| Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbide T Standaert, C Hedlund, EA Joseph, GS Oehrlein, TJ Dalton Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (1 …, 2004 | 346 | 2004 |
| Microloading effect in reactive ion etching C Hedlund, HO Blom, S Berg Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 12 (4 …, 1994 | 189 | 1994 |
| Oxidation and induced damage in oxygen plasma in situ wafer bonding D Pasquariello, C Hedlund, K Hjort Journal of the Electrochemical Society 147 (7), 2699, 2000 | 80 | 2000 |
| Selective -to- etching in inductively coupled fluorocarbon plasmas: Angular dependence of and etching rates M Schaepkens, GS Oehrlein, C Hedlund, LB Jonsson, HO Blom Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (6 …, 1998 | 74 | 1998 |
| Anisotropic etching of Z-cut quartz C Hedlund, U Lindberg, U Bucht, J Soderkvist Journal of Micromechanics and Microengineering 3 (2), 65, 1993 | 74 | 1993 |
| Etch rates of crystallographic planes in Z-cut quartz-experiments and simulation P Rangsten, C Hedlund, IV Katardjiev, Y Bäcklund Journal of Micromechanics and Microengineering 8 (1), 1, 1998 | 68 | 1998 |
| Surface energy as a function of self-bias voltage in oxygen plasma wafer bonding D Pasquariello, M Lindeberg, C Hedlund, K Hjort Sensors and Actuators A: Physical 82 (1-3), 239-244, 2000 | 61 | 2000 |
| Compositional variations of sputter deposited Ti/W barrier layers on substrates with pronounced surface topography LB Jonsson, C Hedlund, IV Katardjiev, S Berg Thin Solid Films 348 (1-2), 227-232, 1999 | 43 | 1999 |
| More value from fewer resources: how to expand value stream mapping with ideas from circular economy C Hedlund, P Stenmark, E Noaksson, J Lilja International Journal of Quality and Service Sciences 12 (4), 447-459, 2020 | 38 | 2020 |
| Storytelling: a co-creative process to support value-based leadership K Snyder, C Hedlund, P Ingelsson, I Bäckström International Journal of Quality and Service Sciences 9 (3/4), 484-497, 2017 | 38 | 2017 |
| Angular dependence of the polysilicon etch rate during dry etching in and C Hedlund, LB Jonsson, IV Katardjiev, S Berg, HO Blom Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (3 …, 1997 | 31 | 1997 |
| Discharge disruptions in a helicon plasma source KP Shamrai, VF Virko, HO Blom, VP Pavlenko, VB Taranov, LB Jonsson, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (6 …, 1997 | 26 | 1997 |
| Oxygen plasma wafer bonding evaluated by the Weibull fracture probability method K Jonsson, J Köhler, C Hedlund, L Stenmark Journal of Micromechanics and Microengineering 11 (4), 364, 2001 | 22 | 2001 |
| Method for the determination of the angular dependence during dry etching C Hedlund, C Strandman, IV Katardjiev, Y Bäcklund, S Berg, HO Blom Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1996 | 20 | 1996 |
| Capturing value-based leadership in practice: Insights from developing and applying an AI-interview guide I Bäckström, P Ingelsson, K Snyder, C Hedlund, J Lilja International Journal of Quality and Service Sciences 10 (4), 422-430, 2018 | 18 | 2018 |
| Residual stress in sputtered gold films on quartz measured by the cantilever beam deflection technique G Thornell, F Ericson, C Hedlund, J Ohrmaim, JA Schweitz, G Portnoff IEEE transactions on ultrasonics, ferroelectrics, and frequency control 46 …, 1999 | 18 | 1999 |
| Membrane covered electrically isolated through-wafer via holes D Rosén, J Olsson, C Hedlund Journal of Micromechanics and Microengineering 11 (4), 344, 2001 | 16 | 2001 |
| Oehrlein GS and Dalton TJ T Standaert, C Hedlund, EA Joseph J. Vac. Sci. Technol. A 2004, 22, 2004 | 12 | 2004 |
| Direct bonded quartz resonators O Vallin, B Einefors, C Hedlund, G Thornell Proceedings of the 2001 IEEE International Frequncy Control Symposium and …, 2001 | 10 | 2001 |
| Patterning of tantalum pentoxide, a high epsilon material, by inductively coupled plasma etching LB Jonsson, J Westlinder, F Engelmark, C Hedlund, J Du, U Smith, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 10 | 2000 |
Johan LiljaDocent i Kvalitetsteknik, MittuniversitetetVerified email at miun.se