| Towards outperforming conventional sensor arrays with fabricated individual photonic vapour sensors inspired by Morpho butterflies RA Potyrailo, RK Bonam, JG Hartley, TA Starkey, P Vukusic, M Vasudev, ... Nature communications 6 (1), 7959, 2015 | 209 | 2015 |
| Building a better methane generation model: Validating models with methane recovery rates from 35 Canadian landfills S Thompson, J Sawyer, R Bonam, JE Valdivia Waste management 29 (7), 2085-2091, 2009 | 199 | 2009 |
| Discovery of the surface polarity gradient on iridescent Morpho butterfly scales reveals a mechanism of their selective vapor response RA Potyrailo, TA Starkey, P Vukusic, H Ghiradella, M Vasudev, T Bunning, ... Proceedings of the National Academy of Sciences 110 (39), 15567-15572, 2013 | 102 | 2013 |
| Direct bonded heterogeneous integration (DBHi) Si bridge K Sikka, R Bonam, Y Liu, P Andry, D Parekh, A Jain, M Bergendahl, ... 2021 IEEE 71st Electronic Components and Technology Conference (ECTC), 136-147, 2021 | 47 | 2021 |
| Performance characterization of negative resists for sub-10-nm electron beam lithography R Bonam, P Verhagen, A Munder, J Hartley Journal of Vacuum Science & Technology B 28 (6), C6C34-C6C40, 2010 | 24 | 2010 |
| Clock-free nanowire crossbar architecture based on null convention logic (ncl) R Bonam, S Chaudhary, Y Yellambalase, M Choi 2007 7th IEEE Conference on Nanotechnology (IEEE NANO), 85-89, 2007 | 20 | 2007 |
| EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection R Bonam, HY Tien, A Chou, L Meli, S Halle, I Wu, X Huang, C Lei, C Kuan, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 382-389, 2016 | 19 | 2016 |
| Deep learning-based detection, classification, and localization of defects in semiconductor processes DV Patel, R Bonam, AA Oberai Journal of Micro/nanolithography, MEMS, and MOEMS 19 (2), 024801-024801, 2020 | 18 | 2020 |
| Modeling landfill gas generation to determine targets and strategies to reduce greenhouse gases from landfills S Thompson, J Sawyer, RK Bonam, S Smith Journal of Solid Waste Technology and Management 34 (1), 27, 2008 | 15 | 2008 |
| EUV photomask defects: what prints, what doesn't, and what is required for HVM J Rankin, ZJ Qi, M Lawliss, E Narita, K Seki, K Badger, R Bonam, S Halle, ... Photomask Technology 2015 9635, 102-113, 2015 | 14 | 2015 |
| Defect-tolerant gate macro mapping & placement in clock-free nanowire crossbar architecture R Bonam, YB Kim, M Choi 22nd IEEE International Symposium on Defect and Fault-Tolerance in VLSI …, 2007 | 14 | 2007 |
| Implementation of Static and Semi-Static Versions of a Bit-Wise Pipelined Dual-Rail NCL 2SComplement Multiplier R Sankar, V Kadiyala, R Bonam, S Kumar, S Mohan, F Kacani, ... 2007 IEEE Region 5 Technical Conference, 228-233, 2007 | 14 | 2007 |
| Printability and actinic AIMS review of programmed mask blank defects E Verduijn, P Mangat, O Wood, J Rankin, Y Chen, F Goodwin, R Capelli, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 112-124, 2017 | 12 | 2017 |
| Characterization of e-beam patterned grating structures using Mueller matrix based scatterometry GR Muthinti, B Peterson, RK Bonam, AC Diebold Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (1), 013018-013018, 2013 | 12 | 2013 |
| Operation and performance of the CNSE Vistec VB300 electron beam lithography system JG Hartley, TR Groves, R Bonam, A Raghunathan, J Ruan, A McClelland, ... Alternative Lithographic Technologies II 7637, 447-456, 2010 | 11 | 2010 |
| Engineering neural networks for improved defect detection and classification D Patel, R Bonam, AA Oberai Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 10 | 2019 |
| Resist having tuned interface hardmask layer for EUV exposure MP Belyansky, RK Bonam, A Desilva, S Halle US Patent 9,929,012, 2018 | 10 | 2018 |
| EUV mask black border evolution C Turley, R Bonam, E Gallagher, J Grohs, M Kagawa, L Kindt, E Narita, ... Photomask Technology 2014 9235, 251-260, 2014 | 9 | 2014 |
| Printability of buried extreme ultraviolet lithography photomask defects K Seki, T Isogawa, M Kagawa, S Akima, Y Kodera, K Badger, ZJ Qi, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 021004-021004, 2016 | 8 | 2016 |
| Methods for fabricating three-dimensional nano-scale structures and devices JG Hartley, RK Bonam US Patent 9,177,817, 2015 | 8 | 2015 |
