| Fabrication of digital rainbow holograms and 3-D imaging using SEM based e-beam lithography A Firsov, A Firsov, B Loechel, A Erko, A Svintsov, S Zaitsev Optics Express 22 (23), 28756-28770, 2014 | 37 | 2014 |
| Viscous flow simulation in nanoimprint using coarse-grain method V Sirotkin, A Svintsov, S Zaitsev, H Schift Microelectronic engineering 83 (4-9), 880-883, 2006 | 37 | 2006 |
| Coarse-grain method for modeling of stamp and substrate deformation in nanoimprint V Sirotkin, A Svintsov, H Schift, S Zaitsev Microelectronic Engineering 84 (5-8), 868-871, 2007 | 33 | 2007 |
| Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation N Kehagias, V Reboud, CMS Torres, V Sirotkin, A Svintsov, S Zaitsev Microelectronic Engineering 85 (5-6), 846-849, 2008 | 25 | 2008 |
| Quantitative comparison of X-ray fluorescence microtomography setups: Standard and confocal collimator apparatus M Chukalina, A Simionovici, S Zaitsev, CJ Vanegas Spectrochimica Acta Part B: Atomic Spectroscopy 62 (6-7), 544-548, 2007 | 25 | 2007 |
| FIB sputtering optimization using Ion Reverse Software A Svintsov, S Zaitsev, G Lalev, S Dimov, V Velkova, H Hirshy Microelectronic engineering 86 (4-6), 544-547, 2009 | 14 | 2009 |
| Coarse-grain simulation of viscous flow and stamp deformation in nanoimprint V Sirotkin, A Svintsov, S Zaitsev, H Schift Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 13 | 2007 |
| Optimization of droplets for UV-NIL using coarse-grain simulation of resist flow V Sirotkin, A Svintsov, S Zaitsev Alternative Lithographic Technologies 7271, 662-670, 2009 | 6 | 2009 |
| X-ray optics for phase differential contrast: Design, optimization, simulation, fabrication V Aristov, M Chukalina, A Firsov, T Ishikawa, S Kikuta, Y Kohmura, ... AIP Conference Proceedings 507 (1), 554-557, 2000 | 6 | 2000 |
| 3D ion multibeam processing with the CHARPAN PMLP tool and with the single ion-beam FIB tool optimized with the IonRevSim software S Zaitsev, A Svintsov, C Ebm, S Eder-Kapl, H Loeschner, E Platzgummer, ... Alternative Lithographic Technologies 7271, 709-716, 2009 | 2 | 2009 |
| The IMPRINT software: quantitative prediction of process parameters for successful nanoimprint lithography N Kehagias, V Reboud, CM Sotomayor Torres, V Sirotkin, A Svintsov, ... Proc. Nanotech. Conf 3, 2008 | 2 | 2008 |
| The IMPRINT software: quantitative predictions of the residual resist thickness in nanoimprint N Kehagias, V Reboud, CMS Torres, V Sirotkin, A Svintsov, S Zaitsev 2007 Digest of papers Microprocesses and Nanotechnology, 404-405, 2007 | 2 | 2007 |
| Simulation of uncharged dislocation EBIC contrast at high excitation level NN Negulyaev, EB Yakimov, SI Zaitsev physica status solidi (c) 2 (6), 1822-1826, 2005 | 2 | 2005 |
| Apparatus and computer X-ray tomography: Visualization of intrinsic structure, evaluation of performance and limitations M Chukalina, S Zaitsev, D Nikolaev, A Simionovici, M Knyazev, ... European Conference on Modelling and Simulation, Riga, Latvia, 294-299, 2005 | 2 | 2005 |
| Refined coarse-grain modeling of stamp deformation in nanoimprint lithography S Merino, A Retolaza, A Juarros, H Schift, V Sirotkin, A Svintsov, S Zaitsev Nsti Nanotech 2008 1, 368-370, 2008 | 1 | 2008 |
| UV-NIL with optimal droplets V Sirotkin, A Svintsov, S Zaitsev Nanotechnology, 559-562, 2008 | 1 | 2008 |
| Methods for 3D photonic structures fabrication S Zaitsev, M Knyazev, S Dubonos, A Bazhenov 2004 24th International Conference on Microelectronics (IEEE Cat. No …, 2004 | 1 | 2004 |
| True Color Rainbow Hologram, OVD, Micro-Nanooptics... by s/w" RainBow" via High Throughput EBL, Dot-Matrix and DLW. A Svintsov, S Zaitsev Голография. Наука и практика, 89-90, 2016 | | 2016 |
| Germanium‐Based Circular Zone Plates for Soft and Hard X‐Rays A Firsov, R Belkhou, M Idir, A Svintsov, S Zaitsev, L Ferlazzo, E Cambril AIP Conference Proceedings 1365 (1), 84-87, 2011 | | 2011 |
| Optimal resist dispensing in step and flash NIL V Sirotkin, A Svintsov, S Zaitsev 2007 Digest of papers Microprocesses and Nanotechnology, 406-407, 2007 | | 2007 |
Helmut SchiftGruppenleiter Polymere Nanotechnology, Paul Scherrer InstitutEmail verificata su psi.ch
