| Detection of steps in single molecule data T Aggarwal, D Materassi, R Davison, T Hays, M Salapaka Cellular and molecular bioengineering 5, 14-31, 2012 | 44 | 2012 |
| Real-time nonlinear correction of back-focal-plane detection in optical tweezers T Aggarwal, M Salapaka Review of Scientific Instruments 81 (12), 2010 | 24 | 2010 |
| Gas mixture control in a gas discharge light source R Ahlawat, T Aggarwal US Patent 9,819,136, 2017 | 15 | 2017 |
| High bandwidth optical force clamp for investigation of molecular motor motion S Roychowdhury, T Aggarwal, S Salapaka, MV Salapaka Applied Physics Letters 103 (15), 2013 | 14 | 2013 |
| High bandwidth force estimation for optical tweezers H Sehgal, T Aggarwal, MV Salapaka Applied Physics Letters 94 (15), 2009 | 14 | 2009 |
| ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES J JON THORNES, T AGGARWAL, KM O'BRIEN, F EVERTS, ... US Patent App. WO2016US57552 20/161,018, 2017 | 13 | 2017 |
| Characterization of dual beam optical tweezers system using a novel detection approach H Sehgal, T Aggarwal, M Salapaka 2007 American Control Conference, 4234-4239, 2007 | 7 | 2007 |
| Robust control approach to force estimation in a constant position optical tweezers T Aggarwal, H Sehgal, M Salapaka Review of Scientific Instruments 82 (11), 2011 | 6 | 2011 |
| Systems approach to identification of feedback enhanced optical tweezers H Sehgal, T Aggarwal, MV Salapaka Optical Trapping and Optical Micromanipulation V 7038, 427-436, 2008 | 6 | 2008 |
| Novel tools for biophysics research T Aggarwal University of Minnesota, 2012 | 4 | 2012 |
| Intelligent Control of Group Elevators A Tanuj Departament of Aerospace Engineering, Munbai, India, 2004 | 4 | 2004 |
| Gas optimization in a gas discharge light source T Aggarwal US Patent 9,634,455, 2017 | 3 | 2017 |
| Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography R Burdt, J Thornes, T Duffey, T Bibby, R Rokitski, E Mason, J Melchior, ... Optical Microlithography XXVII 9052, 705-711, 2014 | 3 | 2014 |
| Lithography system bandwidth control T Aggarwal US Patent 10,833,471, 2020 | 2 | 2020 |
| New ArF immersion light source introduces technologies for high-volume 14nm manufacturing and beyond T Cacouris, W Conley, J Thornes, T Bibby, J Melchior, T Aggarwal, ... Optical Microlithography XXVIII 9426, 301-305, 2015 | 2 | 2015 |
| Lithographic apparatus and method F Everts, WPEM OP'T, HP Godfried, JJ Thornes, KM O'Brien, ... US Patent 10,627,724, 2020 | 1 | 2020 |
| Gas optimization in a gas discharge light source T Aggarwal US Patent 10,218,147, 2019 | 1 | 2019 |
| Method for dither free adaptive and robust dose control for photolithography T Aggarwal US Patent 10,096,969, 2018 | 1 | 2018 |
| Learning and estimation of single molecule behavior S Rajaganapathy, J Melbourne, T Aggarwal, R Shrivastava, MV Salapaka 2018 Annual American Control Conference (ACC), 5125-5130, 2018 | 1 | 2018 |
| Controller for an optical system T Aggarwal US Patent 9,939,732, 2018 | 1 | 2018 |
Donatello MaterassiAssociate Professor, University of MinnesotaPreverjeni e-poštni naslov na umn.edu
