Cheol Seong Hwang

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Min Hyuk ParkSeoul National UniversityDirección de correo verificada de snu.ac.kr
Kyung Min KimAssociate Professor, Department of Materials Science and Engineering, KAISTDirección de correo verificada de kaist.ac.kr
Hyeong Joon Kim Professor, School of Materials Science and Engineering, College of Engineering, Seoul National UniversityDirección de correo verificada de snu.ac.kr
Seong Keun KimKorea Institute of Science and TechnologyDirección de correo verificada de kist.re.kr
Han Joon KimSeoul National UniversityDirección de correo verificada de snu.ac.kr
Gun Hwan KimAssociate Professor, Yonsei UniversityDirección de correo verificada de yonsei.ac.kr
Taehwan MoonDepartment of Intelligence Semiconductor Engineering, Ajou UniversityDirección de correo verificada de ajou.ac.kr
Byung Joon ChoiSeoul National University of Science and TechnologyDirección de correo verificada de seoultech.ac.kr
Doo Seok JeongHanyang UniversityDirección de correo verificada de hanyang.ac.kr
Tae Joo ParkHanyang UniversityDirección de correo verificada de hanyang.ac.kr
Jung Ho YoonAssistant Professor at Sungkyunkwan UniversityDirección de correo verificada de skku.edu
Jeong Hwan HanSeoul National University of Science and Technology (SEOULTECH)Dirección de correo verificada de seoultech.ac.kr
Jung-Hae ChoiPrincipal Research Scientist, Korea Institute of Science and TechnologyDirección de correo verificada de kist.re.kr
Kyung Jean YoonIntel Santa ClaraDirección de correo verificada de intel.com
Woongkyu LeeSoongsil UniversityDirección de correo verificada de ssu.ac.kr
Young Hwan LeeSeoul National UniversityDirección de correo verificada de snu.ac.kr
Seungwu HanSeoul National UniversityDirección de correo verificada de snu.ac.kr
Woojin JEONKyung Hee UniversityDirección de correo verificada de khu.ac.kr
Deok-Yong ChoJeonbuk National UniversityDirección de correo verificada de jbnu.ac.kr
Hyeon Woo ParkPostdoctoral researcher, Georgia Institute of TechnologyDirección de correo verificada de gatech.edu

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Cheol Seong Hwang

Professor, Department of Materials Science and Engineering, Seoul National University

Dirección de correo verificada de snu.ac.kr - Página principal

Materials Science Semiconductor Devices Thin film Fabrication


Título Ordenar por citas Ordenar por año Ordenar por título	Citado por Citado por	Año
Atomic structure of conducting nanofilaments in TiO₂ resistive switching memory DH Kwon, KM Kim, JH Jang, JM Jeon, MH Lee, GH Kim, XS Li, GS Park, ... Nature nanotechnology 5 (2), 148-153, 2010	2391	2010
Multifunctional wearable devices for diagnosis and therapy of movement disorders D Son, J Lee, S Qiao, R Ghaffari, J Kim, JE Lee, C Song, SJ Kim, DJ Lee, ... Nature nanotechnology 9 (5), 397-404, 2014	1546	2014
Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition BJ Choi, DS Jeong, SK Kim, C Rohde, S Choi, JH Oh, HJ Kim, CS Hwang, ... Journal of applied physics 98 (3), 2005	1471	2005
Emerging memories: resistive switching mechanisms and current status DS Jeong, R Thomas, RS Katiyar, JF Scott, H Kohlstedt, A Petraru, ... Reports on progress in physics 75 (7), 076502, 2012	1234	2012
Ferroelectricity and Antiferroelectricity of Doped Thin HfO₂‐Based Films MH Park, YH Lee, HJ Kim, YJ Kim, T Moon, KD Kim, J Mueller, A Kersch, ... Advanced Materials 27 (11), 1811-1831, 2015	1094	2015
Resistive switching materials for information processing Z Wang, H Wu, GW Burr, CS Hwang, KL Wang, Q Xia, JJ Yang Nature Reviews Materials 5 (3), 173-195, 2020	940	2020
Evolution of phases and ferroelectric properties of thin Hf0. 5Zr0. 5O2 films according to the thickness and annealing temperature M Hyuk Park, H Joon Kim, Y Jin Kim, W Lee, T Moon, C Seong Hwang Applied Physics Letters 102 (24), 2013	777	2013
Nanofilamentary resistive switching in binary oxide system; a review on the present status and outlook KM Kim, DS Jeong, CS Hwang Nanotechnology 22 (25), 254002, 2011	761	2011
Anode-interface localized filamentary mechanism in resistive switching of TiO2 thin films KM Kim, BJ Choi, YC Shin, S Choi, CS Hwang Applied physics letters 91 (1), 2007	513	2007
Review and perspective on ferroelectric HfO2-based thin films for memory applications MH Park, YH Lee, T Mikolajick, U Schroeder, CS Hwang Mrs Communications 8 (3), 795-808, 2018	501	2018
A Resistive Memory in Semiconducting BiFeO₃ Thin‐Film Capacitors AQ Jiang, C Wang, KJ Jin, XB Liu, JF Scott, CS Hwang, TA Tang, HB Lu, ... Advanced Materials 23 (10), 1277-1281, 2011	468	2011
The effects of crystallographic orientation and strain of thin Hf0. 5Zr0. 5O2 film on its ferroelectricity M Hyuk Park, H Joon Kim, Y Jin Kim, T Moon, C Seong Hwang Applied Physics Letters 104 (7), 2014	435	2014
A review of three‐dimensional resistive switching cross‐bar array memories from the integration and materials property points of view JY Seok, SJ Song, JH Yoon, KJ Yoon, TH Park, DE Kwon, H Lim, GH Kim, ... Advanced Functional Materials 24 (34), 5316-5339, 2014	416	2014
Identification of a determining parameter for resistive switching of TiO2 thin films C Rohde, BJ Choi, DS Jeong, S Choi, JS Zhao, CS Hwang Applied Physics Letters 86 (26), 2005	413	2005
High dielectric constant TiO2 thin films on a Ru electrode grown at 250 C by atomic-layer deposition SK Kim, WD Kim, KM Kim, CS Hwang, J Jeong Applied Physics Letters 85 (18), 4112-4114, 2004	411	2004
An artificial nociceptor based on a diffusive memristor JH Yoon, Z Wang, KM Kim, H Wu, V Ravichandran, Q Xia, CS Hwang, ... Nature communications 9 (1), 417, 2018	398	2018
First-principles study on doping and phase stability of CK Lee, E Cho, HS Lee, CS Hwang, S Han Physical Review B—Condensed Matter and Materials Physics 78 (1), 012102, 2008	392	2008
Memristors for energy‐efficient new computing paradigms DS Jeong, KM Kim, S Kim, BJ Choi, CS Hwang Advanced Electronic Materials 2 (9), 1600090, 2016	391	2016
Al‐Doped TiO₂ Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors SK Kim, GJ Choi, SY Lee, M Seo, SW Lee, JH Han, HS Ahn, S Han, ... Advanced Materials 20 (8), 1429-1435, 2008	351	2008
The fundamentals and applications of ferroelectric HfO₂ U Schroeder, MH Park, T Mikolajick, CS Hwang Nature Reviews Materials 7 (8), 653-669, 2022	349	2022

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