Optical dynamics of excitons in J Moll, S Daehne, JR Durrant, DA Wiersma
The Journal of chemical physics 102 (16), 6362-6370, 1995
251 1995 Fused silica having high internal transmission and low birefringence J Domey, J Moll, R Pavlik, D Sempolinski, J Ladison, J Maxon, M Linder, ...
US Patent App. 10/774,811, 2004
89 2004 Control of the J‐Aggregation Phenomenon by variation of the N‐alkyl‐substituents U De Rossi, J Moll, M Spieles, G Bach, S Dähne, J Kriwanek, M Lisk
Journal für Praktische Chemie/Chemiker‐Zeitung 337 (1), 203-208, 1995
83 1995 Exciton annihilation in J-aggregates probed by femtosecond fluorescence upconversion J Moll, WJ Harrison, DV Brumbaugh, AA Muenter
The Journal of Physical Chemistry A 104 (39), 8847-8854, 2000
41 2000 Blue light generation by frequency doubling CW diode laser radiation in KNbO3 channel waveguides D Fluck, J Moll, P Günter, M Fleuster, C Buchal
Electronics Letters 28 (12), 1092-1093, 1992
38 1992 Fluorescence lifetime measurements and hole-burning experiments on J-aggregates of a benzimidocarbocyanine dye M Lindrum, A Glismann, J Moll, S Daehne
Chemical physics 178 (1-3), 423-432, 1993
37 1993 Strengthened glass articles having etched features and methods of forming the same J Moll, JJ Price, AB Ruffin, S Tsuda, RS Wagner, JJ Watkins
US Patent 9,938,186, 2018
31 2018 Laser-induced birefringence in fused silica from polarized lasers U Neukirch, DC Allan, NF Borrelli, CE Heckle, M Mlejnek, J Moll, ...
Optical Microlithography XVIII 5754, 638-645, 2005
16 2005 ArF-laser-induced absorption in fused silica exposed to low fluence at 2000 Hz J Moll
Optical Microlithography XIV 4346, 1272-1279, 2001
15 2001 Methods and apparatus for the measurement of film thickness J Moll
US Patent 8,334,986, 2012
13 2012 Influence of the N-alkyl chain length on the J-aggregation behavior of a cyanine dye U De Rossi, J Moll, J Kriwanek, S Daehne
Journal of Fluorescence 4, 53-55, 1994
13 1994 Laser resistance of fused silica for microlithography: experiments and models J Moll, PG Dewa
Optical Microlithography XV 4691, 1734-1741, 2002
10 2002 Method and Apparatus For Measuring In-Situ Characteristics Of Material Exfoliation GS Glaesemann, JD Maurer, J Moll, J Senawiratne
US Patent App. 12/509,139, 2011
9 2011 The J-Aggregation Phenomenon of Spectral Sensitizers: Structure, Spectroscopy, and Exciton Dynamics S Daehne, U De Rossi, J Moll
Journal of The Society of Photographic Science and Technology of Japan 59 (1 …, 1996
8 1996 Photolithography methods and systems NF Borrelli, CM Smith, J Moll
US Patent 6,754,002, 2004
7 2004 Induced density changes in 193-nm excimer-laser-damaged silica glass: a kinetic model DC Allan, RJ Araujo, CM Smith, NF Borrelli
Optical Microlithography XVII 5377, 827-835, 2004
7 2004 Excimer-laser-induced absorption in fused silica J Moll, PM Schermerhorn
Optical Microlithography XII 3679, 1129-1136, 1999
7 1999 Primary photophysical processes inJ -aggregates of spectral sensitisers K Kemnitz, K Yoshihara, T Suzumoto, T Tani, M Lindrum, J Moll, ...
Journal of Chemical Sciences 105, 783-795, 1993
7 1993 Photolithography methods and systems NF Borrelli, CM Smith, J Moll
US Patent 6,982,232, 2006
6 2006 Forschungsbericht 214: exciton-dynamics in J-aggregates of an organic dye J Moll
Bundesanstaft für Materialforschung und-prüfung, Berlin, 1995
6 * 1995 