| Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas C Cho, K You, S Kim, Y Lee, J Lee, S You Materials 14 (17), 5036, 2021 | 38 | 2021 |
| Characterization of SiO2 Over Poly-Si Mask Etching in Ar/C4F8 Capacitively Coupled Plasma IH Seong, JJ Lee, CH Cho, YS Lee, SJ Kim, SJ You Applied Science and Convergence Technology 30 (6), 176-182, 2021 | 24 | 2021 |
| A transmission line model of the cutoff probe SJ Kim, JJ Lee, DW Kim, JH Kim, SJ You Plasma Sources Science and Technology 28 (5), 055014, 2019 | 23 | 2019 |
| Planar cutoff probe for measuring the electron density of low-pressure plasmas DW Kim, SJ You, SJ Kim, JH Kim, JY Lee, WS Kang, M Hur Plasma Sources Science and Technology 28 (1), 015004, 2019 | 20 | 2019 |
| Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe S Kim, J Lee, Y Lee, C Cho, S You Sensors 22 (3), 1291, 2022 | 14 | 2022 |
| Characteristics of SiO2 Etching by Capacitively Coupled Plasma with Different Fluorocarbon Liquids (C7F14, C7F8) and Fluorocarbon Gas (C4F8) SW Yoo, C Cho, K Kim, H Lee, S You Applied Science and Convergence Technology 30 (4), 102-106, 2021 | 11 | 2021 |
| A Quantification Method in Quadrupole Mass Spectrometer Measurement YS Lee, SH Oh, JJ Lee, CH Cho, SJ Kim, SJ You Applied Science and Convergence Technology 30 (2), 50-53, 2021 | 11 | 2021 |
| Effect of an inhomogeneous electron density profile on the transmission microwave frequency spectrum of the cutoff probe SJ Kim, JJ Lee, YS Lee, DW Kim, SJ You Plasma Sources Science and Technology 29 (12), 125014, 2020 | 11 | 2020 |
| Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2 Y Lee, I Seong, J Lee, S Lee, C Cho, S Kim, SJ You Journal of Vacuum Science & Technology A 40 (1), 2022 | 10 | 2022 |
| Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma YB You, YS Lee, SJ Kim, CH Cho, IH Seong, WN Jeong, MS Choi, SJ You Nanomaterials 12 (21), 3798, 2022 | 10 | 2022 |
| Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring-and Bar-Type Cutoff Probes SJ Kim, JJ Lee, YS Lee, HJ Yeom, HC Lee, JH Kim, SJ You Applied Sciences 10 (20), 7066, 2020 | 10 | 2020 |
| Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysis S Kim, Y Lee, C Cho, M Choi, I Seong, J Lee, D Kim, S You Scientific Reports 12 (1), 20976, 2022 | 9 | 2022 |
| Finding the optimum design of the planar cutoff probe through a computational study SJ Kim, JJ Lee, YS Lee, DW Kim, SJ You AIP Advances 11 (2), 2021 | 9 | 2021 |
| Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma I Seong, J Lee, S Kim, Y Lee, C Cho, J Lee, W Jeong, Y You, S You Nanomaterials 12 (22), 3963, 2022 | 8 | 2022 |
| Purgeless atomic layer etching of SiO2 YS Lee, SJ Kim, JJ Lee, CH Cho, IH Seong, SJ You Journal of Physics D: Applied Physics 55 (36), 365203, 2022 | 8 | 2022 |
| Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the … M Choi, Y Lee, Y You, C Cho, W Jeong, I Seong, B Choi, S Kim, Y Seol, ... Materials 16 (16), 5624, 2023 | 7 | 2023 |
| Development of High-precision RF Sensor KK Kim, JJ Lee, SJ Kim, CH Cho, SW Yoo, SJ You Applied Science and Convergence Technology 28 (4), 88-92, 2019 | 7 | 2019 |
| Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion … W Jeong, S Kim, Y Lee, C Cho, I Seong, Y You, M Choi, J Lee, Y Seol, ... Materials 16 (10), 3820, 2023 | 5 | 2023 |
| Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath I Seong, S Kim, Y Lee, C Cho, J Lee, W Jeong, Y You, S You Sensors 22 (16), 6254, 2022 | 5 | 2022 |
| Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics S Kim, S Lee, Y You, Y Lee, I Seong, C Cho, J Lee, S You Sensors 22 (15), 5487, 2022 | 5 | 2022 |
Dae-Woong KimSenior researcher, Korea Institute of Machinery and Materialsبريد إلكتروني تم التحقق منه على kimm.re.kr
