| The 2018 GaN power electronics roadmap H Amano, Y Baines, E Beam, M Borga, T Bouchet, PR Chalker, M Charles, ... Journal of Physics D: Applied Physics 51 (16), 163001, 2018 | 1196 | 2018 |
| A review of the methods for the evaluation of coating-substrate adhesion PR Chalker, SJ Bull, DS Rickerby Materials Science and Engineering: A 140, 583-592, 1991 | 343 | 1991 |
| Embedded fibre Bragg grating sensors in advanced composite materials KSC Kuang, R Kenny, MP Whelan, WJ Cantwell, PR Chalker Composites Science and Technology 61 (10), 1379-1387, 2001 | 323 | 2001 |
| The identification and characterisation of mixed oxidation states at oxidised titanium surfaces by analysis of X-ray photoelectron spectra AF Carley, PR Chalker, JC Riviere, MW Roberts Journal of the Chemical Society, Faraday Transactions 1: Physical Chemistry …, 1987 | 263 | 1987 |
| Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm C Zhao, CZ Zhao, S Taylor, PR Chalker Materials 7 (7), 5117-5145, 2014 | 193 | 2014 |
| Selective laser melting of high aspect ratio 3D nickel–titanium structures two way trained for MEMS applications AT Clare, PR Chalker, S Davies, CJ Sutcliffe, S Tsopanos International Journal of Mechanics and Materials in Design 4, 181-187, 2008 | 182 | 2008 |
| Properties of GaN nanowires grown by molecular beam epitaxy L Geelhaar, C Cheze, B Jenichen, O Brandt, C Pfüller, S Münch, ... IEEE Journal of Selected Topics in Quantum Electronics 17 (4), 878-888, 2011 | 142 | 2011 |
| Novel mononuclear alkoxide precursors for the MOCVD of ZrO2 and HfO2 thin films PA Williams, JL Roberts, AC Jones, PR Chalker, NL Tobin, JF Bickley, ... Chemical Vapor Deposition 8 (4), 163-170, 2002 | 140 | 2002 |
| Some recent developments in the chemical vapour deposition of electroceramic oxides AC Jones, PR Chalker Journal of Physics D: Applied Physics 36 (6), R80, 2003 | 137 | 2003 |
| Some recent developments in the MOCVD and ALD of high-κ dielectric oxides AC Jones, HC Aspinall, PR Chalker, RJ Potter, K Kukli, A Rahtu, M Ritala, ... Journal of Materials Chemistry 14 (21), 3101-3112, 2004 | 131 | 2004 |
| Chemical vapour deposition: precursors, processes and applications M Ritala, H Parala, R Kanjolia, RD Dupuis, SE Alexandrov, SJC Irvine, ... Royal Society of Chemistry, 2008 | 127 | 2008 |
| Photochemistry of refractive index structures in poly (methyl methacrylate) by femtosecond laser irradiation A Baum, PJ Scully, M Basanta, CL Paul Thomas, PR Fielden, NJ Goddard, ... Optics letters 32 (2), 190-192, 2006 | 125 | 2006 |
| Transition from electron accumulation to depletion at InGaN surfaces TD Veal, PH Jefferson, LFJ Piper, CF McConville, TB Joyce, PR Chalker, ... Applied Physics Letters 89 (20), 2006 | 121 | 2006 |
| Dielectric relaxation of high-k oxides C Zhao, CZ Zhao, M Werner, S Taylor, P Chalker Nanoscale research letters 8, 1-12, 2013 | 119 | 2013 |
| Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques RJ Potter, PR Chalker, TD Manning, HC Aspinall, YF Loo, AC Jones, ... Chemical vapor deposition 11 (3), 159-169, 2005 | 118 | 2005 |
| Aluminium accumulation in relation to senile plaque and neurofibrillary tangle formation in the brains of patients with renal failure JM Candy, FK McArthur, AE Oakley, GA Taylor, CPLH Chen, SA Mountfort, ... Journal of the neurological sciences 107 (2), 210-218, 1992 | 117 | 1992 |
| Charge transport in heavily B‐doped polycrystalline diamond films M Werner, O Dorsch, HU Baerwind, E Obermeier, L Haase, W Seifert, ... Applied physics letters 64 (5), 595-597, 1994 | 112 | 1994 |
| Silver ink formulations for sinter-free printing of conductive films K Black, J Singh, D Mehta, S Sung, CJ Sutcliffe, PR Chalker Scientific reports 6 (1), 20814, 2016 | 109 | 2016 |
| Electrochemistry at boron-doped diamond films grown on graphite substrates: redox-, adsorption and deposition processes CH Goeting, F Jones, JS Foord, JC Eklund, F Marken, RG Compton, ... Journal of Electroanalytical Chemistry 442 (1-2), 207-216, 1998 | 109 | 1998 |
| MOCVD and ALD of High‐k Dielectric Oxides Using Alkoxide Precursors AC Jones, HC Aspinall, PR Chalker, RJ Potter, TD Manning, YF Loo, ... Chemical Vapor Deposition 12 (2‐3), 83-98, 2006 | 98 | 2006 |
Richard PotterThe University of LiverpoolVerified email at liverpool.ac.uk
