| Lithographic apparatus and device manufacturing method J Lof, ETM Bijlaart, H Butler, SNL Donders, CA Hoogendam, ... US Patent 7,199,858, 2007 | 1010 | 2007 |
| Lithographic apparatus and device manufacturing method J Lof, ETM Bijlaart, RAS Ritsema, F Van Schaik, TF Sengers, K Simon, ... US Patent 7,213,963, 2007 | 407 | 2007 |
| Position control in lithographic equipment [applications of control] H Butler IEEE Control Systems Magazine 31 (5), 28-47, 2011 | 399 | 2011 |
| Model reference adaptive control of a gantry crane scale model H Butler, G Honderd, J Van Amerongen IEEE Control Systems Magazine 11 (1), 57-62, 1991 | 168 | 1991 |
| Model reference adaptive control: from theory to practice H Butler Prentice-Hall, Inc., 1992 | 160 | 1992 |
| Position control in lithographic equipment: an enabler for current-day chip manufacturing H Butler IEEE control systems 31 (5), 28-47, 2011 | 125 | 2011 |
| Lithographic apparatus with improved exposure area focus, device manufacturing method, and device manufactured thereby MEJ Boonman, JCH Mulkens, H Butler US Patent 6,741,331, 2004 | 92 | 2004 |
| Lithographic apparatus and device manufacturing method J Lof, H Butler, SNL Donders, AY Kolesnychenko, ER Loopstra, ... US Patent 8,154,708, 2012 | 91 | 2012 |
| Lithographic apparatus and device manufacturing method J Lof, ETM Bijlaart, H Butler, SNL Donders, CA Hoogendam, ... US Patent 7,593,092, 2009 | 87 | 2009 |
| Lithographic apparatus and device manufacturing method J Lof, H Butler, SNL Donders, A Kolesnychenko, ER Loopstra, HJM Meijer, ... US Patent 7,593,093, 2009 | 81 | 2009 |
| Adaptive feedforward for a wafer stage in a lithographic tool H Butler IEEE Transactions on Control Systems Technology 21 (3), 875-881, 2012 | 80 | 2012 |
| Performance of a step-and-scan system for DUV lithography G de Zwart, MA van den Brink, RA George, D Satriasaputra, J Baselmans, ... Optical Microlithography X 3051, 817-835, 1997 | 78 | 1997 |
| Model reference adaptive control of a direct-drive DC motor H Butler, G Honderd, J Van Amerongen IEEE Control Systems Magazine 9 (1), 80-84, 1989 | 75 | 1989 |
| Control of wafer scanners: Methods and developments MF Heertjes, H Butler, NJ Dirkx, SH van der Meulen, R Ahlawat, K O’Brien, ... 2020 American Control Conference (ACC), 3686-3703, 2020 | 72 | 2020 |
| High-precision force control of short-stroke reluctance actuators with an air gap observer A Katalenic, H Butler, PPJ van den Bosch IEEE/ASME Transactions on Mechatronics 21 (5), 2431-2439, 2016 | 47 | 2016 |
| Lithographic apparatus and device manufacturing method M Houkes, H Butler, HHM Cox US Patent 7,265,813, 2007 | 42 | 2007 |
| Lithographic apparatus and device manufacturing method J Lof, ETM Bijlaart, RAS Ritsema, F Van Schaik, TF Sengers, K Simon, ... US Patent 8,482,845, 2013 | 40* | 2013 |
| Lithographic apparatus and device manufacturing method with feed-forward focus control H Butler, MEJ Boonman, PMCM Van Den US Patent 7,113,256, 2006 | 39 | 2006 |
| Linearization of a current-driven reluctance actuator with hysteresis compensation A Katalenic, J De Boeij, H Butler, PPJ Van Den Bosch Mechatronics 23 (2), 163-171, 2013 | 38 | 2013 |
| Disturbance feedforward control for active vibration isolation systems with internal isolator dynamics MA Beijen, MF Heertjes, H Butler, M Steinbuch Journal of Sound and Vibration 436, 220-235, 2018 | 34 | 2018 |
