| Brewster’s angle silicon wafer terahertz linear polarizer A Wojdyla, G Gallot Optics Express 19 (15), 14099-14107, 2011 | 62 | 2011 |
| Attenuated internal reflection terahertz imaging A Wojdyla, G Gallot Optics Letters 38 (2), 112-114, 2013 | 37 | 2013 |
| Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating D Cocco, C Hardin, D Morton, L Lee, ML Ng, L Zhang, L Assoufid, ... Optics express 28 (13), 19242-19254, 2020 | 35 | 2020 |
| Actinic mask imaging: recent results and future directions from the SHARP EUV microscope KA Goldberg, MP Benk, A Wojdyla, I Mochi, SB Rekawa, AP Allezy, ... Extreme Ultraviolet (EUV) Lithography V 9048, 249-258, 2014 | 27 | 2014 |
| Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope MP Benk, KA Goldberg, A Wojdyla, CN Anderson, F Salmassi, ... Journal of Vacuum Science & Technology B 33 (6), 2015 | 20 | 2015 |
| Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging P Mangat, E Verduijn, OR Wood II, MP Benk, A Wojdyla, KA Goldberg Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015 | 17 | 2015 |
| Beam waist measurement for terahertz time-domain spectroscopy experiments A Podzorov, A Wojdyla, G Gallot Optics letters 35 (7), 901-903, 2010 | 16 | 2010 |
| New ways of looking at masks with the SHARP EUV microscope KA Goldberg, MP Benk, A Wojdyla, DG Johnson, AP Donoghue Extreme Ultraviolet (EUV) Lithography VI 9422, 404-414, 2015 | 15 | 2015 |
| Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection YG Wang, R Miyakawa, W Chao, M Benk, A Wojdyla, A Donoghue, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 420-429, 2015 | 14 | 2015 |
| Compensation of heat load deformations using adaptive optics for the ALS upgrade: a wave optics study M Sanchez del Rio, A Wojdyla, KA Goldberg, GD Cutler, D Cocco, ... Journal of synchrotron radiation 27 (5), 1141-1152, 2020 | 13 | 2020 |
| EUV photolithography mask inspection using Fourier ptychography A Wojdyla, MP Benk, PP Naulleau, KA Goldberg Image Sensing Technologies: Materials, Devices, Systems, and Applications V …, 2018 | 13 | 2018 |
| Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask P Naulleau, CN Anderson, W Chao, KA Goldberg, E Gullikson, ... Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation …, 2016 | 12 | 2016 |
| Phase measurements of EUV mask defects RA Claus, YG Wang, AJ Wojdyla, MP Benk, KA Goldberg, AR Neureuther, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 376-381, 2015 | 12 | 2015 |
| Extreme ultraviolet microscope characterization using photomask surface roughness G Gunjala, A Wojdyla, S Sherwin, A Shanker, MP Benk, KA Goldberg, ... Scientific reports 10 (1), 11673, 2020 | 9 | 2020 |
| Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks A Wojdyla, A Donoghue, MP Benk, PP Naulleau, KA Goldberg Extreme Ultraviolet (EUV) Lithography VII 9776, 133-141, 2016 | 9 | 2016 |
| Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology Z Levinson, E Verduijn, OR Wood, P Mangat, KA Goldberg, MP Benk, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 023508-023508, 2016 | 9 | 2016 |
| Real-time machine-learning-driven control system of a deformable mirror for achieving aberration-free X-ray wavefronts L Rebuffi, X Shi, Z Qiao, MJ Highland, MG Frith, A Wojdyla, KA Goldberg, ... Optics express 31 (13), 21264-21279, 2023 | 8 | 2023 |
| Binary amplitude reflection gratings for X-ray shearing and Hartmann wavefront sensors KA Goldberg, A Wojdyla, D Bryant Sensors 21 (2), 536, 2021 | 8 | 2021 |
| Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors A Wojdyla, D Bryant, W Chao, L Assoufid, D Cocco, M Idir, KA Goldberg Advances in X-Ray/EUV Optics and Components XIII 10760, 21-31, 2018 | 8 | 2018 |
| Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope MP Benk, A Wojdyla, W Chao, F Salmassi, S Oh, YG Wang, RH Miyakawa, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033501-033501, 2016 | 8 | 2016 |
Kenneth A. GoldbergOptical Physicist, Advanced Light Source, Lawrence Berkeley National LaboratoryVerified email at lbl.gov