| Exposure apparatus and method for producing device N Kobayashi, A Tanimoto, Y Mizuno, K Shiraishi, K Nakano, S Owa US Patent 7,388,649, 2008 | 243 | 2008 |
| Scanning force microscopy of the interaction events between a single molecule of heavy meromyosin and actin H Nakajima, Y Kunioka, K Nakano, K Shimizu, M Seto, T Ando Biochemical and biophysical research communications 234 (1), 178-182, 1997 | 92 | 1997 |
| Exposure apparatus and method for producing device N Kobayashi, A Tanimoto, Y Mizuno, K Shiraishi, K Nakano, S Owa US Patent 8,174,668, 2012 | 75 | 2012 |
| Exposure apparatus, maintaining method and device fabricating method K Nakano, T Fujiwara US Patent App. 12/461,370, 2010 | 53 | 2010 |
| Exposure apparatus and exposure method, maintenance method, and device manufacturing method Y Nagahashi, K Nakano US Patent App. 11/455,779, 2007 | 50 | 2007 |
| Scanning probe microscope K Nakano, T Onuki US Patent 5,656,769, 1997 | 44 | 1997 |
| Current status and future prospect of immersion lithography S Owa, H Nagasaka, K Nakano, Y Ohmura Optical Microlithography XIX 6154, 76-87, 2006 | 36 | 2006 |
| Release of alkalis from reactive andesitic aggregates and fly ashes into pore solution in mortars M Kawamura, M Koike, K Nakano 8th ICAAR, Kyoto, 271-278, 1989 | 35 | 1989 |
| Exposure apparatus and method for producing device N Kobayashi, A Tanimoto, Y Mizuno, K Shiraishi, K Nakano, S Owa US Patent 8,384,877, 2013 | 30 | 2013 |
| Exposure apparatus and method for producing device N Kobayashi, A Tanimoto, Y Mizuno, K Shiraishi, K Nakano, S Owa US Patent 8,072,576, 2011 | 30 | 2011 |
| Exposure method and apparatus, maintenance method, and device manufacturing method K Nakano US Patent App. 12/289,244, 2009 | 29 | 2009 |
| Exposure Apparatus and method for producing device N Kobayashi, A Tanimoto, Y Mizuno, K Shiraishi, K Nakano, S Owa US Patent App. 12/153,234, 2008 | 27 | 2008 |
| Exposure apparatus and method for producing device N Kobayashi, A Tanimoto, Y Mizuno, K Shiraishi, K Nakano, S Owa US Patent 8,169,592, 2012 | 26 | 2012 |
| Exposure apparatus and method for producing device N Kobayashi, A Tanimoto, Y Mizuno, K Shiraishi, K Nakano, S Owa US Patent 8,130,363, 2012 | 26 | 2012 |
| Defectivity data taken with a full-field immersion exposure tool K Nakano, S Nagaoka, S Owa, T Yamamoto, I Malik Presentation at the 2nd International Symposium on Immersion Lithography, 2005 | 20 | 2005 |
| Defect studies of resist process for 193nm immersion lithography T Ando, K Ohmori, S Maemori, T Takayama, K Ishizuka, M Yoshida, ... Advances in Resist Technology and Processing XXIII 6153, 103-110, 2006 | 19 | 2006 |
| Methods for electrostatically chucking an object to an electrostatic chuck that reduce uncorrectable placement error of the object K Nakano US Patent App. 10/264,523, 2003 | 19 | 2003 |
| Probe needle arrangement and movement method for use in an atomic force microscope K Nakano US Patent 6,223,591, 2001 | 19 | 2001 |
| Exposure method and apparatus, maintenance method and device manufacturing method K Nakano US Patent 8,514,366, 2013 | 15 | 2013 |
| Immersion defectivity study with volume production immersion lithography tool for 45 nm node and below K Nakano, S Nagaoka, M Yoshida, Y Iriuchijima, T Fujiwara, K Shiraishi, ... Optical Microlithography XXI 6924, 431-441, 2008 | 15 | 2008 |
