| The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO) JR Lemen, AM Title, DJ Akin, PF Boerner, C Chou, JF Drake, DW Duncan, ... Solar Physics 275, 17-40, 2012 | 4640 | 2012 |
| Initial Calibration of the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO) P Boerner, C Edwards, J Lemen, A Rausch, C Schrijver, R Shine, L Shing, ... The Solar Dynamics Observatory, 41-66, 2012 | 480 | 2012 |
| Probing eV-scale axions with CAST E Arik, S Aune, D Autiero, K Barth, A Belov, B Beltrán, S Borghi, G Bourlis, ... Journal of Cosmology and Astroparticle Physics 2009 (02), 008, 2009 | 369 | 2009 |
| Coherence properties of individual femtosecond pulses of an x-ray free-electron laser IA Vartanyants, A Singer, AP Mancuso, OM Yefanov, A Sakdinawat, Y Liu, ... Physical review letters 107 (14), 144801, 2011 | 188 | 2011 |
| Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet KM Skulina, CS Alford, RM Bionta, DM Makowiecki, EM Gullikson, ... Applied Optics 34 (19), 3727-3730, 1995 | 139 | 1995 |
| The soft x-ray instrument for materials studies at the linac coherent light source x-ray free-electron laser WF Schlotter, JJ Turner, M Rowen, P Heimann, M Holmes, O Krupin, ... Review of Scientific Instruments 83 (4), 2012 | 136 | 2012 |
| Pulse-dilation enhanced gated optical imager with 5 ps resolution TJ Hilsabeck, JD Hares, JD Kilkenny, PM Bell, AKL Dymoke-Bradshaw, ... Review of Scientific Instruments 81 (10), 2010 | 134 | 2010 |
| Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet–soft-x-ray region R Soufli, EM Gullikson Applied Optics 36 (22), 5499-5507, 1997 | 123 | 1997 |
| Linac Coherent Light Source soft x-ray materials science instrument optical design and monochromator commissioning P Heimann, O Krupin, WF Schlotter, J Turner, J Krzywinski, F Sorgenfrei, ... Review of Scientific Instruments 82 (9), 2011 | 114 | 2011 |
| Predicting the coherent X-ray wavefront focal properties at the Linac Coherent Light Source (LCLS) X-ray free electron laser A Barty, R Soufli, T McCarville, SL Baker, MJ Pivovaroff, P Stefan, ... Optics express 17 (18), 15508-15519, 2009 | 87 | 2009 |
| Optical constants of magnetron-sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV R Soufli, AL Aquila, F Salmassi, M Fernández-Perea, EM Gullikson Applied optics 47 (25), 4633-4639, 2008 | 84 | 2008 |
| System integration and performance of the EUV engineering test stand DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ... Emerging Lithographic Technologies V 4343, 19-37, 2001 | 83 | 2001 |
| Temporal cross-correlation of x-ray free electron and optical lasers using soft x-ray pulse induced transient reflectivity O Krupin, M Trigo, WF Schlotter, M Beye, F Sorgenfrei, JJ Turner, DA Reis, ... Optics Express 20 (10), 11396-11406, 2012 | 82 | 2012 |
| Absolute pulse energy measurements of soft x-rays at the Linac Coherent Light Source K Tiedtke, AA Sorokin, U Jastrow, P Juranić, S Kreis, N Gerken, M Richter, ... Optics express 22 (18), 21214-21226, 2014 | 80 | 2014 |
| Photon beamlines and diagnostics at LCLS S Moeller, J Arthur, A Brachmann, R Coffee, FJ Decker, Y Ding, D Dowell, ... Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2011 | 79 | 2011 |
| Absolute photoabsorption measurements of molybdenum in the range 60–930 eV for optical constant determination R Soufli, EM Gullikson Applied Optics 37 (10), 1713-1719, 1998 | 78 | 1998 |
| Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory R Soufli, DL Windt, JC Robinson, SL Baker, E Spiller, FJ Dollar, AL Aquila, ... Solar Physics and Space Weather Instrumentation 5901, 173-183, 2005 | 69 | 2005 |
| Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 64 | 2002 |
| Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography R Soufli, RM Hudyma, E Spiller, EM Gullikson, MA Schmidt, JC Robinson, ... Applied optics 46 (18), 3736-3746, 2007 | 58 | 2007 |
| Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution R Soufli, EA Spiller, MA Schmidt, C Davidson, RF Grabner, EM Gullikson, ... Emerging Lithographic Technologies V 4343, 51-59, 2001 | 57 | 2001 |