| Lens scatterometer system employing source light beam scanning means JR McNeil, SSH Naqvi, SR Wilson US Patent 5,703,692, 1997 | 199 | 1997 |
| Multiparameter grating metrology using optical scatterometry CJ Raymond, MR Murnane, SL Prins, S Sohail, H Naqvi, JR McNeil, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997 | 171 | 1997 |
| Metrology of subwavelength photoresist gratings using optical scatterometry CJ Raymond, MR Murnane, S Sohail, H Naqvi, JR McNeil Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1995 | 159 | 1995 |
| Simple CD measurement of periodic structures on photomasks JR McNeil, KC Hickman, SM Gaspar, SSH Naqvi US Patent 5,164,790, 1992 | 128 | 1992 |
| Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures BK Minhas, SA Coulombe, SSH Naqvi, JR McNeil Applied optics 37 (22), 5112-5115, 1998 | 114 | 1998 |
| Scatterometry applied to microelectronics processing JR McNeil, SSH Naqvi, SM Gaspar, KC Hickman, KP Bishop, LM Milner, ... Solid state technology 36 (3), 29-32, 1993 | 87 | 1993 |
| Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles SSH Naqvi, RH Krukar, JR McNeil, JE Franke, TM Niemczyk, DM Haaland, ... JOSA A 11 (9), 2485-2493, 1994 | 79 | 1994 |
| Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns SRJ Brueck, X Chen, A Frauenglass, SH Zaidi, J Wilczynski US Patent 6,233,044, 2001 | 76 | 2001 |
| Use of diffracted light from latent images to improve lithography control KC Hickman, SM Gaspar, KP Bishop, SSH Naqvi, JR McNeil, GD Tipton, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1992 | 69 | 1992 |
| Sixteen‐megabit dynamic random access memory trench depth characterization using two‐dimensional diffraction analysis ZR Hatab, JR McNeil, S Sohail H. Naqvi Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1995 | 59 | 1995 |
| Diffractive techniques for lithographic process monitoring and control S Sohail, H Naqvi, SH Zaidi, SRJ Brueck, JR McNeil Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 58 | 1994 |
| Linewidth measurement of gratings on photomasks: a simple technique SSH Naqvi, S Gaspar, K Hickman, K Bishop, JR McNeil Applied optics 31 (10), 1377-1384, 1992 | 57 | 1992 |
| Scatterometry measurement of sub-0.1 μm linewidth gratings SA Coulombe, BK Minhas, CJ Raymond, S Sohail H. Naqvi, JR McNeil Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 54 | 1998 |
| Grating line shape characterization using scatterometry KP Bishop, SM Gaspar, LM Milner, SSH Naqvi, JR McNeil International Conference on the application and Theory of periodic …, 1991 | 48 | 1991 |
| Development, Characterization, and Evaluation of SLN‐Loaded Thermoresponsive Hydrogel System of Topotecan as Biological Macromolecule for Colorectal Delivery R Xing, O Mustapha, T Ali, M Rehman, SS Zaidi, A Baseer, S Batool, ... BioMed Research International 2021 (1), 9968602, 2021 | 47 | 2021 |
| Scatterometry and the simulation of diffraction-based metrology SSH Naqvi, JR McNeil, RH Krukar, KP Bishop Microlithogr. World 2 (3), 5-16, 1993 | 46 | 1993 |
| Ellipsometric scatterometry for sub-0.1-um CD measurements SA Coulombe, PC Logofatu, BK Minhas, SSH Naqvi, JR McNeil Metrology, Inspection, and Process Control for Microlithography XII 3332 …, 1998 | 39 | 1998 |
| Using scattered light modeling for semiconductor critical dimension metrology and calibration RH Krukar, SL Prins, DM Krukar, GA Peterson Jr, S Gaspar, JR McNeil, ... Integrated Circuit Metrology, Inspection, and Process Control VII 1926, 60-71, 1993 | 39 | 1993 |
| Scatterometry for 0.24-0.70 um developed photoresist metrology MR Murnane, CJ Raymond, SL Prins, SSH Naqvi, JR McNeil Integrated Circuit Metrology, Inspection, and Process Control IX 2439, 427-436, 1995 | 38 | 1995 |
| Multiparameter CD measurements using scatterometry CJ Raymond, MR Murnane, SL Prins, SSH Naqvi, JR McNeil, JW Hosch Metrology, Inspection, and Process Control for Microlithography X 2725, 698-709, 1996 | 36 | 1996 |
Neal C. GallagherUniversity of Central AsiaDirección de correo verificada de ucentralasia.org
