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Dagmar Gregusova
Dagmar Gregusova
Неизвестная организация
Подтвержден адрес электронной почты в домене savba.sk - Главная страница
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Процитировано
Процитировано
Год
Investigation of trapping effects in AlGaN/GaN/Si field-effect transistors by frequency dependent capacitance and conductance analysis
R Stoklas, D Gregušová, J Novák, A Vescan, P Kordoš
Applied Physics Letters 93 (12), 2008
1282008
Characterization of AlGaN/GaN metal-oxide-semiconductor field-effect transistors by frequency dependent conductance analysis
P Kordoš, R Stoklas, D Gregušová, J Novák
Applied Physics Letters 94 (22), 2009
892009
Controlling surface/interface states in GaN-based transistors: Surface model, insulated gate, and surface passivation
JT Asubar, Z Yatabe, D Gregusova, T Hashizume
Journal of Applied Physics 129 (12), 2021
872021
AlGaN/GaN metal–oxide–semiconductor heterostructure field-effect transistors with 4 nm thick Al2O3 gate oxide
D Gregušová, R Stoklas, K Čičo, T Lalinský, P Kordoš
Semiconductor science and technology 22 (8), 947, 2007
842007
Improved transport properties of Al2O3∕ AlGaN∕ GaN metal-oxide-semiconductor heterostructure field-effect transistor
P Kordoš, D Gregušová, R Stoklas, K Čičo, J Novák
Applied physics letters 90 (12), 2007
842007
Bulk and interface trapping in the gate dielectric of GaN based metal-oxide-semiconductor high-electron-mobility transistors
M Ťapajna, M Jurkovič, L Válik, Š Haščík, D Gregušová, F Brunner, ...
Applied Physics Letters 102 (24), 2013
692013
Trap states in AlGaN/GaN metal-oxide-semiconductor structures with Al2O3 prepared by atomic layer deposition
D Gregušová, R Stoklas, C Mizue, Y Hori, J Novák, T Hashizume, ...
Journal of Applied Physics 107 (10), 2010
662010
Transport properties of AlGaN/GaN metal–oxide–semiconductor heterostructure field-effect transistors with Al2O3 of different thickness
P Kordoš, D Gregušová, R Stoklas, Š Gaži, J Novák
Solid-state electronics 52 (6), 973-979, 2008
662008
Investigation of trap effects in AlGaN∕ GaN field-effect transistors by temperature dependent threshold voltage analysis
P Kordoš, D Donoval, M Florovič, J Kováč, D Gregušová
Applied Physics Letters 92 (15), 2008
632008
Impact of GaN cap on charges in Al2O3/(GaN/) AlGaN/GaN metal-oxide-semiconductor heterostructures analyzed by means of capacitance measurements and simulations
M Ťapajna, M Jurkovič, L Válik, Š Haščík, D Gregušová, F Brunner, ...
Journal of Applied Physics 116 (10), 2014
532014
Trapping effects in Al2O3/AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistor investigated by temperature dependent conductance measurements
P Kordoš, R Stoklas, D Gregušová, Š Gaži, J Novák
Applied Physics Letters 96 (1), 2010
522010
Hot-electron-related degradation in InAlN/GaN high-electron-mobility transistors
M Ťapajna, N Killat, V Palankovski, D Gregušová, K Čičo, JF Carlin, ...
IEEE Transactions on Electron Devices 61 (8), 2793-2801, 2014
462014
Direct electro-optical pumping for hybrid CdSe nanocrystal/III-nitride based nano-light-emitting diodes
M Mikulics, YC Arango, A Winden, R Adam, A Hardtdegen, ...
Applied Physics Letters 108 (6), 2016
452016
The effect of passivation on the performance of AlGaN/GaN heterostructure field-effect transistors
P Kordoš, P Kúdela, D Gregušová, D Donoval
Semiconductor science and technology 21 (12), 1592, 2006
412006
Electrical properties of InAlN/GaN high electron mobility transistor with Al2O3, ZrO2, and GdScO3 gate dielectrics
K Čičo, K Hušeková, M Ťapajna, D Gregušová, R Stoklas, J Kuzmík, ...
Journal of Vacuum Science & Technology B 29 (1), 2011
392011
Schottky-barrier normally off GaN/InAlN/AlN/GaN HEMT with selectively etched access region
M Jurkovic, D Gregusova, V Palankovski, Š Hascik, M Blaho, K Cico, ...
IEEE electron device letters 34 (3), 432-434, 2013
382013
Adjustment of threshold voltage in AlN/AlGaN/GaN high-electron mobility transistors by plasma oxidation and Al2O3 atomic layer deposition overgrowth
D Gregušová, M Jurkovič, Š Haščík, M Blaho, A Seifertová, J Fedor, ...
Applied Physics Letters 104 (1), 2014
352014
High-temperature performance of AlGaN/GaN HFETs and MOSHFETs
D Donoval, M Florovič, D Gregušová, J Kováč, P Kordoš
Microelectronics Reliability 48 (10), 1669-1672, 2008
352008
Formation of GaAs three-dimensional objects using AlAs “facet-forming” sacrificial layer and based solution
V Cambel, D Gregušová, R Kúdela
Journal of applied physics 94 (7), 4643-4648, 2003
332003
Influence of passivation induced stress on the performance of AlGaN/GaN HEMTs
D Gregušová, J Bernát, M Držík, M Marso, J Novák, F Uherek, P Kordoš
physica status solidi (c) 2 (7), 2619-2622, 2005
322005
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