Ulf Helmersson

Citado por

	Todos	Desde 2020
Citações	18091	4674
Índice h	67	35
Índice i10	171	94

1200

600

300

900

1988198919901991199219931994199519961997199819992000200120022003200420052006200720082009201020112012201320142015201620172018201920202021202220232024202547 81 74 73 81 102 93 102 106 105 108 123 146 142 178 169 236 326 419 374 613 552 692 646 928 928 958 842 914 1067 930 1114 967 969 865 932 733 208

Acesso público

Ver tudo

61 artigos

2 artigos

disponível

não disponível

Com base em autorizações de financiamento

Coautores

Daniel LundinSenior Associate Professor, Linköping UniversityEmail confirmado em liu.se
Jon Tomas GudmundssonUniversity of IcelandEmail confirmado em hi.is
Johan BöhlmarkPhD Plasma & Coating TechnologyEmail confirmado em ionautics.com
Lars Hultman, Professor, PhDLinköping University, Department of Physics, IFMEmail confirmado em ifm.liu.se
Jones AlamiProfessor, Mohammed VI Polytechnic University (UM6P)Email confirmado em um6p.ma
Jochen M. SchneiderProfessor, Materials Chemistry, RWTH Aachen UniversityEmail confirmado em mch.rwth-aachen.de
Ivan PetrovMRL, Univ. of Illinois; Physics, Linköping UniversityEmail confirmado em illinois.edu
Joe GreeneProfessor of Materials Science and Physics, University of IllinoisEmail confirmado em uiuc.edu
Denis MusicDepartment of Materials Science and Applied Mathematics, Malmö UniversityEmail confirmado em mau.se
RD BoydLinköping UniversityEmail confirmado em ifm.liu.se
Montri AiempanakitAssistant Professor, Department of Physics, Faculty of Science, Silpakorn UniversityEmail confirmado em su.ac.th
Reine WallenbergProfessor of Solid State Chemistry, Lund UniversityEmail confirmado em chem.lu.se
Per EklundUppsala UniversityEmail confirmado em kemi.uu.se
Scott BarnettProfessor of Materials Science, Northwestern UniversityEmail confirmado em northwestern.edu
Tomas KubartSolid State Electronics, Uppsala UniversityEmail confirmado em angstrom.uu.se
Tetsuhide ShimizuTokyo Metropolitan UniversityEmail confirmado em tmu.ac.jp
Eva OlssonProfessor, Department of Physics, Chalmers University of TechnologyEmail confirmado em chalmers.se
Sveinn ÓlafssonResearch Professor Science Institute University of IcelandEmail confirmado em hi.is
Spartak GevorgianProfessor, Microwave Electronics, Chalmers UniversityEmail confirmado em chalmers.se
Hans HögbergLektor Linköpings universitetEmail confirmado em liu.se

Seguir

Ulf Helmersson

Professor, Linköping University

Email confirmado em liu.se

Thin films Nanoparticles HiPIMS Surface Science


Título Ordenar por citações Ordenar por ano Ordenar por título	Citado por Citado por	Ano
Ionized physical vapor deposition (IPVD): A review of technology and applications U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ... Thin solid films 513 (1-2), 1-24, 2006	1410	2006
A novel pulsed magnetron sputter technique utilizing very high target power densities V Kouznetsov, K Macak, JM Schneider, U Helmersson, I Petrov Surface and coatings technology 122 (2-3), 290-293, 1999	1395	1999
Growth of single‐crystal TiN/VN strained‐layer superlattices with extremely high mechanical hardness U Helmersson, S Todorova, SA Barnett, JE Sundgren, LC Markert, ... Journal of Applied Physics 62 (2), 481-484, 1987	945	1987
High power impulse magnetron sputtering discharge JT Gudmundsson, N Brenning, D Lundin, U Helmersson Journal of vacuum science & technology A 30 (3), 2012	833	2012
On the film density using high power impulse magnetron sputtering M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ... Surface and Coatings Technology 205 (2), 591-596, 2010	485	2010
Optical properties of anatase TiO2 thin films prepared by aqueous sol–gel process at low temperature Z Wang, U Helmersson, PO Käll Thin Solid Films 405 (1-2), 50-54, 2002	446	2002
Influence of high power densities on the composition of pulsed magnetron plasmas AP Ehiasarian, R New, WD Münz, L Hultman, U Helmersson, ... Vacuum 65 (2), 147-154, 2002	414	2002
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ... Thin Solid Films 515 (4), 1522-1526, 2006	401	2006
Microstructure modification of TiN by ion bombardment during reactive sputter deposition I Petrov, L Hultman, U Helmersson, JE Sundgren, JE Greene Thin Solid Films 169 (2), 299-314, 1989	380	1989
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge K Macák, V Kouznetsov, J Schneider, U Helmersson, I Petrov Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000	370	2000
Ionization of sputtered metals in high power pulsed magnetron sputtering J Bohlmark, J Alami, C Christou, AP Ehiasarian, U Helmersson Journal of Vacuum Science & Technology A 23 (1), 18-22, 2005	352	2005
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ... Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005	303	2005
Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered … AP Ehiasarian, PE Hovsepian, L Hultman, U Helmersson Thin solid films 457 (2), 270-277, 2004	299	2004
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Surface and Coatings Technology 161 (2-3), 249-256, 2002	281	2002
High power pulsed magnetron sputtered CrNx films AP Ehiasarian, WD Münz, L Hultman, U Helmersson, I Petrov Surface and coatings technology 163, 267-272, 2003	247	2003
A spectroscopic ellipsometry study of cerium dioxide thin films grown on sapphire by rf magnetron sputtering S Guo, H Arwin, SN Jacobsen, K Järrendahl, U Helmersson Journal of Applied physics 77 (10), 5369-5376, 1995	234	1995
Low‐temperature superionic conductivity in strained yttria‐stabilized zirconia M Sillassen, P Eklund, N Pryds, E Johnson, U Helmersson, J Bøttiger Advanced Functional Materials 20 (13), 2071-2076, 2010	197	2010
Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel M Lattemann, AP Ehiasarian, J Bohlmark, PÅO Persson, U Helmersson Surface and Coatings Technology 200 (22-23), 6495-6499, 2006	192	2006
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Applied Physics Letters 78 (22), 3427-3429, 2001	190	2001
Hysteresis-free reactive high power impulse magnetron sputtering E Wallin, U Helmersson Thin Solid Films 516 (18), 6398-6401, 2008	187	2008

O sistema não pode efectuar a operação agora. Tente mais tarde.

Artigos 1–20

Citações por ano

Citações duplicadas

Citações unidas

Adicionar coautoresCoautores

Seguir

Citado por

Coautores