| New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes G Cunge, B Pelissier, O Joubert, R Ramos, C Maurice Plasma Sources Science and Technology 14 (3), 599, 2005 | 116 | 2005 |
| No cytotoxicity or genotoxicity of graphene and graphene oxide in murine lung epithelial FE1 cells in vitro S Bengtson, K Kling, AM Madsen, AW Noergaard, NR Jacobsen, ... Environmental and molecular mutagenesis 57 (6), 469-482, 2016 | 110 | 2016 |
| Cleaning aluminum fluoride coatings from plasma reactor walls in SiCl4/Cl2 plasmas R Ramos, G Cunge, B Pelissier, O Joubert Plasma Sources Science and Technology 16 (4), 711, 2007 | 77 | 2007 |
| Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas E Sungauer, E Pargon, X Mellhaoui, R Ramos, G Cunge, L Vallier, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 70 | 2007 |
| Enhanced ionic liquid mobility induced by confinement in 1D CNT membranes Q Berrod, F Ferdeghini, P Judeinstein, N Genevaz, R Ramos, A Fournier, ... Nanoscale 8 (15), 7845-7848, 2016 | 67 | 2016 |
| Gas temperature measurement in CF4, SF6, O2, Cl2, and HBr inductively coupled plasmas G Cunge, R Ramos, D Vempaire, M Touzeau, M Neijbauer, N Sadeghi Journal of Vacuum Science & Technology A 27 (3), 471-478, 2009 | 65 | 2009 |
| Radical surface interactions in industrial silicon plasma etch reactors G Cunge, D Vempaire, R Ramos, M Touzeau, O Joubert, P Bodard, ... Plasma Sources Science and Technology 19 (3), 034017, 2010 | 51 | 2010 |
| Influence of the reactor wall composition on radicals' densities and total pressure in Cl2 inductively coupled plasmas: I. Without silicon etching G Cunge, N Sadeghi, R Ramos Journal of Applied Physics 102 (9), 2007 | 42 | 2007 |
| Influence of the reactor wall composition on radicals’ densities and total pressure in Cl2 inductively coupled plasmas: II. During silicon etching G Cunge, N Sadeghi, R Ramos Journal of Applied Physics 102 (9), 2007 | 40 | 2007 |
| Plasma/reactor walls interactions in advanced gate etching processes R Ramos, G Cunge, O Joubert, N Sadeghi, M Mori, L Vallier Thin Solid Films 515 (12), 4846-4852, 2007 | 39 | 2007 |
| A survey of carbon nanotube interconnects for energy efficient integrated circuits A Todri-Sanial, R Ramos, H Okuno, J Dijon, A Dhavamani, M Widlicenus, ... IEEE Circuits and Systems Magazine 17 (2), 47-62, 2017 | 37 | 2017 |
| Direct growth of carbon nanotubes forests on carbon fibers to replace microporous layers in proton exchange membrane fuel cells M Fontana, R Ramos, A Morin, J Dijon Carbon 172, 762-771, 2021 | 34 | 2021 |
| Vertically-aligned carbon nanotubes on aluminum as a light-weight positive electrode for lithium-polysulfide batteries S Liatard, K Benhamouda, A Fournier, R Ramos, C Barchasz, J Dijon Chemical communications 51 (36), 7749-7752, 2015 | 31 | 2015 |
| Near-field artifacts in tip-enhanced Raman spectroscopy R Ramos, MJ Gordon Applied Physics Letters 100 (21), 2012 | 25 | 2012 |
| Measured velocity distribution of sputtered Al atoms perpendicular and parallel to the target R Ramos, G Cunge, M Touzeau, N Sadeghi Journal of Physics D: Applied Physics 41 (15), 152003, 2008 | 23 | 2008 |
| High-yield, in-situ fabrication and integration of horizontal carbon nanotube arrays at the wafer scale for robust ammonia sensors H Guerin, H Le Poche, R Pohle, LS Bernard, E Buitrago, R Ramos, ... Carbon 78, 326-338, 2014 | 21 | 2014 |
| Absorption spectroscopy in BCl3 inductively coupled plasmas: determination of density, rotational, translational and vibrational temperatures of BCl molecule R Ramos, G Cunge, M Touzeau, N Sadeghi Journal of Physics D: Applied Physics 41 (11), 115205, 2008 | 21 | 2008 |
| On the interest of carbon-coated plasma reactor for advanced gate stack etching processes R Ramos, G Cunge, O Joubert Journal of Vacuum Science & Technology A 25 (2), 290-303, 2007 | 18 | 2007 |
| Investigation of Pt-salt-doped-standalone-multiwall carbon nanotubes for on-chip interconnect applications J Liang, R Chen, R Ramos, J Lee, H Okuno, D Kalita, V Georgiev, ... IEEE Transactions on Electron Devices 66 (5), 2346-2352, 2019 | 17 | 2019 |
| Plasma reactor dry cleaning strategy after TiN, TaN and HfO2 etching processes R Ramos, G Cunge, O Joubert Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 17 | 2008 |
