Seguir
Michael Hoffmann
Michael Hoffmann
Ferroelectric Memory Company
Email confirmado em ferroelectric-memory.com
Título
Citado por
Citado por
Ano
Stabilizing the ferroelectric phase in doped hafnium oxide
M Hoffmann, U Schroeder, T Schenk, T Shimizu, H Funakubo, O Sakata, ...
Journal of Applied Physics 118 (7), 072006, 2015
5972015
Unveiling the double-well energy landscape in a ferroelectric layer
M Hoffmann, FPG Fengler, M Herzig, T Mittmann, B Max, U Schroeder, ...
Nature, 2019
4122019
Next Generation ferroelectric materials for semiconductor process integration and their applications
T Mikolajick, S Slesazeck, H Mulaosmanovic, MH Park, S Fichtner, ...
Journal of Applied Physics, 2021
3492021
Lanthanum doped hafnium oxide: a robust ferroelectric material
U Schroeder, C Richter, MH Park, T Schenk, M Pesic, M Hoffmann, ...
Inorganic Chemistry, 2018
3462018
Direct Observation of Negative Capacitance in Polycrystalline Ferroelectric HfO2
M Hoffmann, M Pešić, K Chatterjee, AI Khan, S Salahuddin, S Slesazeck, ...
Advanced Functional Materials 26 (47), 8643-8649, 2016
2972016
Complex internal bias fields in ferroelectric hafnium oxide
T Schenk, M Hoffmann, J Ocker, M Pesic, T Mikolajick, U Schroeder
ACS applied materials & interfaces 7 (36), 20224-20233, 2015
2682015
Ferroelectric phase transitions in nanoscale HfO 2 films enable giant pyroelectric energy conversion and highly efficient supercapacitors
M Hoffmann, U Schroeder, C Künneth, A Kersch, S Starschich, U Böttger, ...
Nano Energy 18, 154-164, 2015
2382015
Nonvolatile Random Access Memory and Energy Storage Based on Antiferroelectric Like Hysteresis in ZrO2
M Pešić, M Hoffmann, C Richter, T Mikolajick, U Schroeder
Advanced Functional Materials 26 (41), 7486-7494, 2016
2282016
Ferroelectricity in doped hafnium oxide: materials, properties and devices
U Schroeder, CS Hwang, H Funakubo
Woodhead Publishing, 2019
1762019
On the Stabilization of Ferroelectric Negative Capacitance in Nanoscale Devices
M Hoffmann, M Pesic, S Slesazeck, U Schroeder, T Mikolajick
Nanoscale, 2018
1542018
Hafnia-based Double Layer Ferroelectric Tunnel Junctions as Artificial Synapses for Neuromorphic Computing
B Max, M Hoffmann, H Mulaosmanovic, S Slesazeck, T Mikolajick
ACS Applied Electronic Materials, 2020
1382020
Progress and future prospects of negative capacitance electronics: A materials perspective
M Hoffmann, S Slesazeck, T Mikolajick
APL Materials, 2021
1352021
Demonstration of High-speed Hysteresis-free Negative Capacitance in Ferroelectric Hf0.5Zr0.5O2
M Hoffmann, B Max, T Mittmann, U Schroeder, S Slesazeck, T Mikolajick
International Electron Devices Meeting (IEDM) 2018, 727-730, 2018
1262018
Direct Correlation of Ferroelectric Properties and Memory Characteristics in Ferroelectric Tunnel Junctions
B Max, M Hoffmann, S Slesazeck, T Mikolajick
Journal of the Electron Devices Society, 2019
1132019
On the relationship between field cycling and imprint in ferroelectric Hf0.5Zr0.5O2
FPG Fengler, M Hoffmann, S Slesazeck, T Mikolajick, U Schroeder
Journal of Applied Physics, 2018
1062018
Origin of temperature-dependent ferroelectricity in Si-doped HfO2
MH Park, CC Chung, T Schenk, C Richter, M Hoffmann, S Wirth, JL Jones, ...
Advanced Electronic Materials 4, 1700489, 2018
962018
Bulk depolarization fields as a major contributor to the ferroelectric reliability performance in Lanthanum doped Hf0.5Zr0.5O2 capacitors
F Mehmood, M Hoffmann, PD Lomenzo, C Richter, M Materano, ...
Advanced Materials Interfaces, 2019
942019
Effect of Acceptor Doping on Phase Transitions of HfO2 Thin Films for Energy-Related Applications
MH Park, T Schenk, M Hoffmann, S Knebel, J Gärtner, T Mikolajick, ...
Nano Energy, 2017
942017
Involvement of Unsaturated Switching in the Endurance Cycling of Si‐doped HfO2 Ferroelectric Thin Films
S Li, D Zhou, Z Shi, M Hoffmann, T Mikolajick, U Schroeder
Advanced Electronic Materials, 2000264, 2020
902020
Computing with Ferroelectric FETs: Devices, Models, Systems, and Applications
A Aziz, ET Breyer, A Chen, X Chen, S Datta, SK Gupta, M Hoffmann, ...
DATE conference 2018, 2018
902018
O sistema não pode efectuar a operação agora. Tente mais tarde.
Artigos 1–20