| Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias MY Yoon, HJ Yeom, JH Kim, W Chegal, YJ Cho, DC Kwon, JR Jeong, ... Physics of Plasmas 28 (6), 2021 | 46 | 2021 |
| Plasma etching of the trench pattern with high aspect ratio mask under ion tilting MY Yoon, HJ Yeom, JH Kim, JR Jeong, HC Lee Applied Surface Science 595, 153462, 2022 | 38 | 2022 |
| Flat cutoff probe for real-time electron density measurement in industrial plasma processing HJ Yeom, JH Kim, DH Choi, ES Choi, MY Yoon, DJ Seong, SJ You, ... Plasma Sources Science and Technology 29 (3), 035016, 2020 | 31 | 2020 |
| Experimental and computational investigations of the effect of the electrode gap on capacitively coupled radio frequency oxygen discharges KH You, J Schulze, A Derzsi, Z Donkó, HJ Yeom, JH Kim, DJ Seong, ... Physics of Plasmas 26 (1), 2019 | 20 | 2019 |
| Generation of carbon nanowhiskers, nanotips, and nanodots by controlling plasma environment: Ion energy and radical effects D Choi, HJ Yeom, KH You, JH Kim, DJ Seong, E Yoon, HC Lee Carbon 162, 423-430, 2020 | 15 | 2020 |
| Circuit model for flat cut-off probes with coplanar capacitance HJ Yeom, KH You, JH Kim, HC Lee Plasma Sources Science and Technology 30 (6), 065012, 2021 | 14 | 2021 |
| Plasma density measurement and downstream etching of silicon and silicon oxide in Ar/NF3 mixture remote plasma source HJ Yeom, DH Choi, YS Lee, JH Kim, DJ Seong, SJ You, HC Lee Plasma Science and Technology 21 (6), 064007, 2019 | 14 | 2019 |
| Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe Y Lee, H Yeom, D Choi, S Kim, J Lee, J Kim, H Lee, SJ You Nanomaterials 12 (21), 3828, 2022 | 10 | 2022 |
| Computational characterization of microwave planar cutoff probes for non-invasive electron density measurement in low-temperature plasma: Ring-and bar-type cutoff probes SJ Kim, JJ Lee, YS Lee, HJ Yeom, HC Lee, JH Kim, SJ You Applied Sciences 10 (20), 7066, 2020 | 10 | 2020 |
| Real-time monitoring of the plasma density distribution in low-pressure plasmas using a flat-cutoff array sensor HJ Yeom, MY Yoon, GS Chae, JH Kim, SJ You, HC Lee Applied Physics Letters 122 (11), 2023 | 8 | 2023 |
| Low‐Temperature, Universal Synthetic Route for Mesoporous Metal Oxides by Exploiting Synergistic Effect of Thermal Activation and Plasma KW Kim, H Seok, S Son, SJ Park, C Yang, D Lee, HC Lee, J Mun, ... Advanced Materials 36 (18), 2311809, 2024 | 7 | 2024 |
| Analysis of the transmission spectrum of the microwave cutoff probe influenced by the sheath around the probe HJ Yeom, YG Kim, GS Chae, DY Hwang, JH Kim, HC Lee Journal of Applied Physics 133 (18), 2023 | 7 | 2023 |
| Surface structurization and control of CuS particle size by discharge mode of inductively coupled plasma and vapor-phase sulfurization D Choi, TW Kim, R Shahzad, H Park, HJ Yeom, JH Kim, DJ Seong, ... Plasma Sources Science and Technology 27 (11), 114002, 2018 | 6 | 2018 |
| Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar … HC Lee, JH Kim, DJ Seong, HJ Yeom US Patent 11,867,643, 2024 | 4 | 2024 |
| Effect of impurities in vacuum vessels on the plasma parameters in inductive discharges YG Kim, HJ Yeom, DC Kwon, KY Kim, GS Chae, JS Yoon, JH Kim, ... Vacuum 215, 112330, 2023 | 3 | 2023 |
| Mass Filter Characteristic and Design Role of Quadrupole Mass Spectrometer for Radical Measurement in Low-pressure Plasmas HJ Yeom, JJ Lee, SJ Kim, YS Lee, C hee Cho, JH Kim, HC Lee, SJ You Applied Science and Convergence Technology 29 (4), 77-81, 2020 | 3 | 2020 |
| Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography ES Choe, S Choi, A Kim, KY Kim, HJ Yeom, MY Yoon, S Hong, DW Kim, ... Advanced Materials Interfaces 11 (7), 2300867, 2024 | 2 | 2024 |
| Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching HJ Yeom, MY Yoon, D Choi, Y Lee, JH Kim, SJ You, HC Lee ACS omega 8 (36), 32450-32457, 2023 | 2 | 2023 |
| Analysis of the transmission spectrum of the flat-cutoff sensors on wafers with metal layer HJ Yeom, GS Chae, JH Kim, SJ You, HC Lee Journal of Applied Physics 133 (15), 2023 | 2 | 2023 |
| Effect of radiofrequency bias power on transmission spectrum of flat-cutoff sensor in inductively coupled plasma HJ Yeom, GS Chae, MY Yoon, W Kim, JH Lee, JH Park, CW Park, JH Kim, ... Physics of Plasmas 31 (9), 2024 | 1 | 2024 |
Hyo-Chang Lee (이효창)Korea Research Institute of Standards and Scienceبريد إلكتروني تم التحقق منه على hanyang.ac.kr