| Apparatus and method for correcting light proximity effects by predicting mask performance K Kamon US Patent 5,815,685, 1998 | 129 | 1998 |
| Photolithography system using annular illumination K Kamon, T Miyamoto, Y Myoi, H Nagata, M Tanaka, K Horie Japanese journal of applied physics 30 (11S), 3021, 1991 | 128 | 1991 |
| Projection exposure apparatus and polarizer K Kamon US Patent 5,436,761, 1995 | 100 | 1995 |
| Mask inspecting method and mask detector K Kamon US Patent 5,481,624, 1996 | 80 | 1996 |
| Projection exposure apparatus K Kamon US Patent 5,365,371, 1994 | 70 | 1994 |
| Projection aligner K Kamon, Y Myoi, T Miyamoto, Y Noguchi, M Tanaka US Patent 5,144,362, 1992 | 64 | 1992 |
| Optical pattern projecting apparatus K Kamon US Patent 5,382,999, 1995 | 46 | 1995 |
| Projection exposure apparatus K Kamon, T Miyamoto, Y Myoi US Patent 5,264,898, 1993 | 45 | 1993 |
| Photomask K Kamon US Patent 5,229,230, 1993 | 44 | 1993 |
| Fly-eye lens device and lighting system including same K Kamon US Patent 5,251,067, 1993 | 38 | 1993 |
| Projection exposure apparatus K Kamon US Patent 5,300,972, 1994 | 37 | 1994 |
| Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method K Kamon US Patent 6,245,470, 2001 | 35* | 2001 |
| Method of forming a pattern using proximity-effect-correction K Kamon US Patent 6,453,274, 2002 | 30 | 2002 |
| Simulator for a chemical mechanical polishing K Kamon US Patent 7,363,207, 2008 | 29 | 2008 |
| Photolithography system using modified illumination K Kamon, T Miyamoto, Y Myoi, HN Tanaka Japanese journal of applied physics 32 (1R), 239, 1993 | 29 | 1993 |
| Projection aligner K Kamon, Y Myoi, T Miyamoto, Y Noguchi, M Tanaka US Patent 5,253,040, 1993 | 25 | 1993 |
| Fast and accurate optical proximity correction based on aerial image simulation T Hanawa, K Kamon, A Nakae, S Nakao, K Moriizumi Optical Microlithography IX 2726, 640-650, 1996 | 21 | 1996 |
| Apparatus and method for evaluating a projection lens K Kamon US Patent 5,321,493, 1994 | 19 | 1994 |
| Angle detector device for silicon wafers K Kamon US Patent 5,073,918, 1991 | 18 | 1991 |
| Photolithography system using a combination of modified illumination and phase shift mask K Kamon, T Miyamoto, Y Myoi, H Nagata, NK Tanaka Japanese journal of applied physics 31 (12S), 4131, 1992 | 17 | 1992 |
Tatsuya KunikiyoRenesas Electronics