Khaled Hassouni

Dikutip oleh

	Semua	Sejak 2020
Kutipan	5022	1496
indeks-h	37	20
indeks-i10	100	40

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32 artikel

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Guillaume LombardiCNRS LSPM - University Sorbonne Paris NordEmail yang diverifikasi di lspm.cnrs.fr
m capitelliprofessore di chimicaEmail yang diverifikasi di ba.imip.cnr.it
Duten XavierEmail yang diverifikasi di lspm.cnrs.fr
Savino LongoUniversity of BariEmail yang diverifikasi di uniba.it
Swaminathan PRASANNAChargé de recherche 2, LSPM, CNRS UPR 3407, Universite Sorbonne Paris NordEmail yang diverifikasi di lspm.cnrs.fr
Gianpiero ColonnaBariEmail yang diverifikasi di ba.imip.cnr.it
Fabrizio EspositoISTP (Istituto per la Scienza e Tecnologia dei Plasmi del CNR)Email yang diverifikasi di cnr.it
Farhat SamirUniversité Paris 13 - LSPM CNRSEmail yang diverifikasi di lspm.cnrs.fr
Jocelyn AchardProfesseur en électronique et traitement du signal, Université Paris 13Email yang diverifikasi di lspm.cnrs.fr
Timothy A, GrotjohnProfessor of Electrical and Computer Engineering, Michigan State UniversityEmail yang diverifikasi di egr.msu.edu
Willy MorscheidtResponsable équipe TICE , Mines ParisTechEmail yang diverifikasi di mines-paristech.fr
Karim OuarasÉcole polytechniqueEmail yang diverifikasi di polytechnique.edu
Zsolt MezeiQuantum Physics Group, HUN-REN Institute for Nuclear Research (ATOMKI)Email yang diverifikasi di atomki.hu
Paola DiomedeMaastricht UniversityEmail yang diverifikasi di maastrichtuniversity.nl
Gelareh MomenFull Professor , University of QuebecEmail yang diverifikasi di uqac.ca
Pere Roca i CabarrocasLPICM, CNRS, Ecole Polytechnique, and IPVFEmail yang diverifikasi di polytechnique.edu
Jonathan TennysonUniversity College LondonEmail yang diverifikasi di ucl.ac.uk
Tatiana NovikovaLPICM Ecole polytechnique, IP ParisEmail yang diverifikasi di polytechnique.edu
Alexandre TallaireCNRS- Chimie Paris TechEmail yang diverifikasi di chimie-paristech.fr
Kalyan ChakrabartiDepartment of Mathematics, Scottish Church College, Kolkata - 700 006, IndiaEmail yang diverifikasi di scottishchurch.ac.in

Ikuti

Khaled Hassouni

LSPM, CNRS-UPR 3407, Université Paris 13

Email yang diverifikasi di lspm.cnrs.fr

plasma physics numerical modeling material science reactive flow non equilibrium plasmas


Judul Urutkan menurut kutipan Urutkan menurut tahun Urutkan menurut judul	Dikutip oleh Dikutip oleh	Tahun
CVD diamond films: from growth to applications A Gicquel, K Hassouni, F Silva, J Achard Current Applied Physics 1 (6), 479-496, 2001	292	2001
High quality MPACVD diamond single crystal growth: high microwave power density regime J Achard, F Silva, A Tallaire, X Bonnin, G Lombardi, K Hassouni, ... Journal of Physics D: Applied Physics 40 (20), 6175, 2007	217	2007
Microwave engineering of plasma-assisted CVD reactors for diamond deposition F Silva, K Hassouni, X Bonnin, A Gicquel Journal of physics: condensed matter 21 (36), 364202, 2009	212	2009
Self-consistent microwave field and plasma discharge simulations for a moderate pressure hydrogen discharge reactor K Hassouni, TA Grotjohn, A Gicquel Journal of Applied Physics 86 (1), 134-151, 1999	187	1999
Modelling of diamond deposition microwave cavity generated plasmas K Hassouni, F Silva, A Gicquel Journal of physics D: Applied physics 43 (15), 153001, 2010	167	2010
High quality, large surface area, homoepitaxial MPACVD diamond growth F Silva, J Achard, O Brinza, X Bonnin, K Hassouni, A Anthonis, K De Corte, ... Diamond and Related Materials 18 (5-8), 683-697, 2009	153	2009
Plasma–wall interaction studies within the EUROfusion consortium: progress on plasma-facing components development and qualification S Brezinsek, JW Coenen, T Schwarz-Selinger, K Schmid, A Kirschner, ... Nuclear fusion 57 (11), 116041, 2017	141	2017
Chemical kinetics and energy transfer in moderate pressure H2 plasmas used in diamond MPACVD processes K Hassouni, A Gicquel, M Capitelli, J Loureiro Plasma Sources Science and Technology 8 (3), 494, 1999	130	1999
Hydrogen storage by adsorption on activated carbon: investigation of the thermal effects during the charging process G Hermosilla-Lara, G Momen, PH Marty, B Le Neindre, K Hassouni International journal of hydrogen energy 32 (10-11), 1542-1553, 2007	124	2007
Non-equilibrium plasma kinetics: a state-to-state approach M Capitelli, I Armenise, D Bruno, M Cacciatore, R Celiberto, G Colonna, ... Plasma Sources Science and Technology 16 (1), S30, 2007	122	2007
Interaction between soot particles and during dielectric barrier discharge plasma remediation of simulated diesel exhaust R Dorai, K Hassouni, MJ Kushner Journal of applied physics 88 (10), 6060-6071, 2000	109	2000
Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition G Lombardi, K Hassouni, GD Stancu, L Mechold, J Röpcke, A Gicquel Journal of Applied Physics 98 (5), 2005	107	2005
Vibrational kinetics, electron dynamics and elementary processes in H2 and D2 plasmas for negative ion production: modelling aspects M Capitelli, M Cacciatore, R Celiberto, O De Pascale, P Diomede, ... Nuclear fusion 46 (6), S260, 2006	106	2006
Determining electron temperature and density in a hydrogen microwave plasma CD Scott, S Farhat, A Gicquel, K Hassouni, M Lefebvre Journal of thermophysics and heat transfer 10 (3), 426-435, 1996	88	1996
Nucleation, growth and characterization of nanocrystalline diamond films G Cicala, P Bruno, F Bénédic, F Silva, K Hassouni, GS Senesi Diamond and Related Materials 14 (3-7), 421-425, 2005	82	2005
Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure T Novikova, B Kalache, P Bulkin, K Hassouni, W Morscheidt, ... Journal of Applied Physics 93 (6), 3198-3206, 2003	80	2003
Elaboration of pure and doped TiO2 nanoparticles in sol–gel reactor with turbulent micromixing: Application to nanocoatings and photocatalysis R Azouani, A Michau, K Hassouni, K Chhor, JF Bocquet, JL Vignes, ... Chemical engineering research and design 88 (9), 1123-1130, 2010	73	2010
The role of dissociative attachment from Rydberg states in enhancing H− concentration in moderate-and low-pressure H2 plasma sources K Hassouni, A Gicquel, M Capitelli Chemical physics letters 290 (4-6), 502-508, 1998	73	1998
Determination of gas temperature and C2 absolute density in Ar/H2/CH4 microwave discharges used for nanocrystalline diamond deposition from the C2 Mulliken system G Lombardi, F Bénédic, F Mohasseb, K Hassouni, A Gicquel Plasma Sources Science and Technology 13 (3), 375, 2004	72	2004
QDB: a new database of plasma chemistries and reactions J Tennyson, S Rahimi, C Hill, L Tse, A Vibhakar, D Akello-Egwel, ... Plasma Sources Science and Technology 26 (5), 055014, 2017	71	2017

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