| Method of selective silicon nitride etching A Ranjan, V Rastogi, SD Sherpa US Patent 10,381,235, 2019 | 345 | 2019 |
| Synthesis of light‐diffracting assemblies from microspheres and nanoparticles in droplets on a superhydrophobic surface V Rastogi, S Melle, OG Calderón, AA García, M Marquez, OD Velev Advanced Materials 20 (22), 4263-4268, 2008 | 209 | 2008 |
| Measuring agglomerate size distribution and dependence of localized surface plasmon resonance absorbance on gold nanoparticle agglomerate size using analytical ultracentrifugation JM Zook, V Rastogi, RI MacCuspie, AM Keene, J Fagan ACS nano 5 (10), 8070-8079, 2011 | 142 | 2011 |
| Analyzing surfactant structures on length and chirality resolved (6, 5) single-wall carbon nanotubes by analytical ultracentrifugation JA Fagan, M Zheng, V Rastogi, JR Simpson, CY Khripin, ... Acs Nano 7 (4), 3373-3387, 2013 | 101 | 2013 |
| Anisotropic particle synthesis inside droplet templates on superhydrophobic surfaces V Rastogi, AA García, M Marquez, OD Velev Macromolecular rapid communications 31 (2), 190-195, 2010 | 90 | 2010 |
| Development and evaluation of realistic microbioassays in freely suspended droplets on a chip V Rastogi, OD Velev Biomicrofluidics 1 (1), 2007 | 63 | 2007 |
| Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control A Ranjan, M Wang, SD Sherpa, V Rastogi, A Koshiishi, PLG Ventzek Journal of Vacuum Science & Technology A 34 (3), 2016 | 46 | 2016 |
| Method for selectivity enhancement during dry plasma etching V Rastogi, A Ranjan US Patent 9,666,447, 2017 | 39 | 2017 |
| Size and density measurement of core–shell Si nanoparticles by analytical ultracentrifugation K Nontapot, V Rastogi, JA Fagan, V Reipa Nanotechnology 24 (15), 155701, 2013 | 35 | 2013 |
| Method for roughness improvement and selectivity enhancement during arc layer etch via adjustment of carbon-fluorine content V Rastogi, A Ranjan US Patent 9,607,843, 2017 | 30 | 2017 |
| Towards electrical testable SOI devices using Directed Self-Assembly for fin formation CC Liu, C Estrada-Raygoza, H He, M Cicoria, V Rastogi, N Mohanty, ... Alternative Lithographic Technologies VI 9049, 35-46, 2014 | 30 | 2014 |
| Method for roughness improvement and selectivity enhancement during arc layer etch using hydrogen V Rastogi, A Ranjan US Patent 9,576,816, 2017 | 29 | 2017 |
| Method for roughness improvement and selectivity enhancement during arc layer etch using carbon V Rastogi, A Ranjan US Patent 9,530,667, 2016 | 29 | 2016 |
| Driving DSA into volume manufacturing M Somervell, T Yamauchi, S Okada, T Tomita, T Nishi, S Kawakami, ... Advances in Patterning Materials and Processes XXXII 9425, 202-212, 2015 | 21 | 2015 |
| Manufacturability considerations for DSA RA Farrell, ER Hosler, GM Schmid, J Xu, ME Preil, V Rastogi, N Mohanty, ... Advances in Patterning Materials and Processes XXXI 9051, 242-253, 2014 | 16 | 2014 |
| Microfluidic characterization of sustained solute release from porous supraparticles V Rastogi, KP Velikov, OD Velev Physical Chemistry Chemical Physics 12 (38), 11975-11983, 2010 | 16 | 2010 |
| Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP) Y Feurprier, K Lutker-Lee, V Rastogi, H Matsumoto, Y Chiba, A Metz, ... Advanced Etch Technology for Nanopatterning IV 9428, 57-66, 2015 | 15 | 2015 |
| Catalytic wet air oxidation of pulp and paper mill effluent A Garg, S Saha, V Rastogi, S Chand NISCAIR-CSIR, India, 2003 | 14 | 2003 |
| Fin formation using graphoepitaxy DSA for FinFET device fabrication CC Liu, FL Lie, V Rastogi, E Franke, N Mohanty, R Farrell, H Tsai, K Lai, ... Alternative Lithographic Technologies VII 9423, 159-168, 2015 | 13 | 2015 |
| Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality C Montgomery, JS Chun, YJ Fan, SH Jen, M Neisser, KD Cummings, ... Advances in Patterning Materials and Processes XXXII 9425, 550-561, 2015 | 8 | 2015 |
Orlin D VelevNorth Carolina State UniversityZweryfikowany adres z ncsu.edu