| Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse DL Goldfarb, JJ De Pablo, PF Nealey, JP Simons, WM Moreau, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 217 | 2000 |
| Direct measurement of the reaction front in chemically amplified photoresists EK Lin, CL Soles, DL Goldfarb, BC Trinque, SD Burns, RL Jones, ... Science 297 (5580), 372-375, 2002 | 127 | 2002 |
| Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes DL Goldfarb, AP Mahorowala, GM Gallatin, KE Petrillo, K Temple, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 111 | 2004 |
| Interfacial effects on moisture absorption in thin polymer films BD Vogt, CL Soles, RL Jones, CY Wang, EK Lin, W Wu, SK Satija, ... Langmuir 20 (13), 5285-5290, 2004 | 94 | 2004 |
| Confinement effects on the spatial extent of the reaction front in ultrathin chemically amplified photoresists DL Goldfarb, M Angelopoulos, EK Lin, RL Jones, CL Soles, JL Lenhart, ... Journal of Vacuum Science and Technology-Section B-Microelectronics …, 2001 | 67 | 2001 |
| Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography M Glodde, DL Goldfarb US Patent 10,096,477, 2018 | 63 | 2018 |
| Electrochemical protection of thin film electrodes in solid state nanopores S Harrer, PS Waggoner, B Luan, A Afzali-Ardakani, DL Goldfarb, H Peng, ... Nanotechnology 22 (27), 275304, 2011 | 61 | 2011 |
| Electrochemical characterization of thin film electrodes toward developing a DNA transistor S Harrer, S Ahmed, A Afzali-Ardakani, B Luan, PS Waggoner, X Shao, ... Langmuir 26 (24), 19191-19198, 2010 | 54 | 2010 |
| Thin film confinement effects on the thermal properties of model photoresist polymers CL Soles, EK Lin, JL Lenhart, RL Jones, W Wu, DL Goldfarb, ... Journal of Vacuum Science and Technology-Section B-Microelectronics …, 2001 | 49 | 2001 |
| Pattern collapse mitigation strategies for EUV lithography DL Goldfarb, RL Bruce, JJ Bucchignano, DP Klaus, MA Guillorn, CJ Wu Extreme Ultraviolet (EUV) Lithography III 8322, 40-52, 2012 | 47 | 2012 |
| Dielectric and volumetric properties of supercritical carbon dioxide (1)+ methanol (2) mixtures at 323.15 K DL Goldfarb, DP Fernández, HR Corti Fluid phase equilibria 158, 1011-1019, 1999 | 44 | 1999 |
| Fabrication of a full-size EUV pellicle based on silicon nitride DL Goldfarb Photomask Technology 2015 9635, 60-72, 2015 | 43 | 2015 |
| Acid generation efficiency: EUV photons versus photoelectrons DL Goldfarb, A Afzali-Ardakani, M Glodde Advances in Patterning Materials and Processes XXXIII 9779, 6-18, 2016 | 42 | 2016 |
| Evolution of patterning materials towards the Moore’s Law 2.0 Era DL Goldfarb Japanese Journal of Applied Physics 61 (SD), SD0802, 2022 | 41 | 2022 |
| Chemically amplified resists resolving 25 nm 1: 1 line: space features with EUV lithography JW Thackeray, RA Nassar, R Brainard, D Goldfarb, T Wallow, Y Wei, ... Emerging Lithographic Technologies XI 6517, 394-404, 2007 | 41 | 2007 |
| Image collapse issues in photoresist JP Simons, DL Goldfarb, M Angelopoulos, S Messick, WM Moreau, ... PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 19-29, 2001 | 41 | 2001 |
| Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond) G Landie, Y Xu, S Burns, K Yoshimoto, M Burkhardt, L Zhuang, K Petrillo, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 51-62, 2011 | 39 | 2011 |
| Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure JL Lenhart, RL Jones, EK Lin, CL Soles, W Wu, DA Fischer, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 39 | 2002 |
| Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions Q Lin, DL Goldfarb, M Angelopoulos, SR Sriram, JS Moore PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 78-86, 2001 | 39 | 2001 |
| Sub-50nm half-pitch imaging with a low activation energy chemically amplified photoresist GM Wallraff, DR Medeiros, M Sanchez, K Petrillo, WS Huang, C Rettner, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 38 | 2004 |
