| Linear alkane polymerization on a gold surface D Zhong, JH Franke, SK Podiyanachari, T Blömker, H Zhang, G Kehr, ... Science 334 (6053), 213-216, 2011 | 374 | 2011 |
| Glaser coupling at metal surfaces HY Gao, H Wagner, D Zhong, JH Franke, A Studer, H Fuchs Angewandte Chemie International Edition 52 (14), 4024-4028, 2013 | 346 | 2013 |
| Electronic structure of spatially aligned graphene nanoribbons on Au (788) S Linden, D Zhong, A Timmer, N Aghdassi, JH Franke, H Zhang, X Feng, ... Physical review letters 108 (21), 216801, 2012 | 271 | 2012 |
| On-surface azide–alkyne cycloaddition on Au (111) O Diaz Arado, H Monig, H Wagner, JH Franke, G Langewisch, PA Held, ... ACS nano 7 (10), 8509-8515, 2013 | 129 | 2013 |
| Effect of metal surfaces in on-surface Glaser coupling HY Gao, JH Franke, H Wagner, D Zhong, PA Held, A Studer, H Fuchs The Journal of Physical Chemistry C 117 (36), 18595-18602, 2013 | 109 | 2013 |
| Surface Supported Gold–Organic Hybrids: On‐Surface Synthesis and Surface Directed Orientation H Zhang, JH Franke, D Zhong, Y Li, A Timmer, OD Arado, H Mönig, ... Small 10 (7), 1361-1368, 2014 | 74 | 2014 |
| Role of the van der Waals interactions on the bonding mechanism of pyridine on Cu (110) and Ag (110) surface: First-principles study N Atodiresei, V Caciuc, JH Franke, S Blügel Physical Review B—Condensed Matter and Materials Physics 78 (4), 045411, 2008 | 70 | 2008 |
| SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform J Bekaert, P Di Lorenzo, M Mao, S Decoster, S Larivière, JH Franke, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 73-87, 2017 | 34 | 2017 |
| Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations JH Franke, J Bekaert, V Blanco, L Van Look, F Wahlisch, K Lyakhova, ... International Conference on Extreme Ultraviolet Lithography 2019 11147, 50-69, 2019 | 30 | 2019 |
| Fundamental understanding and experimental verification of bright versus dark field imaging N Davydova, J Finders, J McNamara, E van Setten, C van Lare, ... Extreme Ultraviolet Lithography 2020 11517, 40-57, 2020 | 21 | 2020 |
| Manipulating surface diffusion ability of single molecules by scanning tunneling microscopy DY Zhong, J Franke, T Blomker, G Erker, LF Chi, H Fuchs Nano Letters 9 (1), 132-136, 2009 | 21 | 2009 |
| Hyper NA EUV lithography: an imaging perspective I Lee, JH Franke, V Philipsen, K Ronse, S De Gendt, E Hendrickx Journal of Micro/Nanopatterning, Materials, and Metrology 22 (4), 043202-043202, 2023 | 19 | 2023 |
| Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align JH Franke, A Frommhold, N Davydova, R Aubert, VV Nair, T Kovalevich, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 43-62, 2021 | 19 | 2021 |
| On-surface reductive coupling of aldehydes on Au (111) OD Arado, H Mönig, JH Franke, A Timmer, PA Held, A Studer, H Fuchs Chemical communications 51 (23), 4887-4890, 2015 | 19 | 2015 |
| Adsorption of lactic acid on chiral Pt surfaces—A density functional theory study JH Franke, DS Kosov The Journal of Chemical Physics 138 (8), 2013 | 15 | 2013 |
| Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask T Kovalevich, L Van Look, JH Franke, V Philipsen Journal of Micro/Nanopatterning, Materials, and Metrology 22 (2), 024401-024401, 2023 | 12 | 2023 |
| Towards high NA patterning readiness: materials, processes and etch transfer for P24 Line Space A Thiam, JG Santaclara, JH Franke, F Schleicher, R Blanc, P Bezard, ... International Conference on Extreme Ultraviolet Lithography 2021 11854, 32-45, 2021 | 12 | 2021 |
| Dual monopole exposure strategy to improve extreme ultraviolet imaging JH Franke, TA Brunner, E Hendrickx Journal of Micro/Nanopatterning, Materials, and Metrology 21 (3), 030501-030501, 2022 | 11 | 2022 |
| Tomorrow’s pitches on today’s 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes JH Franke, N Davydova, J Bekaert, V Wiaux, VV Nair, A van Dijk, E Wang, ... Extreme Ultraviolet Lithography 2020 11517, 115-127, 2021 | 11 | 2021 |
| Extending 0.33 NA EUVL to 28 nm pitch using alternative mask and controlled aberrations D Rio, P Van Adrichem, M Delorme, K Lyakhova, C Spence, JH Franke Extreme Ultraviolet (EUV) Lithography XII 11609, 63-78, 2021 | 10 | 2021 |
