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Alexis Franquet
Alexis Franquet
Verified email at imec.be
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Year
Three-dimensional observation of the conductive filament in nanoscaled resistive memory devices
U Celano, L Goux, A Belmonte, K Opsomer, A Franquet, A Schulze, ...
Nano letters 14 (5), 2401-2406, 2014
3732014
High-k dielectrics for future generation memory devices
JA Kittl, K Opsomer, M Popovici, N Menou, B Kaczer, XP Wang, ...
Microelectronic engineering 86 (7-9), 1789-1795, 2009
3092009
Effect of bath concentration and curing time on the structure of non-functional thin organosilane layers on aluminium
A Franquet, C Le Pen, H Terryn, J Vereecken
Electrochimica Acta 48 (9), 1245-1255, 2003
2752003
Organic and perovskite solar cells for space applications
I Cardinaletti, T Vangerven, S Nagels, R Cornelissen, D Schreurs, J Hruby, ...
Solar Energy Materials and Solar Cells 182, 121-127, 2018
2062018
Determination of the thickness of thin silane films on aluminium surfaces by means of spectroscopic ellipsometry
A Franquet, J De Laet, T Schram, H Terryn, V Subramanian, WJ Van Ooij, ...
Thin Solid Films 384 (1), 37-45, 2001
1802001
Crystalline properties and strain relaxation mechanism of CVD grown GeSn
F Gencarelli, B Vincent, J Demeulemeester, A Vantomme, A Moussa, ...
ECS Journal of Solid State Science and Technology 2 (4), P134, 2013
1652013
XPS study of the atmospheric corrosion of copper alloys of archaeological interest
V Hayez, A Franquet, A Hubin, H Terryn
Surface and Interface Analysis: An International Journal devoted to the …, 2004
1542004
Silane coating of metal substrates: Complementary use of electrochemical, optical and thermal analysis for the evaluation of film properties
I De Graeve, J Vereecken, A Franquet, T Van Schaftinghen, H Terryn
Progress in Organic Coatings 59 (3), 224-229, 2007
1442007
Composition and thickness of non-functional organosilane films coated on aluminium studied by means of infra-red spectroscopic ellipsometry
A Franquet, H Terryn, J Vereecken
Thin Solid Films 441 (1-2), 76-84, 2003
1412003
IRSE study on effect of thermal curing on the chemistry and thickness of organosilane films coated on aluminium
A Franquet, H Terryn, J Vereecken
Applied Surface Science 211 (1-4), 259-269, 2003
1102003
Vacancy-modulated conductive oxide resistive RAM (VMCO-RRAM): An area-scalable switching current, self-compliant, highly nonlinear and wide on/off-window resistive switching cell
B Govoreanu, A Redolfi, L Zhang, C Adelmann, M Popovici, S Clima, ...
2013 IEEE International Electron Devices Meeting, 10.2. 1-10.2. 4, 2013
1052013
Study of the effect of different aluminium surface pretreatments on the deposition of thin non‐functional silane coatings
A Franquet, H Terryn, J Vereecken
Surface and Interface Analysis: An International Journal devoted to the …, 2004
972004
Metal‐Insulator Transition in ALD VO2 Ultrathin Films and Nanoparticles: Morphological Control
AP Peter, K Martens, G Rampelberg, M Toeller, JM Ablett, J Meersschaut, ...
Advanced Functional Materials 25 (5), 679-686, 2015
912015
Impact of the electrodeposition chemistry used for TSV filling on the microstructural and thermo-mechanical response of Cu
C Okoro, R Labie, K Vanstreels, A Franquet, M Gonzalez, B Vandevelde, ...
Journal of Materials Science 46, 3868-3882, 2011
912011
Characterisation of the silicon nitride thin films deposited by plasma magnetron
A Batan, A Franquet, J Vereecken, F Reniers
Surface and Interface Analysis: An International Journal devoted to the …, 2008
612008
Material-Selective Doping of 2D TMDC through AlxOy Encapsulation
A Leonhardt, D Chiappe, VV Afanas’ ev, S El Kazzi, I Shlyakhov, ...
ACS applied materials & interfaces 11 (45), 42697-42707, 2019
592019
Atomic layer deposition of ruthenium thin films from (ethylbenzyl)(1-ethyl-1, 4-cyclohexadienyl) Ru: Process characteristics, surface chemistry, and film properties
M Popovici, B Groven, K Marcoen¶, QM Phung, S Dutta, J Swerts, ...
Chemistry of Materials 29 (11), 4654-4666, 2017
582017
Use of optical methods to characterize thin silane films coated on aluminium
A Franquet, H Terryn, P Bertrand, J Vereecken
Surface and Interface Analysis: An International Journal devoted to the …, 2002
572002
Gate-last vs. gate-first technology for aggressively scaled EOT logic/RF CMOS
A Veloso, LÅ Ragnarsson, MJ Cho, K Devriendt, K Kellens, F Sebaai, ...
2011 Symposium on VLSI Technology-Digest of Technical Papers, 34-35, 2011
562011
Nucleation and growth mechanisms of Al2O3 atomic layer deposition on synthetic polycrystalline MoS2
H Zhang, D Chiappe, J Meersschaut, T Conard, A Franquet, T Nuytten, ...
The Journal of Chemical Physics 146 (5), 2017
552017
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