| Organosilicon precursors for interlayer dielectric films with low dielectric constants JL Vincent, ML O'neill, HP Withers Jr, SE Beck, RN Vrtis US Patent 6,583,048, 2003 | 693 | 2003 |
| Mechanical enhancement of dense and porous organosilicate materials by UV exposure AS Lukas, ML O'neill, JL Vincent, RN Vrtis, MD Bitner, EJ Karwacki Jr US Patent 7,098,149, 2006 | 627 | 2006 |
| Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants RN Vrtis, ML O'neill, JL Vincent, AS Lukas, M Xiao, JAT Norman US Patent 6,846,515, 2005 | 614 | 2005 |
| Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants RN Vrtis, ML O'neill, JL Vincent, AS Lukas, M Xiao, JAT Norman US Patent 8,293,001, 2012 | 487 | 2012 |
| Materials and methods of forming controlled void RN Vrtis, D Wu, ML O'neill, MD Bitner, JL Vincent, EJ Karwacki Jr, ... US Patent 8,399,349, 2013 | 436 | 2013 |
| Non-thermal process for forming porous low dielectric constant films AS Lukas, ML O'neill, MD Bitner, JL Vincent, RN Vrtis, EJ Karwacki Jr US Patent 7,404,990, 2008 | 193 | 2008 |
| Non-thermal process for forming porous low dielectric constant films AS Lukas, ML O'neill, MD Bitner, JL Vincent, RN Vrtis, EJ Karwacki Jr US Patent 7,470,454, 2008 | 173 | 2008 |
| Mechanical enhancement of dense and porous organosilicate materials by UV exposure AS Lukas, ML O'neill, JL Vincent, RN Vrtis, MD Bitner, EJ Karwacki Jr US Patent 7,468,290, 2008 | 157 | 2008 |
| Low dielectric constant material and method of processing by CVD ML O'neill, BK Peterson, JL Vincent, RN Vrtis US Patent 6,716,770, 2004 | 117 | 2004 |
| Porous low dielectric constant compositions and methods for making and using same AS Lukas, ML O'neill, EJ Karwacki Jr, RN Vrtis, JL Vincent US Patent 7,332,445, 2008 | 89 | 2008 |
| Rhenium complexes with weakly coordinating solvent ligands, cis-[Re (PR3)(CO) 4 (L)][BArF], L= CH2Cl2, Et2O, NC5F5: Decomposition to chloride-bridged dimers in CH2Cl2 solution J Huhmann-Vincent, BL Scott, GJ Kubas Inorganic Chemistry 38 (1), 115-124, 1999 | 88 | 1999 |
| Highly Electrophilic [Re(CO)4(PR3)]+ Center Binds Et2O and CH2Cl2 and Heterolytically Activates H2 J Huhmann-Vincent, BL Scott, GJ Kubas Journal of the American Chemical Society 120 (27), 6808-6809, 1998 | 83 | 1998 |
| H2 binding to and silane alcoholysis on an electrophilic Mn (I) fragment with tied-back phosphite ligands. X-ray structure of a Mn–CH2Cl2 complex X Fang, J Huhmann-Vincent, BL Scott, GJ Kubas Journal of Organometallic Chemistry 609 (1-2), 95-103, 2000 | 73 | 2000 |
| Fire resistant insulated building panels utilizing intumescent coatings J Vincent, S Hulme, M Listemann, J Grimminger, T Panitzsch, D Morita US Patent App. 11/224,871, 2007 | 69 | 2007 |
| Reactions of H2, silanes, and olefins with superelectrophilic cationic rhenium complexes: heterolytic cleavage of H2 and relation to the structure and function of hydrogenases J Huhmann-Vincent, BL Scott, GJ Kubas Inorganica chimica acta 294 (2), 240-254, 1999 | 68 | 1999 |
| Comparative Binding of H2, N2, and Related Ligands to [Mn(CO)3(PCy3)2]+ and Other 16e Electrophiles. N2 Does Not Coordinate, and H2 Is the Most … A Toupadakis, GJ Kubas, WA King, BL Scott, J Huhmann-Vincent Organometallics 17 (24), 5315-5323, 1998 | 66 | 1998 |
| Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants RN Vrtis, ML O'neill, JL Vincent, AS Lukas, M Xiao, JAT Norman US Patent 7,384,471, 2008 | 61 | 2008 |
| Experimental and Theoretical Studies of Bonding and Oxidative Addition of Germanes and Silanes, EH4-n Ph n (E= Si, Ge; n= 0− 3), to Mo (CO)(diphosphine) 2. The First … JL Vincent, S Luo, BL Scott, R Butcher, CJ Unkefer, CJ Burns, GJ Kubas, ... Organometallics 22 (25), 5307-5323, 2003 | 58 | 2003 |
| Method for enhancing deposition rate of chemical vapor deposition films R Vrtis, A Lukas, M O'Neill, J Vincent, M Bitner, E Karwacki, B Peterson US Patent App. 10/404,190, 2004 | 52 | 2004 |
| Coupling of deuteriosilanes in the presence of Cp2MCl2/nBuLi JY Corey, JL Huhmann, XH Zhu Organometallics 12 (4), 1121-1130, 1993 | 52 | 1993 |
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