Patrick Naulleau

Patrick Naulleau

EUV Tech Inc. and Berkeley Lab
Verified email at euvtech.com
Cited by 7367
Kenneth A. Goldberg

Kenneth A. Goldberg

Optical Physicist, Advanced Light Source, Lawrence Berkeley National Laboratory
Verified email at lbl.gov
Cited by 5492
Takeshi HIGASHIGUCHI

Takeshi HIGASHIGUCHI

Utsunomiya University
Verified email at cc.utsunomiya-u.ac.jp
Cited by 3002
Gerard O'Sullivan

Gerard O'Sullivan

University College Dublin
Verified email at ucd.ie
Cited by 2687
Michael Vargas

Michael Vargas

University of Michigan, ASML
Verified email at umich.edu
Cited by 1084
Nathan J. Brooks

Nathan J. Brooks

Postdoctoral Scientist, Institute of Atomic and Molecular Sciences (IAMS), Academia Sinica
Verified email at colorado.edu
Cited by 978
R. Steven Turley

R. Steven Turley

Brigham Young University (retired)
Verified email at byu.edu
Cited by 811
Parham Yaghoobi

Parham Yaghoobi

Product Development Manager, EUV Technology, ASML, Veldhoven, The Netherlands
Verified email at ece.ubc.ca
Cited by 456
Bishwa Chandra Adhikari

Bishwa Chandra Adhikari

Kyung Hee University
Verified email at khu.ac.kr
Cited by 394
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