| Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source A Dolgov, D Lopaev, CJ Lee, E Zoethout, V Medvedev, O Yakushev, ... Applied surface science 353, 708-713, 2015 | 148 | 2015 |
| On the possibility of O2 (a 1Δg) production by a non-self-sustained discharge for oxygen–iodine laser pumping AN Vasiljeva, KS Klopovskiy, AS Kovalev, DV Lopaev, YA Mankelevich, ... Journal of Physics D: Applied Physics 37 (17), 2455, 2004 | 136 | 2004 |
| Singlet oxygen generation in O2 flow excited by RF discharge: I. Homogeneous discharge mode: α-mode OV Braginskiy, AN Vasilieva, KS Klopovskiy, AS Kovalev, DV Lopaev, ... Journal of Physics D: Applied Physics 38 (19), 3609, 2005 | 124 | 2005 |
| Negative ion destruction by O (3P) atoms and O2 (a 1Δg) molecules in an oxygen plasma SG Belostotsky, DJ Economou, DV Lopaev, TV Rakhimova Plasma Sources Science and Technology 14 (3), 532, 2005 | 115 | 2005 |
| Actinometry of O, N and F atoms DV Lopaev, AV Volynets, SM Zyryanov, AI Zotovich, AT Rakhimov Journal of Physics D: Applied Physics 50 (7), 075202, 2017 | 96 | 2017 |
| Experimental and Theoretical Investigation of Oxygen Glow Discharge Structure at Low Pressures TVR V.V.Ivanov, K.S.Klopovsky, D.V.Lopaev, A.T.Rakhimov IEEE Transactions on Plasma Science 27 (5), 1279-1287, 1999 | 92 | 1999 |
| The mechanism of low-k SiOCH film modification by oxygen atoms OV Braginsky, AS Kovalev, DV Lopaev, EM Malykhin, YA Mankelevich, ... Journal of Applied Physics 108 (7), 2010 | 73 | 2010 |
| Low-k films modification under EUV and VUV radiation TV Rakhimova, AT Rakhimov, YA Mankelevich, DV Lopaev, AS Kovalev, ... Journal of Physics D: Applied Physics 47 (2), 025102, 2013 | 67 | 2013 |
| N2 dissociation and kinetics of N (4S) atoms in nitrogen DC glow discharge AV Volynets, DV Lopaev, TV Rakhimova, AA Chukalovsky, ... Journal of Physics D: Applied Physics 51 (36), 364002, 2018 | 61 | 2018 |
| Pressure scaling of an electro-discharge singlet oxygen generator (ED SOG) OV Braginsky, AS Kovalev, DV Lopaev, OV Proshina, TV Rakhimova, ... Journal of Physics D: Applied Physics 40 (21), 6571, 2007 | 60 | 2007 |
| Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas A Dolgov, D Lopaev, T Rachimova, A Kovalev, A Vasil'Eva, CJ Lee, ... Journal of Physics D: Applied Physics 47 (6), 065205, 2014 | 58 | 2014 |
| Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models MR Baklanov, V Jousseaume, TV Rakhimova, DV Lopaev, ... Applied Physics Reviews 6 (1), 2019 | 57 | 2019 |
| Experimental and theoretical study of ion energy distribution function in single and dual frequency RF discharges TV Rakhimova, OV Braginsky, VV Ivanov, AS Kovalev, DV Lopaev, ... IEEE transactions on plasma science 35 (5), 1229-1240, 2007 | 56 | 2007 |
| Experimental and theoretical study of dynamic effects in low-frequency capacitively coupled discharges O Braginsky, A Kovalev, D Lopaev, O Proshina, T Rakhimova, A Vasilieva, ... Journal of Physics D: Applied Physics 45 (1), 015201, 2011 | 53 | 2011 |
| Surface recombination of oxygen atoms in O2 plasma at increased pressure: I. The recombination probability and phenomenological model of surface processes DV Lopaev, EM Malykhin, SM Zyryanov Journal of Physics D: Applied Physics 44 (1), 015201, 2010 | 53 | 2010 |
| Experimental and theoretical study of RF plasma at low and high frequency TV Rakhimova, OV Braginsky, VV Ivanov, TK Kim, JT Kong, AS Kovalev, ... IEEE Transactions on plasma science 34 (3), 867-877, 2006 | 53 | 2006 |
| Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges OV Proshina, TV Rakhimova, AI Zotovich, DV Lopaev, SM Zyryanov, ... Plasma Sources Science and Technology 26 (7), 075005, 2017 | 50 | 2017 |
| Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma JP Booth, O Guaitella, A Chatterjee, C Drag, V Guerra, D Lopaev, ... Plasma Sources Science and Technology 28 (5), 055005, 2019 | 48 | 2019 |
| Interaction of F atoms with SiOCH ultra-low-k films: I. Fluorination and damage TV Rakhimova, DV Lopaev, YA Mankelevich, AT Rakhimov, SM Zyryanov, ... Journal of Physics D: Applied Physics 48 (17), 175203, 2015 | 48 | 2015 |
| Removal of amorphous C and Sn on Mo: Si multilayer mirror surface in Hydrogen plasma and afterglow OV Braginsky, AS Kovalev, DV Lopaev, EM Malykhin, TV Rakhimova, ... Journal of Applied Physics 111 (9), 2012 | 47 | 2012 |
Mikhail BaklanovEmail verificata su ncut.edu.cn
