Segui
K. E. J. Goh
K. E. J. Goh
IMRE
Email verificata su imre.a-star.edu.sg - Home page
Titolo
Citata da
Citata da
Anno
Electrically conductive filament for 3D-printed circuits and sensors
SW Kwok, KHH Goh, ZD Tan, STM Tan, WW Tjiu, JY Soh, ZJG Ng, ...
Applied Materials Today 9, 167-175, 2017
3542017
Toward atomic-scale device fabrication in silicon using scanning probe microscopy
FJ Ruess, L Oberbeck, MY Simmons, KEJ Goh, AR Hamilton, T Hallam, ...
Nano Letters 4 (10), 1969-1973, 2004
2162004
Evidence of spin frustration in a vanadium diselenide monolayer magnet
PKJ Wong, W Zhang, F Bussolotti, X Yin, TS Herng, L Zhang, YL Huang, ...
Advanced materials 31 (23), 1901185, 2019
1542019
Far out-of-equilibrium spin populations trigger giant spin injection into atomically thin MoS2
L Cheng, X Wang, W Yang, J Chai, M Yang, M Chen, Y Wu, X Chen, ...
Nature Physics 15, 347-351, 2019
1462019
Realization of atomically controlled dopant devices in silicon
FJ Rueß, W Pok, TCG Reusch, MJ Butcher, KEJ Goh, L Oberbeck, ...
Small 3 (4), 563-567, 2007
1422007
Can Reconstructed Se‐Deficient Line Defects in Monolayer VSe2 Induce Magnetism?
R Chua, J Yang, X He, X Yu, W Yu, F Bussolotti, PKJ Wong, KP Loh, ...
Advanced Materials 32 (24), 2000693, 2020
1072020
Modification of Vapor Phase Concentrations in MoS2 Growth Using a NiO Foam Barrier
YF Lim, K Priyadarshi, F Bussolotti, PK Gogoi, X Cui, M Yang, J Pan, ...
ACS nano 12 (2), 1339-1349, 2018
882018
Influence of doping density on electronic transport in degenerate Si:P -doped layers
KEJ Goh, L Oberbeck, MY Simmons, AR Hamilton, MJ Butcher
Physical Review B—Condensed Matter and Materials Physics 73 (3), 035401, 2006
862006
Roadmap on finding chiral valleys: screening 2D materials for valleytronics
F Bussolotti, H Kawai, ZE Ooi, V Chellappan, D Thian, ALC Pang, ...
Nano Futures 2 (3), 032001, 2018
832018
Interlayer interactions in 2D WS 2/MoS 2 heterostructures monolithically grown by in situ physical vapor deposition
W Yang, H Kawai, M Bosman, B Tang, J Chai, W Le Tay, J Yang, HL Seng, ...
Nanoscale 10 (48), 22927-22936, 2018
812018
Effect of encapsulation temperature on Si: P δ-doped layers
KEJ Goh, L Oberbeck, MY Simmons, AR Hamilton, RG Clark
Applied physics letters 85 (21), 4953-4955, 2004
672004
Metallic 1T Phase, 3d1 Electronic Configuration and Charge Density Wave Order in Molecular Beam Epitaxy Grown Monolayer Vanadium Ditelluride
PKJ Wong, W Zhang, J Zhou, F Bussolotti, X Yin, L Zhang, AT N’Diaye, ...
ACS nano 13 (11), 12894-12900, 2019
652019
Electrical Doping Effect of Vacancies on Monolayer MoS2
J Yang, H Kawai, CPY Wong, KEJ Goh
The Journal of Physical Chemistry C 123 (5), 2933-2939, 2019
602019
Scanning probe microscopy for silicon device fabrication
MY Simmons, FJ Ruess, KEJ Goh, T Hallam, SR Schofield, L Oberbeck, ...
Molecular Simulation 31 (6-7), 505-515, 2005
602005
Electron-electron interactions in highly disordered two-dimensional systems
KEJ Goh, MY Simmons, AR Hamilton
Physical Review B—Condensed Matter and Materials Physics 77 (23), 235410, 2008
552008
One-dimensional conduction properties of highly phosphorus-doped planar nanowires patterned by scanning probe microscopy
FJ Ruess, B Weber, KEJ Goh, O Klochan, AR Hamilton, MY Simmons
Physical Review B—Condensed Matter and Materials Physics 76 (8), 085403, 2007
532007
Single layer MoS2 nanoribbon field effect transistor
D Kotekar-Patil, J Deng, SL Wong, CS Lau, KEJ Goh
Applied Physics Letters 114 (1), 2019
522019
Electronic properties of atomically abrupt tunnel junctions in silicon
FJ Ruess, W Pok, KEJ Goh, AR Hamilton, MY Simmons
Physical Review B—Condensed Matter and Materials Physics 75 (12), 121303, 2007
492007
Electrically-excited surface plasmon polaritons with directionality control
Z Dong, HS Chu, D Zhu, W Du, YA Akimov, WP Goh, T Wang, KEJ Goh, ...
ACS photonics 2 (3), 385-391, 2015
442015
Quantum Transport in Two-Dimensional WS2 with High-Efficiency Carrier Injection through Indium Alloy Contacts
CS Lau, JY Chee, YS Ang, SW Tong, L Cao, ZE Ooi, T Wang, LK Ang, ...
ACS nano 14 (10), 13700-13708, 2020
432020
Il sistema al momento non può eseguire l'operazione. Riprova più tardi.
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