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Adam Charnas
Adam Charnas
Air Force Research Laboratory
Dirección de correo verificada de purdue.edu
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Controlled growth of a large-size 2D selenium nanosheet and its electronic and optoelectronic applications
J Qin, G Qiu, J Jian, H Zhou, L Yang, A Charnas, DY Zemlyanov, CY Xu, ...
ACS nano 11 (10), 10222-10229, 2017
2382017
Raman response and transport properties of tellurium atomic chains encapsulated in nanotubes
JK Qin, PY Liao, M Si, S Gao, G Qiu, J Jian, Q Wang, SQ Zhang, S Huang, ...
Nature electronics 3 (3), 141-147, 2020
1672020
Why In2O3 Can Make 0.7 nm Atomic Layer Thin Transistors
M Si, Y Hu, Z Lin, X Sun, A Charnas, D Zheng, X Lyu, H Wang, K Cho, ...
Nano Letters 21 (1), 500-506, 2020
1472020
Observation of Optical and Electrical In-Plane Anisotropy in High-Mobility Few-Layer ZrTe5
G Qiu, Y Du, A Charnas, H Zhou, S Jin, Z Luo, DY Zemlyanov, X Xu, ...
Nano letters 16 (12), 7364-7369, 2016
992016
Scaled atomic-layer-deposited indium oxide nanometer transistors with maximum drain current exceeding 2 A/mm at drain voltage of 0.7 V
M Si, Z Lin, A Charnas, DY Peide
IEEE Electron Device Letters 42 (2), 184-187, 2020
682020
The resurrection of tellurium as an elemental two-dimensional semiconductor
G Qiu, A Charnas, C Niu, Y Wang, W Wu, PD Ye
npj 2D Materials and Applications 6 (1), 17, 2022
642022
Epitaxial Growth of 1D Atomic Chain Based Se Nanoplates on Monolayer ReS2 for High‐Performance Photodetectors
JK Qin, G Qiu, W He, J Jian, MW Si, YQ Duan, A Charnas, DY Zemlyanov, ...
Advanced Functional Materials 28 (48), 1806254, 2018
612018
Enhancement-Mode Atomic-Layer-Deposited In2O3 Transistors With Maximum Drain Current of 2.2 A/mm at Drain Voltage of 0.7 V by Low-Temperature …
M Si, A Charnas, Z Lin, DY Peide
IEEE Transactions on Electron Devices 68 (3), 1075-1080, 2021
502021
Solar-Blind UV Photodetector Based on Atomic Layer-Deposited Cu2O and Nanomembrane β-Ga2O3 pn Oxide Heterojunction
H Bae, A Charnas, X Sun, J Noh, M Si, W Chung, G Qiu, X Lyu, ...
ACS omega 4 (24), 20756-20761, 2019
382019
Enhancement-mode atomic-layer thin In2O3 transistors with maximum current exceeding 2 A/mm at drain voltage of 0.7 V enabled by oxygen plasma treatment
A Charnas, M Si, Z Lin, PD Ye
Applied Physics Letters 118 (5), 2021
352021
Ultrathin InGaO thin film transistors by atomic layer deposition
J Zhang, D Zheng, Z Zhang, A Charnas, Z Lin, DY Peide
IEEE Electron Device Letters 44 (2), 273-276, 2022
312022
Atomically thin indium-tin-oxide transistors enabled by atomic layer deposition
Z Zhang, Y Hu, Z Lin, M Si, A Charnas, K Cho, DY Peide
IEEE Transactions on Electron Devices 69 (1), 231-236, 2021
292021
Few-layer black phosporous PMOSFETs with BN/AI2O3 bilayer gate dielectric: Achieving Ion=850μA/μm, gm=340μS/μm, and Rc=0.58kΩ·μm
LM Yang, G Qiu, MW Si, AR Charnas, CA Milligan, DY Zemlyanov, ...
2016 IEEE International Electron Devices Meeting (IEDM), 5.5. 1-5.5. 4, 2016
292016
Atomically thin In2O3 field-effect transistors with 1017 current on/off ratio
A Charnas, Z Lin, Z Zhang, PD Ye
Applied Physics Letters 119 (26), 2021
28*2021
Ultrafast Laser‐Shock‐Induced Confined Metaphase Transformation for Direct Writing of Black Phosphorus Thin Films
G Qiu, Q Nian, M Motlag, S Jin, B Deng, Y Deng, AR Charnas, PD Ye, ...
Advanced Materials 30 (10), 1704405, 2018
242018
How important is the metal–semiconductor contact for Schottky barrier transistors: a case study on few-layer black phosphorus?
L Yang, A Charnas, G Qiu, YM Lin, CC Lu, W Tsai, Q Paduano, M Snure, ...
ACS omega 2 (8), 4173-4179, 2017
232017
extremely thin amorphous indium oxide transistors
A Charnas, Z Zhang, Z Lin, D Zheng, J Zhang, M Si, PD Ye
Advanced Materials 36 (9), 2304044, 2024
222024
First experimental demonstration of robust HZO/β-Ga₂O₃ ferroelectric field-effect transistors as synaptic devices for artificial intelligence applications in a high …
J Noh, H Bae, J Li, Y Luo, Y Qu, TJ Park, M Si, X Chen, AR Charnas, ...
IEEE Transactions on Electron Devices 68 (5), 2515-2521, 2021
212021
Experimental analysis of the Schottky barrier height of metal contacts in black phosphorus field-effect transistors
HM Chang, KL Fan, A Charnas, DY Peide, YM Lin, CI Wu, CH Wu
Journal of Physics D: Applied Physics 51 (13), 135306, 2018
212018
Improved Stability With Atomic-Layer-Deposited Encapsulation on Atomic-Layer In2O3 Transistors by Reliability Characterization
A Charnas, M Si, Z Lin, DY Peide
IEEE Transactions on Electron Devices 69 (10), 5549-5555, 2022
202022
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