| Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu, JJ de Pablo, ... Acs Nano 1 (3), 168-175, 2007 | 556 | 2007 |
| Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features CC Liu, A Ramírez-Hernández, E Han, GSW Craig, Y Tada, H Yoshida, ... Macromolecules 46 (4), 1415-1424, 2013 | 258 | 2013 |
| Perpendicular orientation of domains in cylinder-forming block copolymer thick films by controlled interfacial interactions E Han, KO Stuen, M Leolukman, CC Liu, PF Nealey, P Gopalan Macromolecules 42 (13), 4896-4901, 2009 | 254 | 2009 |
| Fabrication of lithographically defined chemically patterned polymer brushes and mats CC Liu, E Han, MS Onses, CJ Thode, S Ji, P Gopalan, PF Nealey Macromolecules 44 (7), 1876-1885, 2011 | 244 | 2011 |
| Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication S Ji, L Wan, CC Liu, PF Nealey Progress in Polymer Science 54, 76-127, 2016 | 224 | 2016 |
| One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers. T Hirai, M Leolukman, CC Liu, E Han, YJ Kim, Y Ishida, T Hayakawa, ... Advanced Materials (Deerfield Beach, Fla.) 21 (43), 4334-4338, 2009 | 219 | 2009 |
| Generalization of the use of random copolymers to control the wetting behavior of block copolymer films S Ji, CC Liu, JG Son, K Gotrik, GSW Craig, P Gopalan, FJ Himpsel, ... Macromolecules 41 (23), 9098-9103, 2008 | 183 | 2008 |
| DSA grapho-epitaxy process with etch stop material JA Abdallah, ME Colburn, SJ Holmes, D Kawamura, C Liu, ... US Patent 8,859,433, 2014 | 179 | 2014 |
| Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication H Tsai, JW Pitera, H Miyazoe, S Bangsaruntip, SU Engelmann, CC Liu, ... ACS nano 8 (5), 5227-5232, 2014 | 179 | 2014 |
| Metal nanodot memory by self-assembled block copolymer lift-off AJ Hong, CC Liu, Y Wang, J Kim, F Xiu, S Ji, J Zou, PF Nealey, KL Wang Nano letters 10 (1), 224-229, 2010 | 163 | 2010 |
| Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates E Han, H Kang, CC Liu, PF Nealey, P Gopalan Advanced Materials 38 (22), 4325-4329, 2010 | 115 | 2010 |
| Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond CC Liu, E Franke, Y Mignot, R Xie, CW Yeung, J Zhang, C Chi, C Zhang, ... Nature Electronics 1 (10), 562-569, 2018 | 112 | 2018 |
| Molecular transfer printing using block copolymers S Ji, CC Liu, G Liu, PF Nealey ACS nano 4 (2), 599-609, 2010 | 111 | 2010 |
| Plasma etch removal of poly (methyl methacrylate) in block copolymer lithography YH Ting, SM Park, CC Liu, X Liu, FJ Himpsel, PF Nealey, AE Wendt Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 111 | 2008 |
| Domain Orientation and Grain Coarsening in Cylinder-Forming Poly(styrene-b-methyl methacrylate) Films S Ji, CC Liu, W Liao, AL Fenske, GSW Craig, PF Nealey Macromolecules 44 (11), 4291-4300, 2011 | 108 | 2011 |
| Integration of block copolymer directed assembly with 193 immersion lithography CC Liu, PF Nealey, AK Raub, PJ Hakeem, SRJ Brueck, E Han, P Gopalan Journal of Vacuum Science & Technology B 28 (6), C6B30-C6B34, 2010 | 106 | 2010 |
| An adaptive finite volume method for incompressible heat flow problems in solidification CW Lan, CC Liu, CM Hsu Journal of Computational Physics 178 (2), 464-497, 2002 | 97 | 2002 |
| Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching YH Ting, CC Liu, SM Park, H Jiang, PF Nealey, AE Wendt Polymers 2 (4), 649-663, 2010 | 96 | 2010 |
| Towards an all-track 300 mm process for directed self-assembly CC Liu, CJ Thode, PA Rincon Delgadillo, GSW Craig, PF Nealey, ... Journal of Vacuum Science & Technology B 29 (6), 2011 | 94 | 2011 |
| Pattern transfer using poly (styrene-block-methyl methacrylate) copolymer films and reactive ion etching CC Liu, PF Nealey, YH Ting, AE Wendt Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 94 | 2007 |