Ulf Helmersson

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Daniel LundinSenior Associate Professor, Linköping UniversityVerifierad e-postadress på liu.se
Jon Tomas GudmundssonUniversity of IcelandVerifierad e-postadress på hi.is
Johan BöhlmarkPhD Plasma & Coating TechnologyVerifierad e-postadress på ionautics.com
Lars Hultman, Professor, PhDLinköping University, Department of Physics, IFMVerifierad e-postadress på ifm.liu.se
Jones AlamiProfessor, Mohammed VI Polytechnic University (UM6P)Verifierad e-postadress på um6p.ma
Jochen M. SchneiderProfessor, Materials Chemistry, RWTH Aachen UniversityVerifierad e-postadress på mch.rwth-aachen.de
Ivan PetrovMRL, Univ. of Illinois; Physics, Linköping UniversityVerifierad e-postadress på illinois.edu
Joe GreeneProfessor of Materials Science and Physics, University of IllinoisVerifierad e-postadress på uiuc.edu
Denis MusicDepartment of Materials Science and Applied Mathematics, Malmö UniversityVerifierad e-postadress på mau.se
RD BoydLinköping UniversityVerifierad e-postadress på ifm.liu.se
Montri AiempanakitAssistant Professor, Department of Physics, Faculty of Science, Silpakorn UniversityVerifierad e-postadress på su.ac.th
Reine WallenbergProfessor of Solid State Chemistry, Lund UniversityVerifierad e-postadress på chem.lu.se
Per EklundUppsala UniversityVerifierad e-postadress på kemi.uu.se
Scott BarnettProfessor of Materials Science, Northwestern UniversityVerifierad e-postadress på northwestern.edu
Tomas KubartSolid State Electronics, Uppsala UniversityVerifierad e-postadress på angstrom.uu.se
Tetsuhide ShimizuTokyo Metropolitan UniversityVerifierad e-postadress på tmu.ac.jp
Eva OlssonProfessor, Department of Physics, Chalmers University of TechnologyVerifierad e-postadress på chalmers.se
Sveinn ÓlafssonResearch Professor Science Institute University of IcelandVerifierad e-postadress på hi.is
Spartak GevorgianProfessor, Microwave Electronics, Chalmers UniversityVerifierad e-postadress på chalmers.se
Hans HögbergLektor Linköpings universitetVerifierad e-postadress på liu.se

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Ulf Helmersson

Professor, Linköping University

Verifierad e-postadress på liu.se

Thin films Nanoparticles HiPIMS Surface Science


Titel Sortera efter citat Sortera efter år Sortera efter titel	Citeras av Citeras av	År
Ionized physical vapor deposition (IPVD): A review of technology and applications U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ... Thin solid films 513 (1-2), 1-24, 2006	1410	2006
A novel pulsed magnetron sputter technique utilizing very high target power densities V Kouznetsov, K Macak, JM Schneider, U Helmersson, I Petrov Surface and coatings technology 122 (2-3), 290-293, 1999	1395	1999
Growth of single‐crystal TiN/VN strained‐layer superlattices with extremely high mechanical hardness U Helmersson, S Todorova, SA Barnett, JE Sundgren, LC Markert, ... Journal of Applied Physics 62 (2), 481-484, 1987	945	1987
High power impulse magnetron sputtering discharge JT Gudmundsson, N Brenning, D Lundin, U Helmersson Journal of vacuum science & technology A 30 (3), 2012	833	2012
On the film density using high power impulse magnetron sputtering M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ... Surface and Coatings Technology 205 (2), 591-596, 2010	485	2010
Optical properties of anatase TiO2 thin films prepared by aqueous sol–gel process at low temperature Z Wang, U Helmersson, PO Käll Thin Solid Films 405 (1-2), 50-54, 2002	446	2002
Influence of high power densities on the composition of pulsed magnetron plasmas AP Ehiasarian, R New, WD Münz, L Hultman, U Helmersson, ... Vacuum 65 (2), 147-154, 2002	414	2002
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ... Thin Solid Films 515 (4), 1522-1526, 2006	401	2006
Microstructure modification of TiN by ion bombardment during reactive sputter deposition I Petrov, L Hultman, U Helmersson, JE Sundgren, JE Greene Thin Solid Films 169 (2), 299-314, 1989	380	1989
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge K Macák, V Kouznetsov, J Schneider, U Helmersson, I Petrov Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000	370	2000
Ionization of sputtered metals in high power pulsed magnetron sputtering J Bohlmark, J Alami, C Christou, AP Ehiasarian, U Helmersson Journal of Vacuum Science & Technology A 23 (1), 18-22, 2005	352	2005
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ... Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005	303	2005
Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered … AP Ehiasarian, PE Hovsepian, L Hultman, U Helmersson Thin solid films 457 (2), 270-277, 2004	299	2004
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Surface and Coatings Technology 161 (2-3), 249-256, 2002	281	2002
High power pulsed magnetron sputtered CrNx films AP Ehiasarian, WD Münz, L Hultman, U Helmersson, I Petrov Surface and coatings technology 163, 267-272, 2003	247	2003
A spectroscopic ellipsometry study of cerium dioxide thin films grown on sapphire by rf magnetron sputtering S Guo, H Arwin, SN Jacobsen, K Järrendahl, U Helmersson Journal of Applied physics 77 (10), 5369-5376, 1995	234	1995
Low‐temperature superionic conductivity in strained yttria‐stabilized zirconia M Sillassen, P Eklund, N Pryds, E Johnson, U Helmersson, J Bøttiger Advanced Functional Materials 20 (13), 2071-2076, 2010	197	2010
Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel M Lattemann, AP Ehiasarian, J Bohlmark, PÅO Persson, U Helmersson Surface and Coatings Technology 200 (22-23), 6495-6499, 2006	192	2006
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Applied Physics Letters 78 (22), 3427-3429, 2001	190	2001
Hysteresis-free reactive high power impulse magnetron sputtering E Wallin, U Helmersson Thin Solid Films 516 (18), 6398-6401, 2008	187	2008

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