Effective electron mobility in Si inversion layers in metal–oxide–semiconductor systems with a high-κ insulator: The role of remote phonon scattering MV Fischetti, DA Neumayer, EA Cartier
Journal of Applied Physics 90 (9), 4587-4608, 2001
1033 2001 Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon DJ DiMaria, E Cartier, D Arnold
Journal of Applied Physics 73 (7), 3367-3384, 1993
907 1993 Mechanism for stress‐induced leakage currents in thin silicon dioxide films DJ DiMaria, E Cartier
Journal of Applied physics 78 (6), 3883-3894, 1995
679 1995 Materials characterization of ZrO2–SiO2 and HfO2–SiO2 binary oxides deposited by chemical solution deposition DA Neumayer, E Cartier
Journal of Applied Physics 90 (4), 1801-1808, 2001
635 2001 Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues EP Gusev, E Cartier, DA Buchanan, M Gribelyuk, M Copel, ...
Microelectronic Engineering 59 (1-4), 341-349, 2001
524 2001 High-resolution depth profiling in ultrathin EP Gusev, M Copel, E Cartier, IJR Baumvol, C Krug, MA Gribelyuk
Applied Physics Letters 76 (2), 176-178, 2000
515 2000 Passivation and depassivation of silicon dangling bonds at the Si/SiO2 interface by atomic hydrogen E Cartier, JH Stathis, DA Buchanan
Applied physics letters 63 (11), 1510-1512, 1993
500 1993 Origin of the threshold voltage instability in SiO2 /HfO2 dual layer gate dielectrics A Kerber, E Cartier, L Pantisano, R Degraeve, T Kauerauf, Y Kim, A Hou, ...
IEEE Electron Device Letters 24 (2), 87-89, 2003
455 2003 Atomic beam deposition of lanthanum-and yttrium-based oxide thin films for gate dielectrics S Guha, E Cartier, MA Gribelyuk, NA Bojarczuk, MC Copel
Applied Physics Letters 77 (17), 2710-2712, 2000
421 2000 Ultrathin high-K gate stacks for advanced CMOS devices EP Gusev, DA Buchanan, E Cartier, A Kumar, D DiMaria, S Guha, ...
International Electron Devices Meeting. Technical Digest (Cat. No. 01CH37224 …, 2001
394 2001 Theory of high-field electron transport and impact ionization in silicon dioxide D Arnold, E Cartier, DJ DiMaria
Physical Review B 49 (15), 10278, 1994
386 1994 Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films A Callegari, E Cartier, M Gribelyuk, HF Okorn-Schmidt, T Zabel
Journal of Applied Physics 90 (12), 6466-6475, 2001
373 2001 Enabling enhanced reliability and mobility for replacement gate planar and finfet structures T Ando, EA Cartier, K Choi, WL Lai, V Narayanan, R Ramachandran
US Patent App. 14/696,015, 2015
371 2015 Nitrogen-containing field effect transistor gate stack containing a threshold voltage control layer formed via deposition of a metal oxide NA Bojarczuk Jr, C Cabral Jr, EA Cartier, MM Frank, EP Gousev, S Guha, ...
US Patent 7,242,055, 2007
366 2007 Threshold voltage instabilities in high-/spl kappa/gate dielectric stacks S Zafar, A Kumar, E Gusev, E Cartier
IEEE Transactions on Device and Materials Reliability 5 (1), 45-64, 2005
358 2005 Gate-all-around silicon nanowire 25-stage CMOS ring oscillators with diameter down to 3 nm S Bangsaruntip, A Majumdar, GM Cohen, SU Engelmann, Y Zhang, ...
2010 symposium on VLSI technology, 21-22, 2010
326 2010 Formation of a stratified lanthanum silicate dielectric by reaction with Si (001) M Copel, E Cartier, FM Ross
Applied Physics Letters 78 (11), 1607-1609, 2001
301 2001 Switching of ferroelectric polarization in epitaxial BaTiO3 films on silicon without a conducting bottom electrode C Dubourdieu, J Bruley, TM Arruda, A Posadas, J Jordan-Sweet, ...
Nature Nanotechnology 8 (10), 748, 2013
300 2013 Anode hole injection and trapping in silicon dioxide DJ DiMaria, E Cartier, DA Buchanan
Journal of applied physics 80 (1), 304-317, 1996
273 1996 Reliability challenges for CMOS technology qualifications with hafnium oxide/titanium nitride gate stacks A Kerber, EA Cartier
IEEE Transactions on Device and Materials Reliability 9 (2), 147-162, 2009
205 2009 Matt CopelIBM TJ Watson Research CenterEmail confirmado em us.ibm.com
Takashi AndoIBM T. J. Watson Research CenterEmail confirmado em us.ibm.comEvgeni GusevQualcommEmail confirmado em qti.qualcomm.com
Guido Groesenekenimec and KU LeuvenEmail confirmado em imec.be
Douglas A. BuchananUniversity of Manitoba, IBMEmail confirmado em umanitoba.ca
James StathisIBM ResearchEmail confirmado em us.ibm.com
Sufi ZafarIBM TJ Watson Research Center, Yorktown Heights, NYEmail confirmado em us.ibm.com
Kisik ChoiIBMEmail confirmado em ibm.com
Lars-Åke RagnarssonimecEmail confirmado em imec.be