode p-channel heterostructure FETs G Li, R Wang, B Song, J Verma, Y Cao, S Ganguly, A Verma, J Guo, ... IEEE electron device letters 34 (7), 852-854, 2013 | 85 | 2013 |
Quaternary Barrier InAlGaN HEMTs With of 230/300 GHz R Wang, G Li, G Karbasian, J Guo, B Song, Y Yue, Z Hu, O Laboutin, ... IEEE electron device letters 34 (3), 378-380, 2013 | 81 | 2013 |
Strained GaN quantum-well FETs on single crystal bulk AlN substrates M Qi, G Li, S Ganguly, P Zhao, X Yan, J Verma, B Song, M Zhu, K Nomoto, ... Applied Physics Letters 110 (6), 2017 | 72 | 2017 |
Two-dimensional electron gases in strained quantum wells for AlN/GaN/AlN double heterostructure field-effect transistors on AlN G Li, B Song, S Ganguly, M Zhu, R Wang, X Yan, J Verma, V Protasenko, ... Applied physics letters 104 (19), 2014 | 72 | 2014 |
MBE growth of high conductivity single and multiple AlN/GaN heterojunctions Y Cao, K Wang, G Li, T Kosel, H Xing, D Jena Journal of Crystal Growth 323 (1), 529-533, 2011 | 71 | 2011 |
High breakdown single-crystal GaN pn diodes by molecular beam epitaxy M Qi, K Nomoto, M Zhu, Z Hu, Y Zhao, V Protasenko, B Song, X Yan, G Li, ... Applied Physics Letters 107 (23), 2015 | 68 | 2015 |
Ultra-low resistance ohmic contacts to GaN with high Si doping concentrations grown by molecular beam epitaxy F Afroz Faria, J Guo, P Zhao, G Li, P Kumar Kandaswamy, M Wistey, ... Applied Physics Letters 101 (3), 2012 | 68 | 2012 |
Threshold Voltage Control in HEMTs by Work-Function Engineering G Li, T Zimmermann, Y Cao, C Lian, X Xing, R Wang, P Fay, HG Xing, ... IEEE Electron Device Letters 31 (9), 954-956, 2010 | 66 | 2010 |
Quantum transport in graphene nanoribbons patterned by metal masks C Lian, K Tahy, T Fang, G Li, HG Xing, D Jena Applied Physics Letters 96 (10), 2010 | 64 | 2010 |
InGaN channel high-electron-mobility transistors with InAlGaN barrier and fT/fmax of 260/220 GHz R Wang, G Li, G Karbasian, J Guo, F Faria, Z Hu, Y Yue, J Verma, ... Applied Physics Express 6 (1), 016503, 2012 | 57 | 2012 |
Ultrathin body GaN-on-insulator quantum well FETs with regrown ohmic contacts G Li, R Wang, J Guo, J Verma, Z Hu, Y Yue, F Faria, Y Cao, M Kelly, ... IEEE electron device letters 33 (5), 661-663, 2012 | 57 | 2012 |
Metal‐face InAlN/AlN/GaN high electron mobility transistors with regrown ohmic contacts by molecular beam epitaxy J Guo, Y Cao, C Lian, T Zimmermann, G Li, J Verma, X Gao, S Guo, ... physica status solidi (a) 208 (7), 1617-1619, 2011 | 53 | 2011 |
InGaN channel high electron mobility transistor structures grown by metal organic chemical vapor deposition O Laboutin, Y Cao, W Johnson, R Wang, G Li, D Jena, H Xing Applied Physics Letters 100 (12), 2012 | 52 | 2012 |