| Ionized physical vapor deposition (IPVD): A review of technology and applications U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ... Thin solid films 513 (1-2), 1-24, 2006 | 1410 | 2006 |
| The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ... Thin Solid Films 515 (4), 1522-1526, 2006 | 401 | 2006 |
| Ionization of sputtered metals in high power pulsed magnetron sputtering J Bohlmark, J Alami, C Christou, AP Ehiasarian, U Helmersson Journal of Vacuum Science & Technology A 23 (1), 18-22, 2005 | 352 | 2005 |
| Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ... Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005 | 303 | 2005 |
| Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel M Lattemann, AP Ehiasarian, J Bohlmark, PÅO Persson, U Helmersson Surface and Coatings Technology 200 (22-23), 6495-6499, 2006 | 192 | 2006 |
| Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering J Alami, P Eklund, JM Andersson, M Lattemann, E Wallin, J Bohlmark, ... Thin Solid Films 515 (7-8), 3434-3438, 2007 | 181 | 2007 |
| Spatial electron density distribution in a high-power pulsed magnetron discharge J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson IEEE Transactions on Plasma Science 33 (2), 346-347, 2005 | 157 | 2005 |
| Guiding the deposition flux in an ionized magnetron discharge J Bohlmark, M Östbye, M Lattemann, H Ljungcrantz, T Rosell, ... Thin Solid Films 515 (4), 1928-1931, 2006 | 140 | 2006 |
| Plasma dynamics in a highly ionized pulsed magnetron discharge J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson Plasma Sources Science and Technology 14 (3), 525, 2005 | 138 | 2005 |
| Microstructure control of CrNx films during high power impulse magnetron sputtering G Greczynski, J Jensen, J Böhlmark, L Hultman Surface and Coatings Technology 205 (1), 118-130, 2010 | 103 | 2010 |
| Measurement of the magnetic field change in a pulsed high current magnetron discharge J Bohlmark, U Helmersson, M VanZeeland, I Axnäs, J Alami, N Brenning Plasma Sources Science and Technology 13 (4), 654, 2004 | 87 | 2004 |
| Industrial-scale deposition of highly adherent CNx films on steel substrates E Broitman, Z Czigány, G Greczynski, J Böhlmark, R Cremer, L Hultman Surface and Coatings Technology 204 (21-22), 3349-3357, 2010 | 53 | 2010 |
| Fundamentals of high power impulse magnetron sputtering J Böhlmark PQDT-Global, 2006 | 37 | 2006 |
| High power impulse magnetron sputtering discharges and thin film growth: A brief review U Helmersson, M Lattemann, J Alami, J Böhlmark, AP Ehiasarian, ... | 35 | 2005 |
| La9. 33Si6O26 electrolyte thin films for IT-SOFC application deposited by a HIPIMS/DC hybrid magnetron sputtering process CY Ma, P Briois, J Böhlmark, F Lapostolle, A Billard Ionics 14 (6), 471-476, 2008 | 31 | 2008 |
| Ultra-hard AlMgB14 coatings fabricated by RF magnetron sputtering from a stoichiometric target AM Grishin, SI Khartsev, J Böhlmark, M Ahlgren JETP letters 100, 680-687, 2015 | 30 | 2015 |
| Reactive film growth of TiN by using high power impulse magnetron sputtering (HIPIMS) J Böhlmark, M Lattemann, H Stranning, T Selinder, J Carlsson, ... | 10 | 2006 |
| Evaluation of arc evaporated coatings on rounded surfaces and sharp edges J Bohlmark, H Blomqvist, L Landälv, S Amerioun, M Ahlgren Materials Science Forum 681, 145-150, 2011 | 8 | 2011 |
| Multilayered coated cutting tool J Böhlmark, H Blomqvist US Patent 8,758,890, 2014 | 7 | 2014 |
| The ion energy distributions in a high power impulse magnetron plasma J Bohlmark, AP Ehiasarian, M Lattemann, J Alami, U Helmersson PROCEEDINGS OF THE ANNUAL TECHNICAL CONFERENCE-SOCIETY OF VACUUM COATERS 48, 470, 2005 | 4 | 2005 |