Phase-change materials for non-volatile memory devices: from technological challenges to materials science issues P Noé, C Vallée, F Hippert, F Fillot, JY Raty
Semiconductor Science and Technology 33 (1), 013002, 2017
287 2017 A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor K Aumaille, C Vallée, A Granier, A Goullet, F Gaboriau, G Turban
Thin Solid Films 359 (2), 188-196, 2000
187 2000 Resistance switching in HfO2 metal-insulator-metal devices P Gonon, M Mougenot, C Vallée, C Jorel, V Jousseaume, H Grampeix, ...
Journal of Applied Physics 107 (7), 2010
153 2010 Understanding RRAM endurance, retention and window margin trade-off using experimental results and simulations C Nail, G Molas, P Blaise, G Piccolboni, B Sklenard, C Cagli, M Bernard, ...
2016 IEEE International Electron Devices Meeting (IEDM), 4.5. 1-4.5. 4, 2016
140 2016 Modeling of nonlinearities in the capacitance-voltage characteristics of high-k metal-insulator-metal capacitors P Gonon, C Vallée
Applied physics letters 90 (14), 2007
132 2007 Diagnostics in helicon plasmas for deposition A Granier, F Nicolazo, C Vallée, A Goullet, G Turban, B Grolleau
Plasma Sources Science and Technology 6 (2), 147, 1997
115 1997 Optical emission spectra of TEOS and HMDSO derived plasmas used for thin film deposition A Granier, M Vervloet, K Aumaille, C Vallée
Plasma Sources Science and Technology 12 (1), 89, 2003
92 2003 Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect A Rouahi, A Kahouli, F Challali, MP Besland, C Vallée, B Yangui, ...
Journal of Physics D: Applied Physics 46 (6), 065308, 2013
91 2013 Inorganic to organic crossover in thin films deposited from O2/TEOS plasmas C Vallée, A Goullet, A Granier, A van Der Lee, J Durand, C Marliere
Journal of non-crystalline solids 272 (2-3), 163-173, 2000
85 2000 Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps R Vallat, R Gassilloud, B Eychenne, C Vallée
Journal of Vacuum Science & Technology A 35 (1), 2017
79 2017 Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical … C Durand, C Dubourdieu, C Vallée, V Loup, M Bonvalot, O Joubert, ...
Journal of applied physics 96 (3), 1719-1729, 2004
76 2004 Impact of oxidation on Ge2Sb2Te5 and GeTe phase-change properties E Gourvest, B Pelissier, C Vallée, A Roule, S Lhostis, S Maitrejean
Journal of The Electrochemical Society 159 (4), H373, 2012
75 2012 Optical spectroscopic analyses of OH incorporation into A Goullet, C Vallee, A Granier, G Turban
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (5 …, 2000
74 2000 Silicon dioxide deposition in a microwave plasma reactor N Benissad, C Boisse-Laporte, C Vallée, A Granier, A Goullet
Surface and Coatings Technology 116, 868-873, 1999
69 1999 Stress-induced leakage current and trap generation in HfO2 thin films C Mannequin, P Gonon, C Vallée, L Latu-Romain, A Bsiesy, H Grampeix, ...
Journal of Applied Physics 112 (7), 2012
63 2012 N-doped GeTe as performance booster for embedded phase-change memories A Fantini, V Sousa, L Perniola, E Gourvest, JC Bastien, S Maitrejean, ...
2010 International Electron Devices Meeting, 29.1. 1-29.1. 4, 2010
63 2010 High performance metal-insulator-metal capacitor using a SrTiO3/ZrO2 bilayer C Jorel, C Vallée, P Gonon, E Gourvest, C Dubarry, E Defay
Applied Physics Letters 94 (25), 2009
62 2009 Experimental evidence for the role of electrodes and oxygen vacancies in voltage nonlinearities observed in high-k metal-insulator-metal capacitors F El Kamel, P Gonon, C Vallée
Applied Physics Letters 91 (17), 2007
62 2007 Evidence of Germanium precipitation in phase-change Ge1− xTex thin films by Raman scattering E Gourvest, S Lhostis, J Kreisel, M Armand, S Maitrejean, A Roule, ...
Applied Physics Letters 95 (3), 2009
58 2009 Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition C Vallée, M Bonvalot, S Belahcen, T Yeghoyan, M Jaffal, R Vallat, ...
Journal of Vacuum Science & Technology A 38 (3), 2020
56 2020 
Patrice GONONLTM / Université Grenoble Alpes (UGA)Zweryfikowany adres z cea.fr
