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Thermodynamic and kinetic aspects of the intermolecular exciplex formation between 2-methylnaphthalene and aliphatic amines
F Meeus, M Van der Auweraer, FC De Schryver
Journal of the American Chemical Society 102 (12), 4017-4024, 1980
451980
Intramolecular formation and properties of exciplexes in α-Aryl-ω-N, N-dialkylaminoalkanes
AM Swinnen, M Van der Auweraer, FC De Schryver, C Windels, ...
Chemical Physics Letters 95 (4-5), 467-470, 1983
291983
Ground-state conformational control of intramolecular exciplex formation in 1-β-naphthyl-2-n-piperidinoethane
F Meeus, M Van der Auweraer, FC De Schryver
Chemical Physics Letters 74 (2), 218-222, 1980
271980
Structural effects in the intermolecular exciplex formation of 2‐methylnaphthalene and tertiary amines
F Meeus, M Van der Auweraer, JC Dederen, FC De Schryver
Recueil des Travaux Chimiques des Pays‐Bas 98 (4), 220-223, 1979
111979
Low temperature curing maintenance coatings comprising (a) epoxy resin (b) polyamine curing agent (c) polymer containing pendant aminoester groups and (d) organic solvent
JT Huybrechts, FF Meeus
US Patent 4,609,692, 1986
91986
Chip-resistant paint containing epoxyester linear block oligomer
JT Huybrechts, FF Meeus, AT Timmerman
US Patent 4,602,053, 1986
91986
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Artikler 1–6