INFLUENCE OF DEVICE ENGINEERING ON THE ANALOG AND RF PERFORMANCES OF SOI MOSFETS V Kilchytska, A Neve, L Vancaillie, D Levacq, S Adriaensen, H van Meer, ... Emerging nanoelectronics: life with and after CMOS 1, 375, 2005 | 272 | 2005 |
Analog/RF performance of multiple gate SOI devices: wideband simulations and characterization JP Raskin, TM Chung, V Kilchytska, D Lederer, D Flandre IEEE Transactions on Electron Devices 53 (5), 1088-1095, 2006 | 147 | 2006 |
FinFET analogue characterization from DC to 110 GHz D Lederer, V Kilchytska, T Rudenko, N Collaert, D Flandre, A Dixit, ... Solid-State Electronics 49 (9), 1488-1496, 2005 | 127 | 2005 |
Gm/Id Method for Threshold Voltage Extraction Applicable in Advanced MOSFETs With Nonlinear Behavior Above Threshold D Flandre, V Kilchytska, T Rudenko Electron Device Letters, IEEE 31 (9), 930-932, 2010 | 101 | 2010 |
Compact model for highly-doped double-gate SOI MOSFETs targeting baseband analog applications O Moldovan, A Cerdeira, D Jiménez, JP Raskin, V Kilchytska, D Flandre, ... Solid-state electronics 51 (5), 655-661, 2007 | 81 | 2007 |
A 3-D analytical physically based model for the subthreshold swing in undoped trigate FinFETs H Abd El Hamid, JR Guitart, V Kilchytska, D Flandre, B Iñiguez IEEE transactions on electron devices 54 (9), 2487-2496, 2007 | 78 | 2007 |
UTBB SOI MOSFETs analog figures of merit: Effects of ground plane and asymmetric double-gate regime MKM Arshad, S Makovejev, S Olsen, F Andrieu, JP Raskin, D Flandre, ... Solid-state electronics 90, 56-64, 2013 | 70 | 2013 |
Effective mobility in FinFET structures with HfO2 and SiON gate dielectrics and TaN gate electrode T Rudenko, N Collaert, S De Gendt, V Kilchytska, M Jurczak, D Flandre Microelectronic Engineering 80, 386-389, 2005 | 69 | 2005 |
Perspective of FinFETs for analog applications V Kilchytska, N Collaert, R Rooyackers, D Lederer, JP Raskin, D Flandre Proceedings of the 30th European Solid-State Circuits Conference (IEEE Cat …, 2004 | 69 | 2004 |
On the MOSFET threshold voltage extraction by transconductance and transconductance-to-current ratio change methods: Part II—Effect of drain voltage T Rudenko, V Kilchytska, MKM Arshad, JP Raskin, A Nazarov, D Flandre IEEE Transactions on Electron Devices 58 (12), 4180-4188, 2011 | 66 | 2011 |
On the MOSFET threshold voltage extraction by transconductance and transconductance-to-current ratio change methods: Part I—Effect of gate-voltage-dependent mobility T Rudenko, V Kilchytska, MKM Arshad, JP Raskin, A Nazarov, D Flandre IEEE Transactions on Electron Devices 58 (12), 4172-4179, 2011 | 62 | 2011 |
Wide frequency band assessment of 28 nm FDSOI technology platform for analogue and RF applications S Makovejev, BK Esfeh, V Barral, N Planes, M Haond, D Flandre, ... Solid-State Electronics 108, 47-52, 2015 | 59 | 2015 |
Time and frequency domain characterization of transistor self-heating S Makovejev, SH Olsen, V Kilchytska, JP Raskin IEEE transactions on electron devices 60 (6), 1844-1851, 2013 | 57 | 2013 |
Substrate impact on threshold voltage and subthreshold slope of sub-32 nm ultra thin SOI MOSFETs with thin buried oxide and undoped channel S Burignat, D Flandre, MKM Arshad, V Kilchytska, F Andrieu, O Faynot, ... Solid-state electronics 54 (2), 213-219, 2010 | 56 | 2010 |
Impact of self-heating and substrate effects on small-signal output conductance in UTBB SOI MOSFETs S Makovejev, JP Raskin, MKM Arshad, D Flandre, S Olsen, F Andrieu, ... Solid-State Electronics 71, 93-100, 2012 | 55 | 2012 |
Floating effective back-gate effect on the small-signal output conductance of SOI MOSFETs V Kilchytska, D Levacq, D Lederer, JP Raskin, D Flandre IEEE Electron Device Letters 24 (6), 414-416, 2003 | 55 | 2003 |
Carrier mobility in undoped triple-gate FinFET structures and limitations of its description in terms of top and sidewall channel mobilities T Rudenko, V Kilchytska, N Collaert, M Jurczak, A Nazarov, D Flandre IEEE transactions on electron devices 55 (12), 3532-3541, 2008 | 54 | 2008 |
Assessment of 28 nm UTBB FD-SOI technology platform for RF applications: Figures of merit and effect of parasitic elements BK Esfeh, V Kilchytska, V Barral, N Planes, M Haond, D Flandre, ... Solid-State Electronics 117, 130-137, 2016 | 52 | 2016 |
Ultra-thin body and thin-BOX SOI CMOS technology analog figures of merit V Kilchytska, MKM Arshad, S Makovejev, S Olsen, F Andrieu, T Poiroux, ... Solid-State Electronics 70, 50-58, 2012 | 52 | 2012 |
On the high-temperature subthreshold slope of thin-film SOI MOSFETs T Rudenko, V Kilchytska, JP Colinge, V Dessard, D Flandre IEEE Electron Device Letters 23 (3), 148-150, 2002 | 51 | 2002 |