| Alternative Metals for Advanced Interconnects C. Adelmann, L.G. Wen, Antony Peter, Y.K. Siew, K. Croes, J. Swerts, M ... IEEE International Interconect Tech. Conf, 173-175, 2014 | 94* | 2014 |
| Metal-Insulator Transition in ALD VO2 Ultrathin Films and Nanoparticles: Morphological control Adv. Funct. Mater. 25, 679-686, 2014 | 91* | 2014 |
| High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films SA Starostin, PA Premkumar, M Creatore, H De Vries, RMJ Paffen, ... Applied Physics Letters 96 (6), 2010 | 82 | 2010 |
| Smooth and Self‐Similar SiO2‐like Films on Polymers Synthesized in Roll‐to‐Roll Atmospheric Pressure‐PECVD for Gas Diffusion Barrier Applications PA Premkumar, SA Starostin, M Creatore, H de Vries, RMJ Paffen, ... Plasma Processes and Polymers 7 (8), 635-639, 2010 | 78 | 2010 |
| First monolithic integration of 3d complementary fet (cfet) on 300mm wafers S Subramanian, M Hosseini, T Chiarella, S Sarkar, P Schuddinck, ... 2020 Ieee Symposium on Vlsi Technology, 1-2, 2020 | 75 | 2020 |
| On the formation mechanisms of the diffuse atmospheric pressure dielectric barrier discharge in CVD processes of thin silica-like films SA Starostin, PA Premkumar, M Creatore, EM Van Veldhuizen, H de Vries, ... Plasma Sources Science and Technology 18 (4), 045021, 2009 | 71 | 2009 |
| 1.5×10-9 Ω·cm2 Contact Resistivity on Highly Doped Si:P Using Ge Pre-amorphization and Ti Silicidation H. Yu, M. Schaekers, E. Rosseel, A. Peter, J.-G. Lee, W.-B. Song, S ... IEDM, 592, 2015 | 70* | 2015 |
| High Quality SiO2‐like Layers by Large Area Atmospheric Pressure Plasma Enhanced CVD: Deposition Process Studies by Surface Analysis PA Premkumar, SA Starostin, H de Vries, RMJ Paffen, M Creatore, ... Plasma Processes and Polymers 6 (10), 693-702, 2009 | 68 | 2009 |
| Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors PA Premkumar, M Toeller, IP Radu, C Adelmann, M Schaekers, ... ECS Journal of Solid State Science and Technology 1 (4), P169, 2012 | 66 | 2012 |
| Forksheet FETs for advanced CMOS scaling: forksheet-nanosheet co-integration and dual work function metal gates at 17nm NP space H Mertens, R Ritzenthaler, Y Oniki, B Briggs, BT Chan, A Hikavyy, T Hopf, ... 2021 Symposium on VLSI Technology, 1-2, 2021 | 60 | 2021 |
| Titanium Silicide on Si:P with Pre-Contact Amorphization Implantation Treatment: Contact Resistivity Approaching 1×10-9 Ohm-cm2 H. Yu, M. Schaekers, A. Peter, G. Pourtois, E. Rosseel, Joon-Gon Lee, Woo ... IEEE Trans. Electron Devices 63 (12), 4632-4641, 2016 | 56 | 2016 |
| Nickel and nickel-based nanoalloy thin films from alcohol-assisted chemical vapor deposition N Bahlawane, PA Premkumar, Z Tian, X Hong, F Qi, ... Chemistry of Materials 22 (1), 92-100, 2010 | 53 | 2010 |
| CVD of metals using alcohols and metal acetylacetonates, Part I: Optimization of process parameters and electrical characterization of synthesized films PA Premkumar, N Bahlawane, K Kohse‐Höinghaus Chemical Vapor Deposition 13 (5), 219-226, 2007 | 52 | 2007 |
| Effect of Solvent on the Growth of Co and Co2C Using Pulsed-Spray Evaporation Chemical Vapor Deposition PA Premkumar, A Turchanin, N Bahlawane Chemistry of Materials 19 (25), 6206-6211, 2007 | 51 | 2007 |
| Crystallization and semiconductor-metal switching behavior of thin VO2 layers grown by atomic layer deposition G Rampelberg, D Deduytsche, B De Schutter, PA Premkumar, M Toeller, ... Thin Solid Films 550, 59-64, 2014 | 47 | 2014 |
| Preparation of doped spinel cobalt oxide thin films and evaluation of their thermal stability N Bahlawane*, PA Premkumar, J Feldmann, K Kohse‐Höinghaus Chemical Vapor Deposition 13 (2‐3), 118-122, 2007 | 45 | 2007 |
| CVD of metals using alcohols and metal acetylacetonates, Part II: Role of solvent and characterization of metal films made by pulsed spray evaporation CVD PA Premkumar, N Bahlawane, G Reiss, K Kohse‐Höinghaus Chemical Vapor Deposition 13 (5), 227-231, 2007 | 39 | 2007 |
| Buried power rail integration with FinFETs for ultimate CMOS scaling A Gupta, OV Pedreira, G Arutchelvan, H Zahedmanesh, K Devriendt, ... IEEE Transactions on Electron Devices 67 (12), 5349-5354, 2020 | 38 | 2020 |
| NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)2 and Ozone as Precursors P Antony Premkumar, M Toeller, C Adelmann, J Meersschaut, A Franquet, ... Chemical Vapor Deposition 18 (1‐3), 61-69, 2012 | 36 | 2012 |
| Ultralow-Resistivity CMOS Contact Scheme with Pre-Contact Amorphization Plus Ti (Germano-)Silicidation KDM H. Yu, M. Schaekers, A. Hikavyy, E. Rosseel, A. Peter, K. Churton, F. A ... IEEE Symposium on VLSI Technology, 978, 2016 | 35* | 2016 |