| Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers R Zazpe, M Knaut, H Sopha, L Hromadko, M Albert, J Prikryl, ... Langmuir 32 (41), 10551-10558, 2016 | 99 | 2016 |
| Ternary and quarternary TiSiN and TiSiCN nanocomposite coatings obtained by Chemical Vapor Deposition I Endler, M Höhn, J Schmidt, S Scholz, M Herrmann, M Knaut Surface and Coatings Technology 215, 133-140, 2013 | 85 | 2013 |
| Comparison of static and dynamic 18F-FDG PET/CT for quantification of pulmonary inflammation in acute lung injury A Braune, F Hofheinz, T Bluth, T Kiss, J Wittenstein, M Scharffenberg, ... Journal of Nuclear Medicine 60 (11), 1629-1634, 2019 | 63* | 2019 |
| Top-down fabricated reconfigurable FET with two symmetric and high-current on-states M Simon, B Liang, D Fischer, M Knaut, A Tahn, T Mikolajick, WM Weber IEEE Electron Device Letters 41 (7), 1110-1113, 2020 | 60 | 2020 |
| Atomic layer deposition for high aspect ratio through silicon vias M Knaut, M Junige, V Neumann, H Wojcik, T Henke, C Hossbach, A Hiess, ... Microelectronic Engineering 107, 80-83, 2013 | 56 | 2013 |
| In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl) ruthenium] and … M Knaut, M Junige, M Albert, JW Bartha Journal of Vacuum Science & Technology A 30 (1), 2012 | 44 | 2012 |
| Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures MC Schwille, T Schössler, J Barth, M Knaut, F Schön, A Höchst, M Oettel, ... Journal of Vacuum Science & Technology A 35 (1), 2017 | 42 | 2017 |
| A wired-AND transistor: Polarity controllable FET with multiple inputs M Simon, J Trommer, B Liang, D Fischer, T Baldauf, MB Khan, A Heinzig, ... 2018 76th Device Research Conference (DRC), 1-2, 2018 | 36 | 2018 |
| Electrical evaluation of Ru–W (-N), Ru–Ta (-N) and Ru–Mn films as Cu diffusion barriers H Wojcik, R Kaltofen, U Merkel, C Krien, S Strehle, J Gluch, M Knaut, ... Microelectronic engineering 92, 71-75, 2012 | 34 | 2012 |
| Atomic layer deposited high-κ nanolaminates for silicon surface passivation F Benner, PM Jordan, C Richter, DK Simon, I Dirnstorfer, M Knaut, ... Journal of Vacuum Science & Technology B 32 (3), 2014 | 31 | 2014 |
| Preparation and characterization of CVD-TiN-coated carbon fibers for applications in metal matrix composites AZ Abidin, R Kozera, M Höhn, I Endler, M Knaut, A Boczkowska, A Czulak, ... Thin Solid Films 589, 479-486, 2015 | 30 | 2015 |
| Barrier performance optimization of atomic layer deposited diffusion barriers for organic light emitting diodes using x-ray reflectivity investigations A Singh, H Klumbies, U Schröder, L Müller-Meskamp, M Geidel, M Knaut, ... Applied Physics Letters 103 (23), 2013 | 27 | 2013 |
| Hard x-ray nanofocusing by refractive lenses of constant thickness F Seiboth, M Scholz, J Patommel, R Hoppe, F Wittwer, J Reinhardt, ... Applied Physics Letters 105 (13), 2014 | 24 | 2014 |
| Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition T Henke, M Knaut, C Hossbach, M Geidel, M Albert, JW Bartha Surface and Coatings Technology 309, 600-608, 2017 | 20 | 2017 |
| Al2O3-TiO2 Nanolaminates for Conductive Silicon Surface Passivation I Dirnstorfer, T Chohan, PM Jordan, M Knaut, DK Simon, JW Bartha, ... IEEE Journal of Photovoltaics 6 (1), 86-91, 2015 | 20 | 2015 |
| Flash-enhanced atomic layer deposition: basics, opportunities, review, and principal studies on the flash-enhanced growth of thin films T Henke, M Knaut, C Hossbach, M Geidel, L Rebohle, M Albert, ... ECS Journal of Solid State Science and Technology 4 (7), P277, 2015 | 19 | 2015 |
| Characterization of Ru–Mn composites for ULSI interconnects H Wojcik, C Krien, U Merkel, JW Bartha, M Knaut, M Geidel, B Adolphi, ... Microelectronic engineering 112, 103-109, 2013 | 18 | 2013 |
| Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film … T Henke, M Knaut, M Geidel, F Winkler, M Albert, JW Bartha Thin Solid Films 627, 94-105, 2017 | 15 | 2017 |
| Effect of wet chemical substrate pretreatment on the growth behavior of Ta (N) films deposited by thermal ALD S Strehle, H Schumacher, D Schmidt, M Knaut, M Albert, JW Bartha Microelectronic engineering 85 (10), 2064-2067, 2008 | 15 | 2008 |
| Atomic layer deposition of anatase TiO2 on porous electrodes for dye-sensitized solar cells I Dirnstorfer, H Mähne, T Mikolajick, M Knaut, M Albert, K Dubnack Journal of Vacuum Science & Technology A 31 (1), 2013 | 13 | 2013 |
Johann W. BarthaProfessor für Halbleitertechnik, Technische Universität Dresdenبريد إلكتروني تم التحقق منه على tu-dresden.de
