フォロー
Tetsuo Hatakeyama
Tetsuo Hatakeyama
Toyama Prefectural University
確認したメール アドレス: pu-toyama.ac.jp - ホームページ
タイトル
引用先
引用先
Impact ionization coefficients of 4H silicon carbide
T Hatakeyama, T Watanabe, T Shinohe, K Kojima, K Arai, N Sano
Applied physics letters 85 (8), 1380-1382, 2004
1762004
Dependence of acceptor levels and hole mobility on acceptor density and temperature in Al-doped p-type 4H-SiC epilayers
H Matsuura, M Komeda, S Kagamihara, H Iwata, R Ishihara, ...
Journal of Applied Physics 96 (5), 2708-2715, 2004
1352004
Characterization of traps at nitrided SiO2/SiC interfaces near the conduction band edge by using Hall effect measurements
T Hatakeyama, Y Kiuchi, M Sometani, S Harada, D Okamoto, H Yano, ...
Applied Physics Express 10 (4), 046601, 2017
1272017
High-breakdown-voltage semiconductor device
T Hatakeyama, T Shinohe
US Patent 6,855,970, 2005
1192005
Reverse characteristics of a 4H-SiC Schottky barrier diode
T Hatakeyama, T Shinohe
Materials Science Forum 389, 1169-1172, 2002
1182002
Parameters required to simulate electric characteristics of SiC devices for n-type 4H–SiC
S Kagamihara, H Matsuura, T Hatakeyama, T Watanabe, M Kushibe, ...
Journal of applied physics 96 (10), 5601-5606, 2004
942004
High performance strained-Si p-MOSFETs on SiGe-on-insulator substrates fabricated by SIMOX technology
T Mizuno, S Takagi, N Sugiyama, J Koga, T Tezuka, K Usuda, ...
International Electron Devices Meeting 1999. Technical Digest (Cat. No …, 1999
871999
Semiconductor device
T Hatakeyama, T Shinohe
US Patent 7,649,213, 2010
812010
Temperature-dependent analysis of conduction mechanism of leakage current in thermally grown oxide on 4H-SiC
M Sometani, D Okamoto, S Harada, H Ishimori, S Takasu, T Hatakeyama, ...
Journal of Applied Physics 117 (2), 2015
672015
Silicon carbide, v. 2: power devices and sensors
P Friedrichs, G Pensl, T Kimoto, L Ley
Wiley, 2011
67*2011
Low Vf and highly reliable 16 kV ultrahigh voltage SiC flip-type n-channel implantation and epitaxial IGBT
Y Yonezawa, T Mizushima, K Takenaka, H Fujisawa, T Kato, S Harada, ...
2013 IEEE International Electron Devices Meeting, 6.6. 1-6.6. 4, 2013
632013
High withstand voltage semiconductor device
K Kinoshita, T Hatakeyama, T Shinohe
US Patent 6,831,345, 2004
612004
Annealing induced extended defects in as-grown and ion-implanted 4H–SiC epitaxial layers
M Nagano, H Tsuchida, T Suzuki, T Hatakeyama, J Senzaki, K Fukuda
Journal of applied physics 108 (1), 2010
562010
Measurement of Hall mobility in 4H-SiC for improvement of the accuracy of the mobility model in device simulation
T Hatakeyama, T Watanabe, M Kushibe, K Kojima, S Imai, T Suzuki, ...
Materials Science Forum 433, 443-446, 2003
562003
Physical models for SiC and their application to device simulations of SiC insulated-gate bipolar transistors
T Hatakeyama, K Fukuda, H Okumura
IEEE transactions on electron devices 60 (2), 613-621, 2012
552012
Physical modeling and scaling properties of 4H-SiC power devices
T Hatakeyama, J Nishio, C Ota, T Shinohe
2005 International Conference On Simulation of Semiconductor Processes and …, 2005
542005
Measurements of impact ionization coefficients of electrons and holes in 4H‐SiC and their application to device simulation
T Hatakeyama
physica status solidi (a) 206 (10), 2284-2294, 2009
512009
Guard ring assisted RESURF: A new termination structure providing stable and high breakdown voltage for SiC power devices
K Kinoshita, T Hatakeyama, O Takikawa, A Yahata, T Shinohe
Proceedings of the 14th International Symposium on Power Semiconductor …, 2002
472002
Ultralow-loss SiC floating junction Schottky barrier diodes (super-SBDs)
J Nishio, C Ota, T Hatakeyama, T Shinohe, K Kojima, SI Nishizawa, ...
IEEE transactions on electron devices 55 (8), 1954-1960, 2008
452008
Optimum design of a SiC Schottky barrier diode considering reverse leakage current due to a tunneling process
T Hatakeyama, M Kushibe, T Watanabe, S Imai, T Shinohe
Materials Science Forum 433, 831-834, 2003
452003
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論文 1–20